Difference between revisions of "Equipment"

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== Etching ==
 
== Etching ==
 
===== Plasma Etch =====
 
===== Plasma Etch =====
* [[Anatech SCE-108 Barrel Asher |Anatech SCE-108 Barrel Asher]]
+
* DE-02: [[Anatech SCE-108 Barrel Asher |Anatech SCE-108 Barrel Asher]]
* [[SPTS Si DRIE | SPTS Si DRIE]]   
+
* DE-03: [[SPTS Si DRIE | SPTS Si DRIE]]   
* [[Oxford 80 Plus RIE | Oxford 80 Plus RIE]]
+
* DE-04: [[Oxford 80 Plus RIE | Oxford 80 Plus RIE]]
* [[Oxford Cobra ICP Etcher | Oxford Cobra ICP Etcher]]
+
* DE-05: [[Oxford Cobra ICP Etcher | Oxford Cobra ICP Etcher]]
* [[Jupiter II RIE Plasma Etcher | Jupiter II RIE Plasma Etcher]]
+
* DE-08: [[Jupiter II RIE Plasma Etcher | Jupiter II RIE Plasma Etcher]]
  
 
==== Vapor / Wet Etch ====
 
==== Vapor / Wet Etch ====

Revision as of 12:18, 8 July 2022

Physical vapor deposition (PVD)

Evaporation
Sputtering

Chemical vapor deposition (CVD)

Etching

Plasma Etch

Vapor / Wet Etch

Lithography

E-beam Lithography

Laser Lithography

Photolithography

Imprint Lithography

Resist Coating

  • Spinner - Positive Resist (Left) - 4" Wafer Only
  • Spinner - Positive Resist (Right) - Small Piece Only
  • Spinner - Negative Resist (Left)
  • Spinner - Negative Resist (Right)
  • Spinner - E-Beam Resist Only
  • SUSS MicroTec AS8 AltaSpray

Soft Lithography

Metrology

Backend & Packaging

Thermal Processing