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- 13:48, 3 January 2024 diff hist +14 SUSS MicroTec MA6 Gen3 Mask Aligner update tool owner
- 13:47, 3 January 2024 diff hist +14 Nanoscribe Photonic Professional GT update tool owner
- 13:47, 3 January 2024 diff hist +14 Heidelberg DWL 66+ Laser Writer update tool owner
- 13:47, 3 January 2024 diff hist +18 m Raith EBPG5200+ E-Beam Lithography System
- 13:47, 3 January 2024 diff hist +18 m Litho Workstation for BEAMER and TRACER
- 13:46, 3 January 2024 diff hist +18 m Elionix ELS-7500EX E-Beam Lithography System
- 13:46, 3 January 2024 diff hist +16 m SPTS/Xactix XeF2 Isotropic Etcher
- 13:45, 3 January 2024 diff hist +18 m Jupiter II RIE Plasma Etcher
- 13:45, 3 January 2024 diff hist +16 m Oxford Cobra ICP Etcher
- 13:44, 3 January 2024 diff hist +16 m Oxford 80 Plus RIE
- 13:44, 3 January 2024 diff hist +16 m SPTS Si DRIE
- 13:44, 3 January 2024 diff hist +20 Anatech SCE-108 Barrel Asher update tool owner
- 13:43, 3 January 2024 diff hist +16 m Sandvik Furnace Stack
- 13:43, 3 January 2024 diff hist +16 m Oxford PlasmaLab 100 PECVD
- 13:43, 3 January 2024 diff hist +16 m Veeco Savannah 200
- 13:42, 3 January 2024 diff hist +16 m Cambridge Nanotech S200 ALD
- 13:42, 3 January 2024 diff hist -26 Denton Explorer14 Magnetron Sputterer update tool owner
- 13:41, 3 January 2024 diff hist -22 Lesker PVD75 DC/RF Sputterer update tool owner
- 13:41, 3 January 2024 diff hist -22 Lesker PVD75 E-beam Evaporator update tool owner
- 13:40, 3 January 2024 diff hist -22 Lesker PVD75 E-Beam/Thermal Evaporator
- 13:40, 3 January 2024 diff hist -22 Lesker Nano-36 Thermal Evaporator update tool owner
- 13:38, 3 January 2024 diff hist +218 QNF Equipment Owner Matrix Updating to current responsibilities, removing David Jones, Jason Rohr
- 13:18, 3 January 2024 diff hist +22 Quattrone Nanofabrication Facility →Equipment
- 18:29, 22 December 2023 diff hist +297 SUSS MicroTec MA6 Gen3 Mask Aligner →SOPs & Troubleshooting: Include common issue with user management software
- 12:34, 22 December 2023 diff hist 0 Heidelberg DWL 66+ Laser Writer →Processes: Incorrectly updated filter value, not focus value
- 15:31, 20 December 2023 diff hist +60 Raith EBPG5200+ E-Beam Lithography System Update SOP location
- 18:53, 14 December 2023 diff hist +372 ABM3000HR Mask Aligner →Applications
- 18:43, 14 December 2023 diff hist +353 ABM3000HR Mask Aligner →Applications: update information
- 18:35, 14 December 2023 diff hist +213 ABM3000HR Mask Aligner Update outline to be formatted in html syntax
- 13:08, 24 October 2023 diff hist +15 Developers at QNF current
- 13:06, 24 October 2023 diff hist +17 m Developers at QNF
- 13:54, 17 October 2023 diff hist +128 Join
- 12:41, 5 October 2023 diff hist -2 m Equipment →Soft Lithography: Corrected DE-07 label
- 12:40, 5 October 2023 diff hist +44 m Equipment →Plasma Etch: Added DE-07 note
- 15:54, 28 September 2023 diff hist +936 m Resists at QNF Updating spinner designations
- 12:49, 20 September 2023 diff hist +2 m Quattrone Nanofabrication Facility
- 12:46, 20 September 2023 diff hist +302 Join reformatting, including additional information based on repeat questions
- 11:01, 20 September 2023 diff hist +975 N Ana Cohen Add information
- 10:58, 20 September 2023 diff hist +12 m QNF Staff
- 10:34, 20 September 2023 diff hist -14 Quattrone Nanofabrication Facility reformatting, clearly displaying new user information
- 10:27, 20 September 2023 diff hist +26 Main Page reformatting, including new user set up information current
- 10:18, 20 September 2023 diff hist +5 m Main Page →New User?
