Difference between revisions of "Equipment"

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== Deposition ==
+
==Deposition==
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===== Evaporation =====
+
=== [[How PVD works|Physical Vapor Deposition (PVD)]] ===
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* [[Lesker Nano-36 Thermal Evaporator | Lesker Nano-36 Thermal Evaporator]]
+
''[[PVD Equipment Overview|PVD Equipment Overview]]''
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* [[Lesker PVD75 E-Beam/Thermal Evaporator | Lesker PVD75 E-Beam/Thermal Evaporator]]
+
==== [[PVD Equipment Overview|Evaporation]] ====
−
* [[Lesker PVD75 E-beam Evaporator | Lesker PVD75 E-beam Evaporator]]
+
* '''PVD-01:''' [[Lesker Nano-36 Thermal Evaporator | Lesker Nano-36 Thermal Evaporator]]  
 +
* '''PVD-02:''' [[Lesker PVD75 E-Beam/Thermal Evaporator | Lesker PVD75 E-Beam/Thermal Evaporator]]  
 +
* '''PVD-04:''' [[Lesker PVD75 E-beam Evaporator | Lesker PVD75 E-beam Evaporator]]
 +
* '''PVD-09:''' [[Intlvac E-beam Evaporator | Intlvac E-beam Evaporator]]
  
−
===== Sputtering =====
+
==== [[PVD Equipment Overview|Sputtering]] ====
−
* [[Lesker PVD75 DC/RF Sputterer | Lesker PVD75 DC/RF Sputterer]]
+
* '''PVD-03:''' [[Lesker PVD75 DC/RF Sputterer | Lesker PVD75 DC/RF Sputterer]]  
−
* [[Denton Explorer14 Magnetron Sputterer | Denton Explorer14 Magnetron Sputterer]]
+
* '''PVD-05:''' [[Denton Explorer14 Magnetron Sputterer | Denton Explorer14 Magnetron Sputterer]]
  
−
===== Chemical Vapor Deposition (CVD) =====
+
'' '''PVD-07: SCS PDS2010 Parylene Coater''' is listed under Backend & Packaging'' <br>
−
* [[Cambridge Nanotech S200 ALD | Cambridge Nanotech S200 ALD]]
+
'' '''PVD-08: Silanization Dessicator''' is listed under Soft Lithography''
−
* [[Veeco Savannah 200 | Veeco Savannah 200]]
 
−
* [[Oxford PlasmaLab 100 PECVD | Oxford PlasmaLab 100 PECVD ]]
 
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* [[Sandvik Furnace Stack | Sandvik Wet/Dry Thermal Oxide Furnace]]
 
−
* [[Sandvik Furnace Stack | Sandvik LPCVD Silicon Nitride Furnace ]]
 
  
−
== Etch ==
+
=== [[What is Chemical Vapor Deposition (CVD)?|Chemical Vapor Deposition (CVD)]] ===
−
===== Plasma Etch =====
+
* '''CVD-01:''' [[Oxford PlasmaLab 100 PECVD | Oxford PlasmaLab 100 PECVD ]]
−
* [[Anatech SCE-108 Barrel Asher |Anatech SCE-108 Barrel Asher]]
+
* '''CVD-02 (Tube furnaces):''' [[Sandvik Furnace Stack | Sandvik Furnace Stack - SiO<sub>2</sub>, SiN<sub>x</sub>, Anneal tubes]]
−
* [[SPTS Si DRIE | SPTS Si DRIE]] 
 
−
* [[Oxford 80 Plus RIE | Oxford 80 Plus RIE]]
 
−
* [[Oxford Cobra ICP Etcher | Oxford Cobra ICP Etcher]]
 
−
* [[Jupiter II RIE Plasma Etcher | Jupiter II RIE Plasma Etcher]]
 
  
−
==== Vapor / Wet Etch ====
+
=== [[What is Atomic Layer Deposition?|Atomic Layer Deposition (ALD)]] ===
−
* [[SPTS/Xactix XeF2 Isotropic Etcher | SPTS/Xactix XeF2 Isotropic Etcher]]
+
* '''ALD-01:''' [[Cambridge Nanotech S200 ALD | Cambridge Nanotech S200 ALD]]
 +
* '''<s>ALD-02</s>:''' [[Fiji G2 ALD | Fiji G2 ALD]]
 +
* '''ALD-03:''' [[Veeco Savannah 200 | Veeco Savannah 200]]
 +
 
