Difference between revisions of "Equipment"

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(Undo revision 1298 by Coana (talk))
Tag: Undo
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=== Resist Coating ===
 
=== Resist Coating ===
 
* '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]]
 
* '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]]
* '''SPN-01:''' Apogee Spinner - Positive Resist (Left) - No LOR/PMGI/Polyimide
+
* '''SPN-01:''' [[ Apogee Spinner - Positive Resist (Left) | Apogee Spinner - Positive Resist (Left)]] - No LOR/PMGI/Polyimide!
* '''SPN-03:''' Apogee Spinner - Positive Resist (Right)
+
* '''SPN-03:''' [[ Apogee Spinner - Positive Resist (Right) | Apogee Spinner - Positive Resist (Right)]]
 
* '''SPN-04:''' ReynoldsTech Spinner - Negative Resist
 
* '''SPN-04:''' ReynoldsTech Spinner - Negative Resist
* '''SPN-06:''' Apogee Spinner - E-Beam Resist Only - No LOR/PMGI/Polyimide
+
* '''SPN-06:''' [[ Apogee Spinner - E-Beam Resist | Apogee Spinner - E-Beam Resist]] - No LOR/PMGI/Polyimide!
  
 
''SPN-07 is listed under Soft Lithography''
 
''SPN-07 is listed under Soft Lithography''

Revision as of 14:10, 6 February 2024

Physical Vapor Deposition (PVD)

Evaporation

Sputtering

PVD-07 is listed under Soft Lithography

Chemical Vapor Deposition (CVD)

Atomic layer deposition (ALD)

Plasma Enhanced CVD (PECVD)

Tube furnace

Etching

Plasma Etch

DE-07 is listed under Soft Lithography

Vapor/Wet Etch

Lithography

E-beam Lithography

Laser Lithography

Photolithography

Imprint Lithography

Resist Coating

SPN-07 is listed under Soft Lithography

Soft Lithography

Metrology & characterization

Stylus profilometers

Optical profilometers

Reflectometers

Ellipsometer

Electrical characterization

Microscopes

Backend & Packaging

Thermal Processing

Wet Processing