New pages
Jump to navigation
Jump to search
- 11:31, 5 April 2024 What is Chemical Vapor Deposition (CVD)? (hist | edit) [1,317 bytes] Lucasamb (talk | contribs) (Created page with "Chemical Vapor Deposition (CVD) in which thin films are deposited onto a substrate surface through the chemical reaction of vapor-phase precursor molecules. The basic process...")
- 11:03, 5 April 2024 What is Atomic Layer Deposition? (hist | edit) [1,830 bytes] Lucasamb (talk | contribs) (Created page with "'''Atomic Layer Deposition (ALD)''' is a thin-film deposition technique used in the fabrication of semiconductor devices, microelectronics, and various nanotechnology applicat...")
- 10:27, 5 April 2024 What is ALD? (hist | edit) [1,895 bytes] Lucasamb (talk | contribs) (Created page with "Here it is")
- 11:13, 4 April 2024 How PVD works (hist | edit) [11,588 bytes] Dsabr (talk | contribs) (Created page with "this is how")
- 15:46, 25 March 2024 How plasma etch works (hist | edit) [8,063 bytes] Azadi (talk | contribs) (Created page with "Plasma etching is a crucial process in semiconductor manufacturing, enabling the precise fabrication of intricate patterns on silicon wafers. This technique is fundamental in...")
- 15:45, 25 March 2024 Ever wondered how plasma etch works? (hist | edit) [3,243 bytes] Azadi (talk | contribs) (Created page with "Plasma etching is a crucial process in semiconductor manufacturing, enabling the precise fabrication of intricate patterns on silicon wafers. This technique is fundamental in...")
- 10:57, 20 March 2024 Fiji G2 ALD (hist | edit) [949 bytes] Azadi (talk | contribs) (Created page with "Category:Deposition {{EquipmentInfo | name = Veeco Fiji G2 | Tool_Name = Veeco Figi G2 | image = 300px | imagecaption = | Instrument_Type = Deposit...")
- 10:33, 20 March 2024 Lucas Barreto (hist | edit) [805 bytes] Dsbarth (talk | contribs) (Created page with "__NOTOC__ {{StaffMemberInfobox |StaffName = Lucas Barreto |StaffPhoto = Barreto.jpg |JobTitle = Principal Scientist |AreasResponsibility = CVD, Process Development |PennID = l...")
- 15:16, 5 March 2024 Gatan Solarus 950 Advanced Plasma System (hist | edit) [936 bytes] Bohnn (talk | contribs) (created page. brief description)
- 15:06, 5 March 2024 EMS/Quorum Q150T ES Sputter Coater (hist | edit) [964 bytes] Bohnn (talk | contribs) (created page. brief description.)
- 12:54, 5 March 2024 Sample Preparation (hist | edit) [2,718 bytes] Bohnn (talk | contribs) (created page. may need more info for TEM preparation)
- 16:17, 22 February 2024 STEM (hist | edit) [1,912 bytes] Bohnn (talk | contribs) (created page. general summary of modes available in TEM/SEM. equipment. theory.)
- 17:16, 19 February 2024 EBSD (hist | edit) [800 bytes] Bohnn (talk | contribs) (created page. overview, theory, equipment. may review for better description)
- 14:52, 16 February 2024 Low Voltage SEM (hist | edit) [918 bytes] Bohnn (talk | contribs) (created page. overview, theory, equipment)
- 12:34, 16 February 2024 External Resources (hist | edit) [1,986 bytes] Bohnn (talk | contribs) (created page. added key texts for TEM, SEM, FIB, EDS.)
- 16:42, 15 February 2024 Low Vacuum SEM (hist | edit) [1,891 bytes] Bohnn (talk | contribs) (created page. overview and theory)
- 13:43, 14 February 2024 Focused Ion Beam Microscopy (hist | edit) [575 bytes] Bohnn (talk | contribs) (created page. will fill in key principles later)
- 12:28, 14 February 2024 Transmission Electron Microscopy (hist | edit) [458 bytes] Bohnn (talk | contribs) (created page. will fill in key principles later)
- 12:12, 14 February 2024 JEOL F200 (hist | edit) [1,146 bytes] Bohnn (talk | contribs) (created page. added image, modified Singh website description)
- 11:52, 14 February 2024 JEOL NEOARM (hist | edit) [1,819 bytes] Bohnn (talk | contribs) (created page. overview, image. copied description from main Singh website)
- 16:41, 13 February 2024 EDS (hist | edit) [995 bytes] Bohnn (talk | contribs) (created page. overview and available equipment)
- 14:55, 13 February 2024 Scanning Electron Microscopy (hist | edit) [2,922 bytes] Bohnn (talk | contribs) (created page. wrote overview and key principles.)
- 13:47, 13 February 2024 TESCAN S8000X FIB/SEM (hist | edit) [2,185 bytes] Bohnn (talk | contribs) (created page. photo and about. copied description from Singh website and split into sections.)
- 16:42, 12 February 2024 JEOL 7500F HRSEM (hist | edit) [1,384 bytes] Bohnn (talk | contribs) (Created page with "Category:Characterization {{EquipmentInfo | name = JEOL 7500F HRSEM | Tool_Name = 7500F | image = 300px | imagecaption = | Instrument_Type = SEM | Sta...")
- 16:10, 12 February 2024 TFS Quanta 600 FEG ESEM (hist | edit) [2,047 bytes] Bohnn (talk | contribs) (created page. photo and about. copied description from Singh website and split into sections.)
- 13:17, 12 February 2024 Nanoscale Characterization Facility (hist | edit) [2,053 bytes] Bohnn (talk | contribs) (created page: added photo and about.)
- 15:22, 6 February 2024 Apogee Spinner - E-Beam Resist (hist | edit) [1,117 bytes] Coana (talk | contribs) (Created page with "Category:Lithography {{EquipmentInfo | name = Apogee Spinner - E-Beam Resist | Tool_Name = Apogee Spinner - E-Beam Resist | image = | imagecaption = | Instrument_Type =...")
- 15:20, 6 February 2024 Apogee Spinner - Positive Resist (Right) (hist | edit) [1,189 bytes] Coana (talk | contribs) (Created page with "Category:Lithography {{EquipmentInfo | name = Apogee Spinner - Positive Resist (Right) | Tool_Name = Apogee Spinner - Positive Resist (Right) | image = | imagecaption =...")
- 15:14, 6 February 2024 Apogee Spinner - Positive Resist (Left) (hist | edit) [1,163 bytes] Coana (talk | contribs) (Created page with "Category:Soft Lithography {{EquipmentInfo | name = Apogee Spinner - Positive Resist (Left) | Tool_Name = Apogee Spinner - Positive Resist (Left) | image = | imagecaption...")