Litho Workstation for BEAMER and TRACER

From Quattrone Nanofabrication Facility
Jump to navigation Jump to search


GenIsys BEAMER & TRACER Software
EBL-02.jpeg
Tool Name GenIsys BEAMER & TRACER Software
Instrument Type Lithography
Staff Manager David Barth
Lab Location Bay 2
Tool Manufacturer GenIsys
Tool Model BEAMER / TRACER
Iris Designation EBL-02
Lab Phone XXXXX
SOP Link

Description

Pattern data for electron beam (e-beam), mask aligner and laser lithography is prepared using a software packages called BEAMER and TRACER by GenISys. The software package offers advanced data preparation, 2D and 3D proximity effect correction (PEC), process modeling and simulation for direct write applications in both e-beam and laser lithography.


Applications
  • E-beam lithography data preparation
  • Laser lithography data preparation


Resources

SOPs & Troubleshooting
Online Webinars and Training Materials