Difference between revisions of "Equipment"

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(→‎Resist Coating: Update to current spinners)
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=== Resist Coating ===
 
=== Resist Coating ===
 
* '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]]
 
* '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]]
* '''SPN-01:''' [[Spinner - Positive Resist (Left) - POLOS | Spinner - Positive Resist (Left) - Polos]]
+
* '''SPN-01:''' Apogee Spinner - Positive Resist (Left) - No LOR/PMGI/Polyimide
* '''SPN-03:''' Spinner - Positive Resist (Right)
+
* '''SPN-03:''' Apogee Spinner - Positive Resist (Right)
* '''SPN-04:''' Spinner - Negative Resist (Left)
+
* '''SPN-04:''' ReynoldsTech Spinner - Negative Resist
* '''SPN-05:''' Spinner - Negative Resist (Right)
+
* '''SPN-06:''' Apogee Spinner - E-Beam Resist Only - No LOR/PMGI/Polyimide
* '''SPN-06:''' Spinner - E-Beam Resist Only
 
  
 
''SPN-07 is listed under Soft Lithography''
 
''SPN-07 is listed under Soft Lithography''

Revision as of 14:13, 3 January 2024

Physical Vapor Deposition (PVD)

Evaporation

Sputtering

PVD-07 is listed under Soft Lithography

Chemical Vapor Deposition (CVD)

Atomic layer deposition (ALD)

Plasma Enhanced CVD (PECVD)

Tube furnace

Etching

Plasma Etch

DE-07 is listed under Soft Lithography

Vapor/Wet Etch

Lithography

E-beam Lithography

Laser Lithography

Photolithography

Imprint Lithography

Resist Coating

  • RC-01: SUSS MicroTec AS8 AltaSpray
  • SPN-01: Apogee Spinner - Positive Resist (Left) - No LOR/PMGI/Polyimide
  • SPN-03: Apogee Spinner - Positive Resist (Right)
  • SPN-04: ReynoldsTech Spinner - Negative Resist
  • SPN-06: Apogee Spinner - E-Beam Resist Only - No LOR/PMGI/Polyimide

SPN-07 is listed under Soft Lithography

Soft Lithography

Metrology & characterization

Stylus profilometers

Optical profilometers

Reflectometers

Ellipsometer

Electrical characterization

Microscopes

Backend & Packaging

Thermal Processing

Wet Processing