Difference between revisions of "Resists at QNF"
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! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ||
|- | |- | ||
| − | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || [ | + | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || KL5305 |
|- | |- | ||
| − | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General, 1um-1.3um || [ | + | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General, 1um-1.3um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP || KL5315 |
|- | |- | ||
| − | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || [ | + | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || |
|- | |- | ||
| − | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 2um-5um || [ | + | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 2um-5um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || KPRO-3, KL6003, AZ3330F |
|- | |- | ||
| − | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch || [ | + | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]]|| TMAH || NMP || KPRO-3, KL6003, AZ3330F |
|- | |- | ||
| − | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 6um-12um || [ | + | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 6um-12um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || AZ 12XT, AZ P4620 |
|- | |- | ||
| − | | [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating || [ | + | | [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH or AZ400K 1:4 || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003 |
|- | |- | ||
| − | | [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || [ | + | | [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04 || TMAH || || |
|- | |- | ||
| − | | [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || [ | + | | [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04, [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP || |
|- | |- | ||
| − | | IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || [ | + | | IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || [[Nanoscribe Photonic Professional GT | LW-02]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || |
|- | |- | ||
| − | | [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy, 2um-5um || [ | + | | [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy, 2um-5um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2005 |
|- | |- | ||
| − | | [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy, 25um-100um || [ | + | | [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy, 25um-100um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2050 |
|} | |} | ||
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! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ||
|- | |- | ||
| − | | [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 2005] || - || Cyclopentanone || Epoxy, 4um-7um || [ | + | | [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 2005] || - || Cyclopentanone || Epoxy, 4um-7um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 2 |
|- | |- | ||
| − | | [https://upenn.box.com/s/s4noknbqlyh8inq3gqycw115b7ufdibu SU-8 2050] || - || Cyclopentanone || Epoxy, 40um-170um || [ | + | | [https://upenn.box.com/s/s4noknbqlyh8inq3gqycw115b7ufdibu SU-8 2050] || - || Cyclopentanone || Epoxy, 40um-170um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50 |
|- | |- | ||
| − | | [https://upenn.box.com/s/va40gxhk7ghwl8p9hhsyvr0rairc9v1e SU-8 2100] || - || Cyclopentanone || Epoxy, 100um-270um || [ | + | | [https://upenn.box.com/s/va40gxhk7ghwl8p9hhsyvr0rairc9v1e SU-8 2100] || - || Cyclopentanone || Epoxy, 100um-270um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50 |
|- | |- | ||
| − | | [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 3050] || - || Cyclopentanone || Epoxy, 40um-100um || [ | + | | [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 3050] || - || Cyclopentanone || Epoxy, 40um-100um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50 |
|} | |} | ||
| Line 47: | Line 47: | ||
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ||
|- | |- | ||
| − | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A8] || + || Anisole || Lower Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || | + | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A8] || + || Anisole || Lower Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP || |
|- | |- | ||
| − | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A4] || + || Anisole || Lower Resolution, 180nm-300nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || | + | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A4] || + || Anisole || Lower Resolution, 180nm-300nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP || |
|- | |- | ||
| − | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A2] || + || Anisole || Lower Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || | + | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A2] || + || Anisole || Lower Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP || |
|- | |- | ||
| − | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A4] || + || Anisole || High Resolution, 200nm-400nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || | + | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A4] || + || Anisole || High Resolution, 200nm-400nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP || |
|- | |- | ||
| − | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A2] || + || Anisole || High Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || 1000 HARP 0.1 | + | | [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A2] || + || Anisole || High Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP || 1000 HARP 0.1 |
|- | |- | ||
| − | | [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 1.3] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || | + | | [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 1.3] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP || |
|- | |- | ||
| − | | [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 0.1] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || 950 PMMA A2 | + | | [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 0.1] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP || 950 PMMA A2 |
|} | |} | ||
| Line 66: | Line 66: | ||
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover | ! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover | ||
|- | |- | ||
| − | | [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A] || + || Anisole || Thicker formulation || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || Xylenes or Amyl acetate || NMP | + | | [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A] || + || Anisole || Thicker formulation || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || Xylenes or Amyl acetate || NMP |
|- | |- | ||
| − | | [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A-7] || + || Anisole || Thinner formulation || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || Xylenes or Amyl acetate || NMP | + | | [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A-7] || + || Anisole || Thinner formulation || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || Xylenes or Amyl acetate || NMP |
|- | |- | ||
| − | | [https://upenn.box.com/s/bv53alommdr2en6s6byrlm4psxdjohzp H-SiQ 6%] || - || MIBK || HSQ Equivalent || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || TMAH || | + | | [https://upenn.box.com/s/bv53alommdr2en6s6byrlm4psxdjohzp H-SiQ 6%] || - || MIBK || HSQ Equivalent || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || TMAH || |
|} | |} | ||
| Line 92: | Line 92: | ||
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ||
|- | |- | ||
| − | | [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5305] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH || NMP || S1805 | + | | [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5305] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || S1805 |
|- | |- | ||
| − | | [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5315] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH || NMP || S1813 | + | | [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5315] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || S1813 |
|- | |- | ||
| − | | [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f KL6003] || + || PGMEA || || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH || NMP || SPR 220-3, SPR 220-4.5 | + | | [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f KL6003] || + || PGMEA || || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || SPR 220-3, SPR 220-4.5 |
|- | |- | ||
| − | | [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f K-PRO 3] || + || PGMEA || Plating, Etching || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH or AZ400K 1:4 || NMP || SPR 220-3, SPR 220-4.5 | + | | [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f K-PRO 3] || + || PGMEA || Plating, Etching || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH or AZ400K 1:4 || NMP || SPR 220-3, SPR 220-4.5 |
|- | |- | ||
| − | | [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 AZ 12XT-20PL-15] || + || PGMEA || CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH || || SPR 220-7, AZ P4620 | + | | [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 AZ 12XT-20PL-15] || + || PGMEA || CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || || SPR 220-7, AZ P4620 |
|- | |- | ||
| − | | [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 AZ P4620] || + || PGMEA || Thick Resist, Plating, Packaging || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH or AZ400K 1:4 || || SPR 220-7, AZ 12XT-20PL-15 | + | | [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 AZ P4620] || + || PGMEA || Thick Resist, Plating, Packaging || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH or AZ400K 1:4 || || SPR 220-7, AZ 12XT-20PL-15 |
|- | |- | ||
| − | | [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep ma-N 2403] || - || NMP, Butyl acetate, Cyclohexanone || e-beam/DUV Mix and Match || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || || || | + | | [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep ma-N 2403] || - || NMP, Butyl acetate, Cyclohexanone || e-beam/DUV Mix and Match || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || || || |
