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- m
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- This edit was performed by a bot
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1 May 2024
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11:52 | External Resources 2 changes history +1,175 [Bohnn (2×)] | |||
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11:52 (cur | prev) +124 Bohnn talk contribs | |||
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11:40 (cur | prev) +1,051 Bohnn talk contribs added brief descriptions. added myscope.training link | ||||
30 April 2024
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12:46 | IPG IX280-DXF Green Micromachining Laser 2 changes history +763 [Coana (2×)] | |||
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12:46 (cur | prev) +1,004 Coana talk contribs reorganize information, include export process | ||||
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12:42 (cur | prev) -241 Coana talk contribs →Description | |||
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11:42 | Lesker PVD75 DC/RF Sputterer 9 changes history 0 [Dsabr (9×)] | |||
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11:42 (cur | prev) -475 Dsabr talk contribs →The basics of magnetron sputtering | ||||
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11:35 (cur | prev) +191 Dsabr talk contribs →The basics of magnetron sputtering | ||||
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11:30 (cur | prev) -54 Dsabr talk contribs →The basics of magnetron sputtering | ||||
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11:26 (cur | prev) +54 Dsabr talk contribs →The basics of magnetron sputtering | ||||
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11:25 (cur | prev) -1 Dsabr talk contribs →The basics of magnetron sputtering | ||||
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11:25 (cur | prev) -45 Dsabr talk contribs →The basics of magnetron sputtering | ||||
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11:23 (cur | prev) -1 Dsabr talk contribs →The basics of magnetron sputtering | ||||
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11:23 (cur | prev) +192 Dsabr talk contribs →The basics of magnetron sputtering | ||||
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11:22 (cur | prev) +139 Dsabr talk contribs →The basics of magnetron sputtering | ||||
29 April 2024
| m 12:52 | SPTS Si DRIE diffhist -29 Dsbarth talk contribs | ||||
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11:17 | Micromanipulator 4060 Probe Station 2 changes history +89 [Dsabr (2×)] | |||
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11:17 (cur | prev) +57 Dsabr talk contribs | ||||
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11:16 (cur | prev) +32 Dsabr talk contribs →SOPs & Troubleshooting | ||||
26 April 2024
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15:07 | Micromanipulator 4060 Probe Station 8 changes history +255 [Dsabr (8×)] | |||
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15:07 (cur | prev) +12 Dsabr talk contribs | ||||
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11:27 (cur | prev) -2 Dsabr talk contribs | ||||
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11:26 (cur | prev) +28 Dsabr talk contribs | ||||
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11:26 (cur | prev) +1 Dsabr talk contribs | ||||
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11:21 (cur | prev) +13 Dsabr talk contribs | ||||
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11:19 (cur | prev) +20 Dsabr talk contribs →Applications | ||||
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11:15 (cur | prev) +79 Dsabr talk contribs | ||||
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11:11 (cur | prev) +104 Dsabr talk contribs | ||||
25 April 2024
| N 17:01 | Micromanipulator 4060 Probe Station diffhist +985 Dsabr talk contribs Created page with "Category:Electrical Characterization {{EquipmentInfo | name = Micromanipulator 4060 Probe Station | Tool_Name = Micromanipulator 4060 Probe Station | image = Image:MET-..." | ||||
| 16:59 | Equipment diffhist +42 Dsabr talk contribs →Electrical characterization | ||||
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N 16:50 | Dan Sabrsula 4 changes history +1,055 [Dsabr (4×)] | |||
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16:50 (cur | prev) -120 Dsabr talk contribs | ||||
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16:49 (cur | prev) +767 Dsabr talk contribs →Experience | ||||
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16:44 (cur | prev) +4 Dsabr talk contribs | ||||
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16:43 (cur | prev) +404 Dsabr talk contribs Created page with "__NOTOC__ {{StaffMemberInfobox |StaffName = Dan Sabrsula |StaffPhoto = Sabrsula.jpg |JobTitle = Nanofabrication Process Engineer |AreasResponsibility = PVD, Electrical Charact..." | |||
| 10:04 | Heidelberg DWL 66+ Laser Writer diffhist +63 Coana talk contribs →Processes: including developer information | ||||
24 April 2024
18 April 2024
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m 13:58 | QNF Equipment Owner Matrix 2 changes history +32 [Dsbarth (2×)] | |||
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13:58 (cur | prev) 0 Dsbarth talk contribs | |||
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13:56 (cur | prev) +32 Dsbarth talk contribs | |||
| 12:30 | ABM3000HR Mask Aligner diffhist +46 Coana talk contribs | ||||
| 12:22 | Equipment diffhist +75 Coana talk contribs →Soft Lithography | ||||
| m 12:20 | Apogee Spinner - E-Beam Resist diffhist 0 Coana talk contribs | ||||
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12:20 | Apogee Spinner - Positive Resist (Right) 2 changes history 0 [Coana (2×)] | |||
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12:20 (cur | prev) 0 Coana talk contribs | ||||
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12:19 (cur | prev) 0 Coana talk contribs | |||
