Difference between revisions of "Equipment"

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== Soft Lithography ==
 
== Soft Lithography ==
−
* Anatech SCE-106 Barrel Asher
+
* [[Anatech SCE-106 Barrel Asher | Anatech SCE-106 Barrel Asher]]
 
* [[ABM3000HR Mask Aligner | ABM3000HR Mask Aligner]]
 
* [[ABM3000HR Mask Aligner | ABM3000HR Mask Aligner]]
 
* SCS PDS2010 Parylene Coater  
 
* SCS PDS2010 Parylene Coater  

Revision as of 16:18, 29 March 2022

Deposition

Evaporation
Sputtering
Chemical Vapor Deposition (CVD)

Etch

Plasma Etch

Vapor / Wet Etch

Lithography

E-beam Lithography

Laser Lithography

Photolithography

Imprint Lithography

Resist Coating

  • Spinner - Positive Resist (Left) - 4" Wafer Only
  • Spinner - Positive Resist (Right) - Small Piece Only
  • Spinner - Negative Resist (Left)
  • Spinner - Negative Resist (Right)
  • Spinner - E-Beam Resist Only
  • SUSS MicroTec AS8 AltaSpray

Soft Lithography

Metrology

  • KLA Tencor P7 2D profilometer
  • KLA Tencor P7 2D&3D/stress profilometer
  • Filmetrics F50 (yellow light)
  • Filmetrics F40
  • Zygo NewView 7300 Optical Profilometer
  • Woollam VAS Ellipsometer
  • Jandel Multi Height Four Point Probe
  • Micromanipulator 4060 Probe Station
  • Filmetrics F50 (white light)
  • Zeiss Axio Imager M2m Microscopes

Backend & Packaging

  • IPG IX-255 Excimer Micromachining Laser
  • IPG IX280-DXF Green Micromachining Laser
  • EVG 510 Wafer Bonder
  • EVG 620 Wafer Bond Aligner
  • K&S Wire Bonder
  • ADT 7100 Dicing Saw
  • Tousimis Critical Point Dryer
  • Dimatix ink-Jet Printer

Thermal Processing

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