|} | |} | ||
Latest revision as of 16:53, 18 June 2024
The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.
QNF Supplied Standard Photoresists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| S1805 | + | PGMEA | General | MA-01, LW-01, SPN-01, SPN-03 |
TMAH | NMP | KL5305 |
| S1813 | + | PGMEA | General, 1um-1.3um | MA-01, LW-01, SPN-01, SPN-03, RC-01 |
TMAH | NMP | KL5315 |
| S1818 | + | PGMEA | General | MA-01, LW-01, SPN-01, SPN-03 |
TMAH | NMP | |
| SPR 220-3 | + | Ethyl lactate, anisole, n-amyl acetate | Etch, 2um-5um | MA-01, SPN-01, SPN-03 |
TMAH | NMP | KPRO-3, KL6003, AZ3330F |
| SPR 220-4.5 | + | Ethyl lactate, anisole, n-amyl acetate | Etch | MA-01, SPN-01, SPN-03 |
TMAH | NMP | KPRO-3, KL6003, AZ3330F |
| SPR 220-7 | + | Ethyl lactate, anisole, n-amyl acetate | Etch, 6um-12um | MA-01, SPN-01, SPN-03 |
TMAH | NMP | AZ 12XT, AZ P4620 |
| AZ 3330F | + | PGMEA | General, Metal RIE, Plating | MA-01, SPN-01, SPN-03 |
TMAH or AZ400K 1:4 | SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003 | |
| NR7-3000P | - | Cyclohexanone | Etch, General | MA-01, SPN-01, SPN-03, SPN-04 |
TMAH | ||
| APOL-LO 3202 | - | PGMEA | Liftoff | MA-01, SPN-01, SPN-03, SPN-04, RC-01 |
TMAH | NMP | |
| IP-Dip | - | Ethoxylated acrylates | Nanoscribe, Epoxy | LW-02 | PGMEA (SU-8 or HARE SQ Developer), IPA | N/A | |
| HARE SQ 2 | - | Cyclopentanone, gamma butyro lactone | Epoxy, 2um-5um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or HARE SQ Developer), IPA | N/A | SU-8 2005 |
| HARE SQ 50 | - | Cyclopentanone, gamma butyro lactone | Epoxy, 25um-100um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or HARE SQ Developer), IPA | N/A | SU-8 2050 |
Stockroom Photoresists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| SU-8 2005 | - | Cyclopentanone | Epoxy, 4um-7um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 2 |
| SU-8 2050 | - | Cyclopentanone | Epoxy, 40um-170um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 50 |
| SU-8 2100 | - | Cyclopentanone | Epoxy, 100um-270um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 50 |
| SU-8 3050 | - | Cyclopentanone | Epoxy, 40um-100um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 50 |
Standard e-beam Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| 495 PMMA A8 | + | Anisole | Lower Resolution | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 495 PMMA A4 | + | Anisole | Lower Resolution, 180nm-300nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 495 PMMA A2 | + | Anisole | Lower Resolution, 50nm-100nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 950 PMMA A4 | + | Anisole | High Resolution, 200nm-400nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 950 PMMA A2 | + | Anisole | High Resolution, 50nm-100nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | 1000 HARP 0.1 |
| 1000 HARP 1.3 | + | Anisole | High Resolution | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 1000 HARP 0.1 | + | Anisole | High Resolution | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | 950 PMMA A2 |
Stockroom e-beam Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover |
|---|---|---|---|---|---|---|
| ZEP 520A | + | Anisole | Thicker formulation | EBL-01, EBL-03, SPN-06 | Xylenes or Amyl acetate | NMP |
| ZEP 520A-7 | + | Anisole | Thinner formulation | EBL-01, EBL-03, SPN-06 | Xylenes or Amyl acetate | NMP |
| H-SiQ 6% | - | MIBK | HSQ Equivalent | EBL-01, EBL-03, SPN-06 | TMAH |
Other Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover |
|---|---|---|---|---|---|---|
| LOR 3A | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | SPN-03, SPN-04 only! Precipitates in acetone, PGMEA |
TMAH | NMP |
| PMGI SF 5S | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | SPN-03, SPN-04 only! Precipitates in acetone, PGMEA |
TMAH | NMP |
| PMGI SF 2S | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | SPN-03, SPN-04 only! Precipitates in acetone, PGMEA |
TMAH | NMP |
| NXR-1025 | N/A | Proprietary | Stockroom, Nanoimprint | MA-02 |
Miscellaneous
These may be available but are not guaranteed to be stocked
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| KL5305 | + | PGMEA | General | MA-01, SPN-01, SPN-03 | TMAH | NMP | S1805 |
| KL5315 | + | PGMEA | General | MA-01, SPN-01, SPN-03 | TMAH | NMP | S1813 |
| KL6003 | + | PGMEA | MA-01, SPN-01, SPN-03 | TMAH | NMP | SPR 220-3, SPR 220-4.5 | |
| K-PRO 3 | + | PGMEA | Plating, Etching | MA-01, SPN-01, SPN-03 | TMAH or AZ400K 1:4 | NMP | SPR 220-3, SPR 220-4.5 |
| AZ 12XT-20PL-15 | + | PGMEA | CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um | MA-01, SPN-01, SPN-03 | TMAH | SPR 220-7, AZ P4620 | |
| AZ P4620 | + | PGMEA | Thick Resist, Plating, Packaging | MA-01, SPN-01, SPN-03 | TMAH or AZ400K 1:4 | SPR 220-7, AZ 12XT-20PL-15 | |
| ma-N 2403 | - | NMP, Butyl acetate, Cyclohexanone | e-beam/DUV Mix and Match | EBL-01, EBL-03, SPN-06 |