 +
== Dry Etching ==
 +
 
 +
=== Ion Milling ===
 +
* '''DE-01:''' [[IntlVac NanoQuest 1 IBE |IntlVac NanoQuest 1 IBE]]
 +
 
 +
=== [[How plasma etch works|Plasma Etch]] ===
 +
* '''DE-02:''' [[Anatech SCE-108 Barrel Asher |Anatech SCE-108 Barrel Asher]]
 +
* '''DE-03:''' [[SPTS Si DRIE | SPTS Si DRIE]] 
 +
* '''DE-04:''' [[Oxford 80 Plus RIE | Oxford 80 Plus RIE]]
 +
* '''DE-05:''' [[Oxford Cobra ICP Etcher | Oxford Cobra ICP Etcher]]
 +
* '''DE-07:''' [[Anatech SCE-106 Barrel Asher | Anatech SCE-106 Barrel Asher]] ''- cross-listed under Soft Lithography''
 +
* '''DE-08:''' [[Jupiter II RIE Plasma Etcher | Jupiter II RIE Plasma Etcher]]
 +
* '''DE-09:''' [[Tergeo-Plus Plasma Cleaner | Tergeo-Plus Plasma Cleaner]]
 +
=== Vapor Etch ===
 +
* '''DE-06:''' [[SPTS/Xactix XeF2 Isotropic Etcher | SPTS/Xactix XeF2 Isotropic Etcher]]
  
 
== Lithography ==
 
== Lithography ==
−
==== E-beam Lithography ====
+
=== E-beam Lithography ===
−
* [[ Elionix ELS-7500EX E-Beam Lithography System | Elionix ELS-7500EX E-Beam Lithography System ]]
+
* '''EBL-01:''' [[ Elionix ELS-7500EX E-Beam Lithography System | Elionix ELS-7500EX E-Beam Lithography System ]]
−
* [[Litho Workstation for BEAMER and TRACER | Litho Workstation for BEAMER and TRACER]]
+
* '''EBL-02:''' [[Litho Workstation for BEAMER and TRACER | Litho Workstation for BEAMER and TRACER]]
 +
* '''EBL-03:''' [[ Raith EBPG5200+ E-Beam Lithography System | Raith EBPG5200+ E-Beam Lithography System ]]
 +
 
 +
=== [[Photolithography]] ===
 +
* '''LW-01:''' [[Heidelberg DWL 66+ Laser Writer | Heidelberg DWL 66+ Laser Writer]]
 +
* '''LW-02:''' [[Nanoscribe Photonic Professional GT | Nanoscribe Photonic Professional GT]]
 +
* '''MA-01:''' [[SUSS MicroTec MA6 Gen3 Mask Aligner | SUSS MicroTec MA6 Gen3 Mask Aligner]]
 +
* '''MA-03:''' [[ABM Mask Aligner | ABM Mask Aligner]] ''- cross-listed under Soft Lithography''
 +
 
 +
=== Imprint Lithography ===
 +
* '''MA-02:''' [[Nanonex NX2600 Nanoimprint | Nanonex NX2600 Nanoimprint]]
 +
 
 +
=== [[Soft Lithography]] ===
 +
* '''DE-07:''' [[Anatech SCE-106 Barrel Asher | Anatech SCE-106 Barrel Asher]]
 +
* '''MA-03:''' [[ABM Mask Aligner | ABM Mask Aligner]]
 +
* '''PVD-08:''' Silanization Dessicator
 +
* '''SPN-08:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - Negative Epoxy]]
 +
* '''SPN-09:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - PDMS]]
  
