Anatech SCE-106 Barrel Asher
|Tool Name||Anatech SCE-106 Barrel Asher|
|Instrument Type||Soft Lithography|
|Staff Manager||Sam Azadi|
|Lab Location||Bay 2|
Anatech USA’s SCE-100 Series Inductively Coupled (ICP) Plasma systems are extremely effective for a Plasma Ashing process to remove organics prior to thin film deposition and/or chemical analysis of remaining inorganics.
Process gases are CF4, O2, Ar and N2. Sample sizes are pieces to 150 mm round wafers.
- Removal of photoresist
- Removal of organic materials