Difference between revisions of "Equipment"
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| Line 48: | Line 48: | ||
* Spinner - Negative Resist (Right) | * Spinner - Negative Resist (Right) | ||
* Spinner - E-Beam Resist Only | * Spinner - E-Beam Resist Only | ||
| − | * SUSS MicroTec AS8 AltaSpray | + | * [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]] |
== Soft Lithography == | == Soft Lithography == | ||
Revision as of 10:16, 30 March 2022
Deposition
Evaporation
- Lesker Nano-36 Thermal Evaporator
- Lesker PVD75 E-Beam/Thermal Evaporator
- Lesker PVD75 E-beam Evaporator
Sputtering
Chemical Vapor Deposition (CVD)
- Cambridge Nanotech S200 ALD
- Veeco Savannah 200
- Oxford PlasmaLab 100 PECVD
- Sandvik Wet/Dry Thermal Oxide Furnace
- Sandvik LPCVD Silicon Nitride Furnace
Etch
Plasma Etch
- Anatech SCE-108 Barrel Asher
- SPTS Si DRIE
- Oxford 80 Plus RIE
- Oxford Cobra ICP Etcher
- Jupiter II RIE Plasma Etcher
Vapor / Wet Etch
Lithography
E-beam Lithography
Laser Lithography
Photolithography
Imprint Lithography
Resist Coating
- Spinner - Positive Resist (Left) - 4" Wafer Only
- Spinner - Positive Resist (Right) - Small Piece Only
- Spinner - Negative Resist (Left)
- Spinner - Negative Resist (Right)
- Spinner - E-Beam Resist Only
- SUSS MicroTec AS8 AltaSpray
Soft Lithography
- Anatech SCE-106 Barrel Asher
- ABM3000HR Mask Aligner
- SCS PDS2010 Parylene Coater
- Silanization Dessicator
- Spinner - SU-8/PDMS
Metrology
- KLA Tencor P7 2D profilometer
- KLA Tencor P7 2D&3D/stress profilometer
- Filmetrics F50 (UV Filter)
- Filmetrics F50 (White Light)
- Filmetrics F40
- Zygo NewView 7300 Optical Profilometer
- Woollam V-VASE Ellipsometer
- Jandel Multi Height Four Point Probe
- Micromanipulator 4060 Probe Station
- Zeiss Axio Imager M2m Microscopes
Backend & Packaging
- IPG IX-255 Excimer Micromachining Laser
- IPG IX280-DXF Green Micromachining Laser
- EVG 510 Wafer Bonder
- EVG 620 Wafer Bond Aligner
- K&S Wire Bonder
- ADT 7100 Dicing Saw
- Tousimis Critical Point Dryer
- Dimatix ink-Jet Printer