−
==== Laser Lithography ====
+
=== Resist Coating ===
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* [[Heidelberg DWL 66+ Laser Writer | Heidelberg DWL 66+ Laser Writer]]
+
* '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]]
−
* [[Nanoscribe Photonic Professional GT | Nanoscribe Photonic Professional GT]]
+
* '''SPN-01:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - Acetone Soluble Photoresist]]
 +
* '''SPN-03:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - LOR/PMGI]]
 +
* '''SPN-04:''' ReynoldsTech Spinner - Negative Resist
 +
* '''SPN-06:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - E-Beam Resist]]
 +
* '''SPN-08:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - Negative Epoxy]] ''- cross-listed under Soft Lithography''
  
−
==== Photolithography ====
+
== Metrology & characterization ==
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* [[SUSS MicroTec MA6 Gen3 Mask Aligner | SUSS MicroTec MA6 Gen3 Mask Aligner]]
+
=== Stylus profilometers ===
 +
* '''MET-01:''' [[KLA Tencor P7 2D profilometer | KLA Tencor P7 2D profilometer]]
 +
* '''MET-02:''' [[KLA Tencor P7 2D&3D/stress profilometer | KLA Tencor P7 2D&3D/stress profilometer]]
  
−
==== Imprint Lithography ====
+
=== Optical profilometers ===
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* [[Nanonex NX2600 Nanoimprint | Nanonex NX2600 Nanoimprint]]
+
* '''MET-05:''' [[Filmetrics Profilm3D | Filmetrics Profilm3D]]
  
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==== Resist Coating ====
+
=== Reflectometers ===
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* Spinner - Positive Resist (Left) - 4" Wafer Only
+
* '''MET-03:''' [[Filmetrics F50 (UV Filter) | Filmetrics F50 (UV Filter)]]
−
* Spinner - Positive Resist (Right) - Small Piece Only
+
* '''MET-04:''' [[Filmetrics F40 | Filmetrics F40]]
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* Spinner - Negative Resist (Left)
+
* '''MET-11:''' [[Filmetrics F50 (White Light) | Filmetrics F50 (White Light)]]
−
* Spinner - Negative Resist (Right)
 
−
* Spinner - E-Beam Resist Only
 
−
* SUSS MicroTec AS8 AltaSpray
 
  
−
== Soft Lithography ==
+
=== Ellipsometer ===
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* [[Anatech SCE-106 Barrel Asher | Anatech SCE-106 Barrel Asher]]
+
* '''MET-06:''' [[Woollam V-VASE Ellipsometer | Woollam V-VASE Ellipsometer]]
−
* [[ABM3000HR Mask Aligner | ABM3000HR Mask Aligner]]
+
 
−
* [[SCS PDS2010 Parylene Coater| SCS PDS2010 Parylene Coater]]
+
=== Electrical characterization ===
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* Silanization Dessicator
+
* '''MET-08:''' [[Jandel Multi Height Four Point Probe | Jandel Multi Height Four Point Probe]]
−
* Spinner - SU-8/PDMS
+
* '''MET-09:''' [[Micromanipulator 4060 Probe Station | Micromanipulator 4060 Probe Station]]
 +
 
 +
=== Microscopes ===
 +
* '''MET-10:''' Zeiss Smartzoom5 2D/3D Optical Microscope
 +
* '''MET-12, MET-13, MET-14, MET-15:''' [[Zeiss Axio Imager M2m Microscopes | Zeiss Axio Imager M2m Microscopes]]
  
−
== Metrology ==
 
−
* KLA Tencor P7 2D profilometer
 
−
* KLA Tencor P7 2D&3D/stress profilometer
 
−
* Filmetrics F50 (yellow light)
 
−
* Filmetrics F40
 
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* Zygo NewView 7300 Optical Profilometer
 
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* Woollam VAS Ellipsometer
 
−
* Jandel Multi Height Four Point Probe
 
−
* Micromanipulator 4060 Probe Station
 
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* Filmetrics F50 (white light)
 
