Difference between revisions of "Equipment"
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| Line 11: | Line 11: | ||
== Chemical vapor deposition (CVD) == | == Chemical vapor deposition (CVD) == | ||
| − | * [[Cambridge Nanotech S200 ALD | Cambridge Nanotech S200 ALD]] | + | * (ALD-01) [[Cambridge Nanotech S200 ALD | Cambridge Nanotech S200 ALD]] |
| − | * [[Veeco Savannah 200 | Veeco Savannah 200]] | + | * (ALD-03) [[Veeco Savannah 200 | Veeco Savannah 200]] |
| − | * [[Oxford PlasmaLab 100 PECVD | Oxford PlasmaLab 100 PECVD ]] | + | * (CVD-01) [[Oxford PlasmaLab 100 PECVD | Oxford PlasmaLab 100 PECVD ]] |
| − | * [[Sandvik Furnace Stack | Sandvik Furnace Stack - SiO<sub>2</sub>, SiN<sub>x</sub>, Anneal tubes]] | + | * (CVD-02) [[Sandvik Furnace Stack | Sandvik Furnace Stack - SiO<sub>2</sub>, SiN<sub>x</sub>, Anneal tubes]] |
== Etch == | == Etch == | ||
Revision as of 10:54, 8 July 2022
Physical vapor deposition (PVD)
Evaporation
- (PVD-01) Lesker Nano-36 Thermal Evaporator
- (PVD-02) Lesker PVD75 E-Beam/Thermal Evaporator
- (PVD-04) Lesker PVD75 E-beam Evaporator
Sputtering
- (PVD-03) Lesker PVD75 DC/RF Sputterer
- (PVD-05) Denton Explorer14 Magnetron Sputterer
Chemical vapor deposition (CVD)
- (ALD-01) Cambridge Nanotech S200 ALD
- (ALD-03) Veeco Savannah 200
- (CVD-01) Oxford PlasmaLab 100 PECVD
- (CVD-02) Sandvik Furnace Stack - SiO2, SiNx, Anneal tubes
Etch
Plasma Etch
- Anatech SCE-108 Barrel Asher
- SPTS Si DRIE
- Oxford 80 Plus RIE
- Oxford Cobra ICP Etcher
- Jupiter II RIE Plasma Etcher
Vapor / Wet Etch
Lithography
E-beam Lithography
Laser Lithography
Photolithography
Imprint Lithography
Resist Coating
- Spinner - Positive Resist (Left) - 4" Wafer Only
- Spinner - Positive Resist (Right) - Small Piece Only
- Spinner - Negative Resist (Left)
- Spinner - Negative Resist (Right)
- Spinner - E-Beam Resist Only
- SUSS MicroTec AS8 AltaSpray
Soft Lithography
- Anatech SCE-106 Barrel Asher
- ABM3000HR Mask Aligner
- SCS PDS2010 Parylene Coater
- Silanization Dessicator
- Spinner - SU-8/PDMS
Metrology
- KLA Tencor P7 2D profilometer
- KLA Tencor P7 2D&3D/stress profilometer
- Filmetrics F50 (UV Filter)
- Filmetrics F50 (White Light)
- Filmetrics F40
- Zygo NewView 7300 Optical Profilometer
- Woollam V-VASE Ellipsometer
- Jandel Multi Height Four Point Probe
- Micromanipulator 4060 Probe Station
- Zeiss Axio Imager M2m Microscopes
Backend & Packaging
- IPG IX-255 Excimer Micromachining Laser
- IPG IX280-DXF Green Micromachining Laser
- EVG 510 Wafer Bonder
- EVG 620 Wafer Bond Aligner
- K&S Wire Bonder
- ADT 7100 Dicing Saw
- Tousimis Critical Point Dryer
- Dimatix ink-Jet Printer