Difference between revisions of "Equipment"

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==Deposition==
 
==Deposition==
=== [[How PVD works|Physical Vapor Deposition (PVD)]] - [[PVD Equipment Overview|PVD Equipment Overview]] ===
+
=== [[How PVD works|Physical Vapor Deposition (PVD)]] ===
 +
''[[PVD Equipment Overview|PVD Equipment Overview]]''
 
==== [[PVD Equipment Overview|Evaporation]] ====
 
==== [[PVD Equipment Overview|Evaporation]] ====
 
* '''PVD-01:''' [[Lesker Nano-36 Thermal Evaporator | Lesker Nano-36 Thermal Evaporator]]  
 
* '''PVD-01:''' [[Lesker Nano-36 Thermal Evaporator | Lesker Nano-36 Thermal Evaporator]]  

Revision as of 16:02, 30 September 2024

Deposition

Physical Vapor Deposition (PVD)

PVD Equipment Overview

Evaporation

Sputtering

PVD-07 is listed under Soft Lithography
PVD-08 is listed under Soft Lithography

Chemical Vapor Deposition (CVD)

Atomic Layer Deposition (ALD)

Etching

Plasma Etch

Vapor/Wet Etch

Lithography

E-beam Lithography

Laser Lithography

Photolithography

Imprint Lithography

Resist Coating

  • SPN-07 is listed under Back End Processing
  • SPN-08 is listed under Soft Lithography
  • SPN-09 is listed under Soft Lithography

Soft Lithography

Metrology & characterization

Stylus profilometers

Optical profilometers

Reflectometers

Ellipsometer

Electrical characterization

Microscopes

Backend & Packaging

Thermal Processing

Wet Processing