Difference between revisions of "Equipment"

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=== Resist Coating ===
 
=== Resist Coating ===
 
* '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]]
 
* '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]]
* '''SPN-01:''' [[ CEE Apogee Spinner | Apogee Spinner - Acetone Soluble Photoresist]]
+
* '''SPN-01:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - Acetone Soluble Photoresist]]
* '''SPN-03:''' [[ CEE Apogee Spinner | Apogee Spinner - LOR/PMGI]]
+
* '''SPN-03:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - LOR/PMGI]]
 
* '''SPN-04:''' ReynoldsTech Spinner - Negative Resist
 
* '''SPN-04:''' ReynoldsTech Spinner - Negative Resist
* '''SPN-06:''' [[ CEE Apogee Spinner | Apogee Spinner - E-Beam Resist]]
+
* '''SPN-06:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - E-Beam Resist]]
  
 
* '' '''SPN-07''' is listed under Back End Processing'' <br>
 
* '' '''SPN-07''' is listed under Back End Processing'' <br>

Revision as of 16:49, 18 June 2024

Deposition

Physical Vapor Deposition (PVD)

Evaporation

Sputtering

PVD-07 is listed under Soft Lithography
PVD-08 is listed under Soft Lithography

Chemical Vapor Deposition (CVD)

Atomic Layer Deposition (ALD)

Etching

Plasma Etch

Vapor/Wet Etch

Lithography

E-beam Lithography

Laser Lithography

Photolithography

Imprint Lithography

Resist Coating

  • SPN-07 is listed under Back End Processing
  • SPN-08 is listed under Soft Lithography
  • SPN-09 is listed under Soft Lithography

Soft Lithography

Metrology & characterization

Stylus profilometers

Optical profilometers

Reflectometers

Ellipsometer

Electrical characterization

Microscopes

Backend & Packaging

Thermal Processing

Wet Processing