- 10:17, 20 September 2023 diff hist -5 Main Page →Request Access: Title Update
- 10:16, 20 September 2023 diff hist -1 Main Page →Working With Us: Title Update
- 10:15, 20 September 2023 diff hist +144 Main Page Include "Join" info
- 10:12, 20 September 2023 diff hist 0 m Quattrone Nanofabrication Facility update to NEMO
- 11:33, 12 July 2023 diff hist +23 Filmetrics Profilm3D Updated URL
- 11:31, 12 July 2023 diff hist +23 Filmetrics Profilm3D →SOPs & Troubleshooting: URL update
- 15:24, 5 July 2023 diff hist +21 Resists at QNF →QNF Supplied Standard Photoresists: HARE thickness added
- 15:47, 3 July 2023 diff hist +4 Resists at QNF →QNF Supplied Standard Photoresists
- 15:46, 3 July 2023 diff hist +12 Resists at QNF →Other Resists
- 15:45, 3 July 2023 diff hist -17 Developers at QNF
- 15:45, 3 July 2023 diff hist +4 Developers at QNF
- 15:44, 3 July 2023 diff hist +917 N Ancillary Process Chemicals at QNF Created page with "The following are available within the QNF. {| class="wikitable sortable" ! Name !! Manufacturer !! Chemical Composition !! Hazards !! Use !! Alternatives |- | HMDS (Vapor Pr..." current
- 15:23, 3 July 2023 diff hist +64 Process Resources →Lithography: Ancillary Process Chemicals current
- 15:21, 3 July 2023 diff hist +36 Developers at QNF
- 15:21, 3 July 2023 diff hist -29 m Developers at QNF
- 15:19, 3 July 2023 diff hist +1,580 Developers at QNF
- 14:51, 3 July 2023 diff hist +8 Resists at QNF →Standard e-beam Resists
- 14:51, 3 July 2023 diff hist +32 Resists at QNF →Stockroom Photoresists
- 14:50, 3 July 2023 diff hist +16 Resists at QNF →QNF Supplied Standard Photoresists
- 14:50, 3 July 2023 diff hist -97 Resists at QNF →QNF Supplied Standard Photoresists
- 14:48, 3 July 2023 diff hist -43 Resists at QNF →Miscellaneous
- 14:48, 3 July 2023 diff hist -27 Resists at QNF →Miscellaneous
- 14:47, 3 July 2023 diff hist -10 Resists at QNF →Stockroom e-beam Resists
- 14:46, 3 July 2023 diff hist +3 Resists at QNF →Other Resists
- 14:46, 3 July 2023 diff hist -2 m Resists at QNF →Other Resists
- 14:46, 3 July 2023 diff hist -107 Resists at QNF →Other Resists
- 14:43, 3 July 2023 diff hist -7 Resists at QNF →Standard e-beam Resists: 3:1 IPA/H2O
- 14:08, 3 July 2023 diff hist +46 Process Resources →Lithography
- 14:08, 3 July 2023 diff hist -24 Process Resources →Lithography
- 14:07, 3 July 2023 diff hist +1 m Developers at QNF
- 14:07, 3 July 2023 diff hist +676 N Developers at QNF →QNF Supplied Developers
- 13:52, 3 July 2023 diff hist +24 m Process Resources →Lithography
- 13:47, 3 July 2023 diff hist -1 m Resists at QNF →QNF Supplied Standard Photoresists
- 13:47, 3 July 2023 diff hist -19 Resists at QNF →Miscellaneous
- 13:45, 3 July 2023 diff hist +6 m Resists at QNF →Stockroom e-beam Resists
- 13:44, 3 July 2023 diff hist -4 m Resists at QNF →Stockroom e-beam Resists
- 13:43, 3 July 2023 diff hist +57 m Resists at QNF →Standard e-beam Resists
- 13:40, 3 July 2023 diff hist 0 m Resists at QNF →QNF Supplied Standard Photoresists
- 13:39, 3 July 2023 diff hist 0 m Resists at QNF →Stockroom Photoresists
- 13:39, 3 July 2023 diff hist +22 m Resists at QNF →QNF Supplied Standard Photoresists
- 13:34, 3 July 2023 diff hist -108 Resists at QNF →QNF Supplied Standard Photoresists: Remove chemical names
- 16:59, 30 June 2023 diff hist 0 m Resists at QNF →Stockroom Photoresists
- 16:59, 30 June 2023 diff hist +25 Resists at QNF →Stockroom Photoresists: Thickness
- 16:58, 30 June 2023 diff hist +116 Resists at QNF Including thickness
- 16:48, 30 June 2023 diff hist +16 Resists at QNF →Stockroom Photoresists: Remover set to N/A
- 16:47, 30 June 2023 diff hist +8 Resists at QNF →QNF Supplied Standard Photoresists: HARE Remover set to N/A
- 16:34, 30 June 2023 diff hist -14 Resists at QNF Including information for e-beam resist development and removal
- 16:28, 30 June 2023 diff hist -67 m Resists at QNF
- 16:26, 30 June 2023 diff hist +1,809 Resists at QNF Including dedicated tool information, Included information for LOR and PMGI
- 15:54, 30 June 2023 diff hist +558 Resists at QNF Including dedicated tool information
- 15:49, 30 June 2023 diff hist +2,348 Resists at QNF Reorganized and updated to include tool compatibility along with composition, developer and remover chemistries
- 14:43, 30 June 2023 diff hist 0 m Resists at QNF
- 14:43, 30 June 2023 diff hist -20 Resists at QNF →QNF Supplied Standard Photoresists
- 14:41, 30 June 2023 diff hist +715 Resists at QNF →QNF Supplied Standard Photoresists: Rearranged, added chemical composition, developer and remover --- may need to be updated to reflect proper names
- 17:26, 29 June 2023 diff hist +25 m SUSS MicroTec MA6 Gen3 Mask Aligner →Processes
- 16:28, 29 June 2023 diff hist -32 m SUSS MicroTec MA6 Gen3 Mask Aligner →Processes
- 16:27, 29 June 2023 diff hist -1 m SUSS MicroTec MA6 Gen3 Mask Aligner
- 16:20, 29 June 2023 diff hist +1,867 SUSS MicroTec MA6 Gen3 Mask Aligner Including suggested exposure parameters based on datasheets, including description of wavelength selection.