−
* Zeiss Axio Imager M2m Microscopes
 
−
 
 
== Backend & Packaging ==
 
== Backend & Packaging ==
−
* [[IPG IX-255 Excimer Micromachining Laser | IPG IX-255 Excimer Micromachining Laser]]
+
=== Laser Micro-Machining ===
−
* IPG IX280-DXF Green Micromachining Laser
+
* '''LMM-01:''' [[IPG IX-255 Excimer Micromachining Laser | IPG IX-255 Excimer Micromachining Laser]]
−
* EVG 510 Wafer Bonder
+
* '''LMM-02:''' [[IPG IX280-DXF Green Micromachining Laser | IPG IX280-DXF Green Micromachining Laser]]
−
* EVG 620 Wafer Bond Aligner
+
=== Dicing ===
−
* K&S Wire Bonder
+
* '''BE-04:''' [[ADT 7100 Dicing Saw | ADT 7100 Dicing Saw]]
−
* ADT 7100 Dicing Saw
+
* '''SPN-07:''' [[Spinner - SU-8/PDMS | CEE 200X Spinner]]
−
* Tousimis Critical Point Dryer
+
* Manual cleaving station
−
* Dimatix ink-Jet Printer
+
=== Wafer Bonding ===
 +
* '''BE-01:''' [[EVG 510 Wafer Bonder | EVG 510 Wafer Bonder]]
 +
* '''BE-02:''' [[EVG 620 Wafer Bond Aligner | EVG 620 Wafer Bond Aligner]]
 +
=== Wire Bonding ===
 +
* '''BE-03:''' [[K&S Wire Bonder | K&S Wire Bonder]]
 +
* '''BE-06:''' [[TPT HB100 Wire Bonder | TPT HB100 Wire Bonder]]
 +
=== Parylene Coater ===
 +
* '''PVD-07:''' [[SCS PDS2010 Parylene Coater| SCS PDS2010 Parylene Coater]]
  
 
== Thermal Processing ==
 
== Thermal Processing ==
−
* MPT Corp. RTP-600S Rapid Thermal Annealer
+
=== Rapid Thermal Annealing ===
−
* [[Sandvik Furnace Stack | Sandvik Anneal Furnace 1]]
+
* '''RTA-01:'''[[RTA-01 | AET Thermal RX - MOS compatible only]]
−
* [[Sandvik Furnace Stack | Sandvik Anneal Furnace 2]]
+
* '''RTA-02:'''[[RTA-02 | AET Thermal RX - general use]]
 +
 
 +
=== Anneal Furnace ===
 +
* '''CVD-02C:''' [[Sandvik Furnace Stack | Sandvik Anneal Furnace 1]]
 +
* '''CVD-02D:'''[[Sandvik Furnace Stack | Sandvik Anneal Furnace 2]]
 +
 
 +
== Wet Processing ==
 +
===Equipment===
 +
* '''CPD-01:''' [[Tousimis Critical Point Dryer | Tousimis Critical Point Dryer]]
 +
* '''SRD-01:'''[[RENA Compass Dual Stack Spin Rinse Dryer | RENA Compass Dual Stack Spin Rinse Dryer]]
 +
=== Wet Benches===
 +
* '''WB-06:''' [[HF Processing | Hydrofluoric Acid Processing]]
 +
* '''WB-xx:''' [[Bay 3 Wet Bench Processing | Bay 3 Wet Bench Processing]]
 +
* '''WB-xx:''' [[General Wet Bench Processing | General Wet Bench Processing]]

Latest revision as of 13:53, 28 July 2025

Deposition

Physical Vapor Deposition (PVD)

PVD Equipment Overview

Evaporation

Sputtering

PVD-07: SCS PDS2010 Parylene Coater is listed under Backend & Packaging
PVD-08: Silanization Dessicator is listed under Soft Lithography

Chemical Vapor Deposition (CVD)

Atomic Layer Deposition (ALD)

Dry Etching

Ion Milling

Plasma Etch

Vapor Etch

Lithography

E-beam Lithography

Photolithography

Imprint Lithography

Soft Lithography

Resist Coating

Metrology & characterization

Stylus profilometers

Optical profilometers

Reflectometers

Ellipsometer

Electrical characterization

Microscopes

Backend & Packaging

Laser Micro-Machining

Dicing

Wafer Bonding

Wire Bonding

Parylene Coater

Thermal Processing

Rapid Thermal Annealing

Anneal Furnace

Wet Processing

Equipment

Wet Benches

Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=Equipment&oldid=2805"