Difference between revisions of "Equipment"

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== Thermal Processing ==
 
== Thermal Processing ==
−
* MPT Corp. RTP-600S Rapid Thermal Annealer
+
* [[MPT Corp. RTP-600S Rapid Thermal Annealer | MPT Corp. RTP-600S Rapid Thermal Annealer]]
 
* [[Sandvik Furnace Stack | Sandvik Anneal Furnace 1]]
 
* [[Sandvik Furnace Stack | Sandvik Anneal Furnace 1]]
 
* [[Sandvik Furnace Stack | Sandvik Anneal Furnace 2]]
 
* [[Sandvik Furnace Stack | Sandvik Anneal Furnace 2]]

Revision as of 11:08, 30 March 2022

Deposition

Evaporation
Sputtering
Chemical Vapor Deposition (CVD)

Etch

Plasma Etch

Vapor / Wet Etch

Lithography

E-beam Lithography

Laser Lithography

Photolithography

Imprint Lithography

Resist Coating

  • Spinner - Positive Resist (Left) - 4" Wafer Only
  • Spinner - Positive Resist (Right) - Small Piece Only
  • Spinner - Negative Resist (Left)
  • Spinner - Negative Resist (Right)
  • Spinner - E-Beam Resist Only
  • SUSS MicroTec AS8 AltaSpray

Soft Lithography

Metrology

Backend & Packaging

Thermal Processing

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