Difference between revisions of "Equipment"
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== Deposition == | == Deposition == | ||
===== Evaporation ===== | ===== Evaporation ===== | ||
| − | * [[Lesker Nano-36 Thermal Evaporator | Lesker Nano-36 Thermal Evaporator]] (PVD- | + | * (PVD-01) [[Lesker Nano-36 Thermal Evaporator | Lesker Nano-36 Thermal Evaporator]] |
| − | + | * (PVD-02) [[Lesker PVD75 E-Beam/Thermal Evaporator | Lesker PVD75 E-Beam/Thermal Evaporator]] | |
| − | + | * (PVD-04) [[Lesker PVD75 E-beam Evaporator | Lesker PVD75 E-beam Evaporator]] | |
===== Sputtering ===== | ===== Sputtering ===== | ||
| − | * [[Lesker PVD75 DC/RF Sputterer | Lesker PVD75 DC/RF Sputterer]] (PVD- | + | * (PVD-03) [[Lesker PVD75 DC/RF Sputterer | Lesker PVD75 DC/RF Sputterer]] |
| − | + | * (PVD-05) [[Denton Explorer14 Magnetron Sputterer | Denton Explorer14 Magnetron Sputterer]] | |
===== Chemical Vapor Deposition (CVD) ===== | ===== Chemical Vapor Deposition (CVD) ===== | ||
Revision as of 10:42, 8 July 2022
Deposition
Evaporation
- (PVD-01) Lesker Nano-36 Thermal Evaporator
- (PVD-02) Lesker PVD75 E-Beam/Thermal Evaporator
- (PVD-04) Lesker PVD75 E-beam Evaporator
Sputtering
- (PVD-03) Lesker PVD75 DC/RF Sputterer
- (PVD-05) Denton Explorer14 Magnetron Sputterer
Chemical Vapor Deposition (CVD)
- Cambridge Nanotech S200 ALD
- Veeco Savannah 200
- Oxford PlasmaLab 100 PECVD
- Sandvik Furnace Stack - SiO2, SiNx, Anneal tubes
Etch
Plasma Etch
- Anatech SCE-108 Barrel Asher
- SPTS Si DRIE
- Oxford 80 Plus RIE
- Oxford Cobra ICP Etcher
- Jupiter II RIE Plasma Etcher
Vapor / Wet Etch
Lithography
E-beam Lithography
Laser Lithography
Photolithography
Imprint Lithography
Resist Coating
- Spinner - Positive Resist (Left) - 4" Wafer Only
- Spinner - Positive Resist (Right) - Small Piece Only
- Spinner - Negative Resist (Left)
- Spinner - Negative Resist (Right)
- Spinner - E-Beam Resist Only
- SUSS MicroTec AS8 AltaSpray
Soft Lithography
- Anatech SCE-106 Barrel Asher
- ABM3000HR Mask Aligner
- SCS PDS2010 Parylene Coater
- Silanization Dessicator
- Spinner - SU-8/PDMS
Metrology
- KLA Tencor P7 2D profilometer
- KLA Tencor P7 2D&3D/stress profilometer
- Filmetrics F50 (UV Filter)
- Filmetrics F50 (White Light)
- Filmetrics F40
- Zygo NewView 7300 Optical Profilometer
- Woollam V-VASE Ellipsometer
- Jandel Multi Height Four Point Probe
- Micromanipulator 4060 Probe Station
- Zeiss Axio Imager M2m Microscopes
Backend & Packaging
- IPG IX-255 Excimer Micromachining Laser
- IPG IX280-DXF Green Micromachining Laser
- EVG 510 Wafer Bonder
- EVG 620 Wafer Bond Aligner
- K&S Wire Bonder
- ADT 7100 Dicing Saw
- Tousimis Critical Point Dryer
- Dimatix ink-Jet Printer