Difference between revisions of "Resists at QNF"
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! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ||
|- | |- | ||
| − | | [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 2005] || - || Cyclopentanone || Epoxy, 4um-7um || [ | + | | [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 2005] || - || Cyclopentanone || Epoxy, 4um-7um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 2 |
|- | |- | ||
| − | | [https://upenn.box.com/s/s4noknbqlyh8inq3gqycw115b7ufdibu SU-8 2050] || - || Cyclopentanone || Epoxy, 40um-170um || [ | + | | [https://upenn.box.com/s/s4noknbqlyh8inq3gqycw115b7ufdibu SU-8 2050] || - || Cyclopentanone || Epoxy, 40um-170um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50 |
|- | |- | ||
| − | | [https://upenn.box.com/s/va40gxhk7ghwl8p9hhsyvr0rairc9v1e SU-8 2100] || - || Cyclopentanone || Epoxy, 100um-270um || [ | + | | [https://upenn.box.com/s/va40gxhk7ghwl8p9hhsyvr0rairc9v1e SU-8 2100] || - || Cyclopentanone || Epoxy, 100um-270um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50 |
|- | |- | ||
| − | | [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 3050] || - || Cyclopentanone || Epoxy, 40um-100um || [ | + | | [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 3050] || - || Cyclopentanone || Epoxy, 40um-100um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50 |
|} | |} | ||
Latest revision as of 16:53, 18 June 2024
The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.
QNF Supplied Standard Photoresists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| S1805 | + | PGMEA | General | MA-01, LW-01, SPN-01, SPN-03 |
TMAH | NMP | KL5305 |
| S1813 | + | PGMEA | General, 1um-1.3um | MA-01, LW-01, SPN-01, SPN-03, RC-01 |
TMAH | NMP | KL5315 |
| S1818 | + | PGMEA | General | MA-01, LW-01, SPN-01, SPN-03 |
TMAH | NMP | |
| SPR 220-3 | + | Ethyl lactate, anisole, n-amyl acetate | Etch, 2um-5um | MA-01, SPN-01, SPN-03 |
TMAH | NMP | KPRO-3, KL6003, AZ3330F |
| SPR 220-4.5 | + | Ethyl lactate, anisole, n-amyl acetate | Etch | MA-01, SPN-01, SPN-03 |
TMAH | NMP | KPRO-3, KL6003, AZ3330F |
| SPR 220-7 | + | Ethyl lactate, anisole, n-amyl acetate | Etch, 6um-12um | MA-01, SPN-01, SPN-03 |
TMAH | NMP | AZ 12XT, AZ P4620 |
| AZ 3330F | + | PGMEA | General, Metal RIE, Plating | MA-01, SPN-01, SPN-03 |
TMAH or AZ400K 1:4 | SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003 | |
| NR7-3000P | - | Cyclohexanone | Etch, General | MA-01, SPN-01, SPN-03, SPN-04 |
TMAH | ||
| APOL-LO 3202 | - | PGMEA | Liftoff | MA-01, SPN-01, SPN-03, SPN-04, RC-01 |
TMAH | NMP | |
| IP-Dip | - | Ethoxylated acrylates | Nanoscribe, Epoxy | LW-02 | PGMEA (SU-8 or HARE SQ Developer), IPA | N/A | |
| HARE SQ 2 | - | Cyclopentanone, gamma butyro lactone | Epoxy, 2um-5um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or HARE SQ Developer), IPA | N/A | SU-8 2005 |
| HARE SQ 50 | - | Cyclopentanone, gamma butyro lactone | Epoxy, 25um-100um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or HARE SQ Developer), IPA | N/A | SU-8 2050 |
Stockroom Photoresists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| SU-8 2005 | - | Cyclopentanone | Epoxy, 4um-7um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 2 |
| SU-8 2050 | - | Cyclopentanone | Epoxy, 40um-170um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 50 |
| SU-8 2100 | - | Cyclopentanone | Epoxy, 100um-270um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 50 |
| SU-8 3050 | - | Cyclopentanone | Epoxy, 40um-100um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 50 |
Standard e-beam Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| 495 PMMA A8 | + | Anisole | Lower Resolution | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 495 PMMA A4 | + | Anisole | Lower Resolution, 180nm-300nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 495 PMMA A2 | + | Anisole | Lower Resolution, 50nm-100nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 950 PMMA A4 | + | Anisole | High Resolution, 200nm-400nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 950 PMMA A2 | + | Anisole | High Resolution, 50nm-100nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | 1000 HARP 0.1 |
| 1000 HARP 1.3 | + | Anisole | High Resolution | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 1000 HARP 0.1 | + | Anisole | High Resolution | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | 950 PMMA A2 |
Stockroom e-beam Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover |
|---|---|---|---|---|---|---|
| ZEP 520A | + | Anisole | Thicker formulation | EBL-01, EBL-03, SPN-06 | Xylenes or Amyl acetate | NMP |
| ZEP 520A-7 | + | Anisole | Thinner formulation | EBL-01, EBL-03, SPN-06 | Xylenes or Amyl acetate | NMP |
| H-SiQ 6% | - | MIBK | HSQ Equivalent | EBL-01, EBL-03, SPN-06 | TMAH |
Other Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover |
|---|---|---|---|---|---|---|
| LOR 3A | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | SPN-03, SPN-04 only! Precipitates in acetone, PGMEA |
TMAH | NMP |
| PMGI SF 5S | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | SPN-03, SPN-04 only! Precipitates in acetone, PGMEA |
TMAH | NMP |
| PMGI SF 2S | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | SPN-03, SPN-04 only! Precipitates in acetone, PGMEA |
TMAH | NMP |
| NXR-1025 | N/A | Proprietary | Stockroom, Nanoimprint | MA-02 |
Miscellaneous
These may be available but are not guaranteed to be stocked
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| KL5305 | + | PGMEA | General | MA-01, SPN-01, SPN-03 | TMAH | NMP | S1805 |
| KL5315 | + | PGMEA | General | MA-01, SPN-01, SPN-03 | TMAH | NMP | S1813 |
| KL6003 | + | PGMEA | MA-01, SPN-01, SPN-03 | TMAH | NMP | SPR 220-3, SPR 220-4.5 | |
| K-PRO 3 | + | PGMEA | Plating, Etching | MA-01, SPN-01, SPN-03 | TMAH or AZ400K 1:4 | NMP | SPR 220-3, SPR 220-4.5 |
| AZ 12XT-20PL-15 | + | PGMEA | CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um | MA-01, SPN-01, SPN-03 | TMAH | SPR 220-7, AZ P4620 | |
| AZ P4620 | + | PGMEA | Thick Resist, Plating, Packaging | MA-01, SPN-01, SPN-03 | TMAH or AZ400K 1:4 | SPR 220-7, AZ 12XT-20PL-15 | |
| ma-N 2403 | - | NMP, Butyl acetate, Cyclohexanone | e-beam/DUV Mix and Match | EBL-01, EBL-03, SPN-06 |