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- 10:04, 25 April 2024 diff hist +63 Heidelberg DWL 66+ Laser Writer →Processes: including developer information current
- 16:12, 24 April 2024 diff hist -253 Join update scheduler link current
- 12:30, 18 April 2024 diff hist +46 ABM3000HR Mask Aligner current
- 12:22, 18 April 2024 diff hist +75 Equipment →Soft Lithography
- 12:20, 18 April 2024 diff hist 0 m Apogee Spinner - E-Beam Resist current
- 12:20, 18 April 2024 diff hist 0 Apogee Spinner - Positive Resist (Right) current
- 12:19, 18 April 2024 diff hist 0 m Apogee Spinner - Positive Resist (Right)
- 11:05, 17 April 2024 diff hist +109 m Join →Access to the Quattrone Nanofabrication Facility
- 12:41, 1 April 2024 diff hist +259 Heidelberg DWL 66+ Laser Writer →Processes: Add S1818 process images
- 12:18, 1 April 2024 diff hist +45 N File:LW-01 S1818Lines 5um Feb2024.png 65mW, 70% intensity, + 20 focus current
- 12:17, 1 April 2024 diff hist +45 N File:LW-01 S1818Lines 25um Feb2024.png 65mW, 70% intensity, + 20 focus current
- 12:14, 1 April 2024 diff hist +5 Heidelberg DWL 66+ Laser Writer →Processes: Updated intensity, tested for S1818, calculations for S1805 and KL5315
- 14:15, 28 March 2024 diff hist +276 Resists at QNF →Other Resists: update tool links current
- 14:14, 28 March 2024 diff hist +1,697 Resists at QNF →QNF Supplied Standard Photoresists: include tool links
- 14:09, 28 March 2024 diff hist +110 Resists at QNF →Other Resists
- 14:03, 28 March 2024 diff hist +348 m Resists at QNF →Stockroom Photoresists
- 14:02, 28 March 2024 diff hist +188 m Resists at QNF →QNF Supplied Standard Photoresists
- 13:58, 28 March 2024 diff hist -258 Resists at QNF →Stockroom Photoresists: update to new SPN
- 13:57, 28 March 2024 diff hist +117 Resists at QNF →QNF Supplied Standard Photoresists: update for new SPN information
- 16:39, 12 March 2024 diff hist -3 Equipment →Physical Vapor Deposition (PVD)
- 16:38, 12 March 2024 diff hist -4 Equipment →Physical Vapor Deposition (PVD)
- 16:38, 12 March 2024 diff hist +7 Equipment →Sputtering
- 16:38, 12 March 2024 diff hist +14 Equipment →Sputtering
- 16:37, 12 March 2024 diff hist +18 Equipment →Resist Coating
- 16:37, 12 March 2024 diff hist +8 Equipment →Plasma Etch
- 16:31, 12 March 2024 diff hist +49 Equipment →Physical Vapor Deposition (PVD)
- 16:30, 12 March 2024 diff hist +30 Equipment →Resist Coating
- 16:28, 12 March 2024 diff hist +80 Equipment →Resist Coating: Update to current spinners
- 16:26, 12 March 2024 diff hist -12 ABM3000HR Mask Aligner update location to Bay 6
- 16:26, 12 March 2024 diff hist +33 Anatech SCE-106 Barrel Asher update processes current
- 16:22, 12 March 2024 diff hist 0 Anatech SCE-106 Barrel Asher update location to Bay 6
- 16:13, 12 March 2024 diff hist -8 CEE 200X Spinner current
- 16:13, 12 March 2024 diff hist -4 CEE 200X Spinner update name
- 16:12, 12 March 2024 diff hist +22 SCS PDS2010 Parylene Coater update tool owner, update to NEMO, update location current
- 16:11, 12 March 2024 diff hist -17 SCS PDS2010 Parylene Coater Undo revision 1294 by Coana (talk) Tag: Undo
- 16:10, 12 March 2024 diff hist -4 SCS PDS2010 Parylene Coater Undo revision 1408 by Coana (talk) Tag: Undo
- 16:09, 12 March 2024 diff hist +4 SCS PDS2010 Parylene Coater
- 16:01, 12 March 2024 diff hist -7 IPG IX280-DXF Green Micromachining Laser update location name from Soft Lithography current
- 16:01, 12 March 2024 diff hist -7 IPG IX-255 Excimer Micromachining Laser update location name from Soft Lithography current
- 16:00, 12 March 2024 diff hist -7 ADT 7100 Dicing Saw update area name from Soft Lithography current
- 15:59, 12 March 2024 diff hist -10 CEE 200X Spinner Update group name, location
- 15:58, 12 March 2024 diff hist +62 CEE 200X Spinner →Description: Update description
- 15:56, 12 March 2024 diff hist +59 Equipment →Backend & Packaging: Update SPN-07 location
- 15:55, 12 March 2024 diff hist -62 Equipment →Soft Lithography: Remove SPN-07
- 15:54, 12 March 2024 diff hist +30 N Spinner - SU-8/PDMS Coana moved page Spinner - SU-8/PDMS to CEE 200X Spinner: No longer used for Soft Lithography, being kept for surface protection/coating at 'Cut & Connect' current Tag: New redirect
- 15:54, 12 March 2024 diff hist 0 m CEE 200X Spinner Coana moved page Spinner - SU-8/PDMS to CEE 200X Spinner: No longer used for Soft Lithography, being kept for surface protection/coating at 'Cut & Connect'
- 17:54, 28 February 2024 diff hist +169 QNF Staff Add Dan Sabrsula
- 17:52, 28 February 2024 diff hist 0 N File:Dan-Sabrsula.jpg current
- 18:18, 15 February 2024 diff hist +156 Heidelberg DWL 66+ Laser Writer →Processes: Incorrectly updated filter value, not focus value
- 16:41, 6 February 2024 diff hist +345 Heidelberg DWL 66+ Laser Writer Add videos