17 April 2024
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11:05 | Join 5 changes history +429 [Coana; Ericdj (4×)] | |||
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11:05 (cur | prev) +109 Coana talk contribs →Access to the Quattrone Nanofabrication Facility | |||
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10:44 (cur | prev) +3 Ericdj talk contribs | ||||
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10:43 (cur | prev) -29 Ericdj talk contribs | ||||
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10:42 (cur | prev) +27 Ericdj talk contribs | ||||
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10:42 (cur | prev) +319 Ericdj talk contribs | ||||
15 April 2024
10 April 2024
9 April 2024
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13:14 | What is Chemical Vapor Deposition (CVD)? 3 changes history +153 [Lucasamb (3×)] | |||
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13:14 (cur | prev) +76 Lucasamb talk contribs | ||||
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13:12 (cur | prev) +7 Lucasamb talk contribs | ||||
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13:06 (cur | prev) +70 Lucasamb talk contribs | ||||
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11:07 | How PVD works 2 changes history +52 [Dsabr (2×)] | |||
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11:07 (cur | prev) +9 Dsabr talk contribs | ||||
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09:43 (cur | prev) +43 Dsabr talk contribs | ||||
| 10:36 | SPTS Si DRIE diffhist +34 Azadi talk contribs →Post etch sample cleaning procedure | ||||
8 April 2024
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17:02 | Equipment 2 changes history -48 [Lucasamb (2×)] | |||
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17:02 (cur | prev) -2 Lucasamb talk contribs →Chemical Vapor Deposition (CVD) | ||||
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17:01 (cur | prev) -46 Lucasamb talk contribs →Chemical Vapor Deposition (CVD) | ||||
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17:01 | How PVD works 3 changes history +544 [Dsabr (3×)] | |||
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17:01 (cur | prev) +324 Dsabr talk contribs | ||||
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16:55 (cur | prev) +205 Dsabr talk contribs | ||||
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13:56 (cur | prev) +15 Dsabr talk contribs | ||||
5 April 2024
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13:28 | Equipment 4 changes history +139 [Lucasamb (4×)] | |||
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13:28 (cur | prev) +55 Lucasamb talk contribs | ||||
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11:29 (cur | prev) +47 Lucasamb talk contribs →Chemical Vapor Deposition (CVD) | ||||
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10:55 (cur | prev) +20 Lucasamb talk contribs →Atomic layer deposition (ALD) | ||||
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10:26 (cur | prev) +17 Lucasamb talk contribs →Atomic layer deposition (ALD) | ||||
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N 11:44 | What is Chemical Vapor Deposition (CVD)? 7 changes history +1,164 [Lucasamb (7×)] | |||
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11:44 (cur | prev) -4 Lucasamb talk contribs | ||||
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11:43 (cur | prev) -3 Lucasamb talk contribs | ||||
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11:42 (cur | prev) +211 Lucasamb talk contribs | ||||
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11:34 (cur | prev) -124 Lucasamb talk contribs | ||||
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11:33 (cur | prev) +160 Lucasamb talk contribs | ||||
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11:32 (cur | prev) -3 Lucasamb talk contribs | ||||
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11:31 (cur | prev) +927 Lucasamb talk contribs Created page with "Chemical Vapor Deposition (CVD) in which thin films are deposited onto a substrate surface through the chemical reaction of vapor-phase precursor molecules. The basic process..." | |||
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N 11:22 | What is Atomic Layer Deposition? 3 changes history +1,830 [Lucasamb (3×)] | |||
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11:22 (cur | prev) -65 Lucasamb talk contribs | ||||
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11:18 (cur | prev) 0 Lucasamb talk contribs | ||||
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11:03 (cur | prev) +1,895 Lucasamb talk contribs Created page with "'''Atomic Layer Deposition (ALD)''' is a thin-film deposition technique used in the fabrication of semiconductor devices, microelectronics, and various nanotechnology applicat..." | |||
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N 10:50 | What is ALD? 5 changes history +1,895 [Lucasamb (5×)] | |||
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10:50 (cur | prev) -1 Lucasamb talk contribs | ||||
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10:50 (cur | prev) -178 Lucasamb talk contribs | ||||
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10:40 (cur | prev) +6 Lucasamb talk contribs | ||||
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10:35 (cur | prev) +2,058 Lucasamb talk contribs | ||||
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10:27 (cur | prev) +10 Lucasamb talk contribs Created page with "Here it is" | |||
4 April 2024
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13:12 | Equipment 2 changes history -10 [Dsabr; Azadi] | |||
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13:12 (cur | prev) 0 Azadi talk contribs →Etching | ||||
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11:13 (cur | prev) -10 Dsabr talk contribs →Physical Vapor Deposition (PVD) | ||||
| m 12:48 | Lesker PVD75 E-beam Evaporator diffhist -4 Dsbarth talk contribs | ||||