Difference between revisions of "Resists at QNF"

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=== QNF Supplied Standard Photoresists ===
 
=== QNF Supplied Standard Photoresists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
+
! Name / Datasheet !! Tone, Thickness !! Sensitivity !! Uses !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || KL5305
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || positive,<br> 0.5-1um || g-line & broadband || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || KL5305
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General, 1um-1.3um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP || KL5315
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || positive,<br> 1-2um || g-line & broadband || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP || KL5315
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP ||
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || positive,<br> 1.7-2.7um || g-line & broadband || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP ||
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 2um-5um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || KPRO-3, KL6003, AZ3330F
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || positive,<br> 2.5-5um || i-line, g-line & broadband || Etch, Plating || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]]|| TMAH || NMP || KPRO-3, KL6003, AZ3330F
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || positive,<br> 3.5-8um || i-line, g-line & broadband || Etch, Plating || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]]|| TMAH || NMP || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 6um-12um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || AZ 12XT, AZ P4620
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || positive,<br> 6um-12um || i-line, g-line & broadband || Etch, Plating || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || AZ 12XT, AZ P4620
 
|-
 
|-
−
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating  || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH or AZ400K 1:4 || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
+
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || positive,<br> 1-5um || g-line, i-line, h-line & broadband || General, Metal RIE, Plating  || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH or AZ400K 1:4 || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
 
|-
 
|-
−
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04 || TMAH || ||  
+
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || negative,<br> 2-5um || i-line || Etch, General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04 || TMAH || ||  
 
|-
 
|-
−
|  [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04, [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP ||
+
|  [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || negative,<br> 2-4um || i-line & broadband || Liftoff || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04, [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP ||
 
|-
 
|-
−
| IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || [[Nanoscribe Photonic Professional GT | LW-02]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A ||  
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || negative,<br> 2um-5um || i-line & broadband || Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA, IPA || N/A || SU-8 2005
 
|-
 
|-
−
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy, 2um-5um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2005
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || negative,<br> 25um-100um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA, IPA || N/A || SU-8 2050
 
|-
 
|-
−
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy, 25um-100um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2050
+
| IP-Dip || negative,<br> N/A || 2PP || Small Features || [[Nanoscribe Photonic Professional GT | LW-02]] || PGMEA, IPA || N/A || IP-L
 +
|-
 +
| IP-S || negative,<br> N/A || 2PP || Medium Features || [[Nanoscribe Photonic Professional GT | LW-02]] || PGMEA, IPA || N/A || IP-L
 +
|-
 +
| IP-Q || negative,<br> N/A || 2PP || Large Features || [[Nanoscribe Photonic Professional GT | LW-02]] || PGMEA, IPA || N/A ||  
 
|}
 
|}
  

Revision as of 12:17, 16 January 2025

The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.

QNF Supplied Standard Photoresists

Name / Datasheet Tone, Thickness Sensitivity Uses Tool Compatibility Developer Remover Alternative Resists
S1805 positive,
0.5-1um		 g-line & broadband General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP KL5305
S1813 positive,
1-2um		 g-line & broadband General MA-01, LW-01,
SPN-01, SPN-03, RC-01		 TMAH NMP KL5315
S1818 positive,
1.7-2.7um		 g-line & broadband General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP
SPR 220-3 positive,
2.5-5um		 i-line, g-line & broadband Etch, Plating MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-4.5 positive,
3.5-8um		 i-line, g-line & broadband Etch, Plating MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-7 positive,
6um-12um		 i-line, g-line & broadband Etch, Plating MA-01,
SPN-01, SPN-03		 TMAH NMP AZ 12XT, AZ P4620
AZ 3330F positive,
1-5um		 g-line, i-line, h-line & broadband General, Metal RIE, Plating MA-01,
SPN-01, SPN-03		 TMAH or AZ400K 1:4 SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
NR7-3000P negative,
2-5um		 i-line Etch, General MA-01,
SPN-01, SPN-03, SPN-04		 TMAH
APOL-LO 3202 negative,
2-4um		 i-line & broadband Liftoff MA-01,
SPN-01, SPN-03, SPN-04, RC-01		 TMAH NMP
HARE SQ 2 negative,
2um-5um		 i-line & broadband Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA, IPA N/A SU-8 2005
HARE SQ 50 negative,
25um-100um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA, IPA N/A SU-8 2050
IP-Dip negative,
N/A		 2PP Small Features LW-02 PGMEA, IPA N/A IP-L
IP-S negative,
N/A		 2PP Medium Features LW-02 PGMEA, IPA N/A IP-L
IP-Q negative,
N/A		 2PP Large Features LW-02 PGMEA, IPA N/A

Stockroom Photoresists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
SU-8 2005 - Cyclopentanone Epoxy, 4um-7um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 2
SU-8 2050 - Cyclopentanone Epoxy, 40um-170um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50
SU-8 2100 - Cyclopentanone Epoxy, 100um-270um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50
SU-8 3050 - Cyclopentanone Epoxy, 40um-100um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50

Standard e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
495 PMMA A8 + Anisole Lower Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A4 + Anisole Lower Resolution, 180nm-300nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A2 + Anisole Lower Resolution, 50nm-100nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A4 + Anisole High Resolution, 200nm-400nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A2 + Anisole High Resolution, 50nm-100nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 1000 HARP 0.1
1000 HARP 1.3 + Anisole High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
1000 HARP 0.1 + Anisole High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 950 PMMA A2

Stockroom e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
ZEP 520A + Anisole Thicker formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
ZEP 520A-7 + Anisole Thinner formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
H-SiQ 6% - MIBK HSQ Equivalent EBL-01, EBL-03, SPN-06 TMAH

Other Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
LOR 3A N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 5S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 2S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
NXR-1025 N/A Proprietary Stockroom, Nanoimprint MA-02

Miscellaneous

These may be available but are not guaranteed to be stocked

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
KL5305 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1805
KL5315 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1813
KL6003 + PGMEA MA-01, SPN-01, SPN-03 TMAH NMP SPR 220-3, SPR 220-4.5
K-PRO 3 + PGMEA Plating, Etching MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 NMP SPR 220-3, SPR 220-4.5
AZ 12XT-20PL-15 + PGMEA CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um MA-01, SPN-01, SPN-03 TMAH SPR 220-7, AZ P4620
AZ P4620 + PGMEA Thick Resist, Plating, Packaging MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 SPR 220-7, AZ 12XT-20PL-15
ma-N 2403 - NMP, Butyl acetate, Cyclohexanone e-beam/DUV Mix and Match EBL-01, EBL-03, SPN-06
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