Difference between revisions of "Resists at QNF"

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=== Stockroom Photoresists ===
 
=== Stockroom Photoresists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
+
! Name / Datasheet !! Tone, Thickness !! Sensitivity !! Uses !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 2005] || - || Cyclopentanone || Epoxy, 4um-7um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 2
+
| [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 3050] || negative,<br> 40um-100um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA || N/A || HARE SQ 50
 
|-
 
|-
−
| [https://upenn.box.com/s/s4noknbqlyh8inq3gqycw115b7ufdibu SU-8 2050] || - || Cyclopentanone || Epoxy, 40um-170um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50
+
| HARE SQ-5 || negative,<br> 4um-10um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA || N/A ||
 
|-
 
|-
−
| [https://upenn.box.com/s/va40gxhk7ghwl8p9hhsyvr0rairc9v1e SU-8 2100] || - || Cyclopentanone || Epoxy, 100um-270um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50
+
| HARE SQ-10 || negative,<br> 7-20um || i-line & broadband || Epoxy, 40um-170um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA || N/A ||
 
|-
 
|-
−
| [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 3050] || - || Cyclopentanone || Epoxy, 40um-100um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50
+
| HARE SQ-25 || negative,<br> 12um-50um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA || N/A ||
 
|}
 
|}
  

Revision as of 12:24, 16 January 2025

The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.

QNF Supplied Standard Photoresists

Name / Datasheet Tone, Thickness Sensitivity Uses Tool Compatibility Developer Remover Alternative Resists
S1805 positive,
0.5-1um		 g-line & broadband General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP KL5305
S1813 positive,
1-2um		 g-line & broadband General MA-01, LW-01,
SPN-01, SPN-03, RC-01		 TMAH NMP KL5315
S1818 positive,
1.7-2.7um		 g-line & broadband General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP
SPR 220-3 positive,
2.5-5um		 i-line, g-line & broadband Etch, Plating MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-4.5 positive,
3.5-8um		 i-line, g-line & broadband Etch, Plating MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-7 positive,
6um-12um		 i-line, g-line & broadband Etch, Plating MA-01,
SPN-01, SPN-03		 TMAH NMP AZ 12XT, AZ P4620
AZ 3330F positive,
1-5um		 g-line, i-line, h-line & broadband General, Metal RIE, Plating MA-01,
SPN-01, SPN-03		 TMAH or AZ400K 1:4 SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
NR7-3000P negative,
2-5um		 i-line Etch, General MA-01,
SPN-01, SPN-03, SPN-04		 TMAH
APOL-LO 3202 negative,
2-4um		 i-line & broadband Liftoff MA-01,
SPN-01, SPN-03, SPN-04, RC-01		 TMAH NMP
HARE SQ 2 negative,
2um-5um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA, IPA N/A SU-8 2005
HARE SQ 50 negative,
25um-100um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA, IPA N/A SU-8 2050
IP-Dip negative,
N/A		 2PP Small Features LW-02 PGMEA, IPA N/A IP-L
IP-S negative,
N/A		 2PP Medium Features LW-02 PGMEA, IPA N/A IP-L
IP-Q negative,
N/A		 2PP Large Features LW-02 PGMEA, IPA N/A

Stockroom Photoresists

Name / Datasheet Tone, Thickness Sensitivity Uses Tool Compatibility Developer Remover Alternative Resists
SU-8 3050 negative,
40um-100um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA N/A HARE SQ 50
HARE SQ-5 negative,
4um-10um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA N/A
HARE SQ-10 negative,
7-20um		 i-line & broadband Epoxy, 40um-170um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA N/A
HARE SQ-25 negative,
12um-50um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA N/A

Standard e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
495 PMMA A8 + Anisole Lower Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A4 + Anisole Lower Resolution, 180nm-300nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A2 + Anisole Lower Resolution, 50nm-100nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A4 + Anisole High Resolution, 200nm-400nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A2 + Anisole High Resolution, 50nm-100nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 1000 HARP 0.1
1000 HARP 1.3 + Anisole High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
1000 HARP 0.1 + Anisole High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 950 PMMA A2

Stockroom e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
ZEP 520A + Anisole Thicker formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
ZEP 520A-7 + Anisole Thinner formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
H-SiQ 6% - MIBK HSQ Equivalent EBL-01, EBL-03, SPN-06 TMAH

Other Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
LOR 3A N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 5S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 2S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
NXR-1025 N/A Proprietary Stockroom, Nanoimprint MA-02

Miscellaneous

These may be available but are not guaranteed to be stocked

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
KL5305 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1805
KL5315 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1813
KL6003 + PGMEA MA-01, SPN-01, SPN-03 TMAH NMP SPR 220-3, SPR 220-4.5
K-PRO 3 + PGMEA Plating, Etching MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 NMP SPR 220-3, SPR 220-4.5
AZ 12XT-20PL-15 + PGMEA CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um MA-01, SPN-01, SPN-03 TMAH SPR 220-7, AZ P4620
AZ P4620 + PGMEA Thick Resist, Plating, Packaging MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 SPR 220-7, AZ 12XT-20PL-15
ma-N 2403 - NMP, Butyl acetate, Cyclohexanone e-beam/DUV Mix and Match EBL-01, EBL-03, SPN-06
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