Difference between revisions of "Equipment"

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* [[IPG IX-255 Excimer Micromachining Laser | IPG IX-255 Excimer Micromachining Laser]]
 
* [[IPG IX-255 Excimer Micromachining Laser | IPG IX-255 Excimer Micromachining Laser]]
 
* [[IPG IX280-DXF Green Micromachining Laser | IPG IX280-DXF Green Micromachining Laser]]
 
* [[IPG IX280-DXF Green Micromachining Laser | IPG IX280-DXF Green Micromachining Laser]]
* EVG 510 Wafer Bonder
+
* [[EVG 510 Wafer Bonder | EVG 510 Wafer Bonder]]
 
* EVG 620 Wafer Bond Aligner
 
* EVG 620 Wafer Bond Aligner
 
* [[K&S Wire Bonder | K&S Wire Bonder]]
 
* [[K&S Wire Bonder | K&S Wire Bonder]]

Revision as of 14:53, 30 March 2022

Deposition

Evaporation
Sputtering
Chemical Vapor Deposition (CVD)

Etch

Plasma Etch

Vapor / Wet Etch

Lithography

E-beam Lithography

Laser Lithography

Photolithography

Imprint Lithography

Resist Coating

  • Spinner - Positive Resist (Left) - 4" Wafer Only
  • Spinner - Positive Resist (Right) - Small Piece Only
  • Spinner - Negative Resist (Left)
  • Spinner - Negative Resist (Right)
  • Spinner - E-Beam Resist Only
  • SUSS MicroTec AS8 AltaSpray

Soft Lithography

Metrology

Backend & Packaging

Thermal Processing