Oxford Cobra ICP Etcher
|Oxford Cobra ICP Etcher
|Cobra PlasmaPro 100
Oxford PlasmaPro 100 is an inductively coupled plasma (ICP) etcher. The tool uses an RF magnetic field to induce an RF electric field and energize the electrons that result in the ionization of gas molecules and atoms at low pressures.
- Max ICP power: 3 kW
- Max RF power: 200 W
The tool is connected to the following gases: BCl3, Cl2, Ar, O2, SF6, CF4, and CHF3.
- Etch of Si
- Etch of SiO2
- Etch of SiNx
- Etch of InP
- Etch of Al, Cr, Ti, Nb, hafnia, alumina ....
- for a complete list of materials etched in the tool please refer to the SOP at the bottom off this page
NOTE: Au and Ag, Se, and Li compounds are NOT ALLOWED in the system