SUSS MicroTec MA6 Gen3 Mask Aligner
|Tool Name||SUSS MicroTec MA6 Gen3 Mask Aligner|
|Staff Manager||David Jones|
|Lab Location||Bay 2|
|Tool Manufacturer||SUSS MicroTec|
|Tool Model||MA6 Gen3|
This system is a dual-use mask aligner and wafer-bond aligner. Mask alignment is used for contact and proximity exposure processes. Exposures can be performed with gaps programmable from 10 um to 300 um in 1 um increments. Automatic wedge error compensation (WEC) is used to ensure that the mask and wafer are parallel. The lamp is a 1000 W Hg-Arc lamp. Integrated light level sensing ensures proper exposure doses as the lamp degrades.
- Photomask exposure of resist-coated samples