Difference between revisions of "Resists at QNF"

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=== QNF Supplied Standard Photoresists ===
 
=== QNF Supplied Standard Photoresists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Name / Datasheet !! Tone !! Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
+
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Heidelberg_DWL_66%2B_Laser_Writer LW-01], SPN-03 || 0.24N TMAH || NMP || KL5305
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || KL5305
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General, 1um-1.3um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Heidelberg_DWL_66%2B_Laser_Writer LW-01], SPN-03 || 0.24N TMAH || NMP || KL5315
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General, 1um-1.3um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP || KL5315
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Heidelberg_DWL_66%2B_Laser_Writer LW-01], SPN-03 || 0.24N TMAH || NMP ||
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP ||
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 2um-5um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-03 || 0.24N TMAH || NMP || KPRO-3, KL6003, AZ3330F
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 2um-5um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-03 || 0.24N TMAH || NMP || KPRO-3, KL6003, AZ3330F
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]]|| TMAH || NMP || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 6um-12um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-03 || 0.24N TMAH or 0.26N TMAH || NMP || AZ 12XT, AZ P4620
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 6um-12um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH || NMP || AZ 12XT, AZ P4620
 
|-
 
|-
−
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating  || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-03 || 0.26N TMAH (AZ300MIF) or alkaline salts (AZ400K 1:4) || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
+
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating  || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH or AZ400K 1:4 || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
 
|-
 
|-
−
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01] || 0.24N or 0.26N TMAH || ||  
+
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04 || TMAH || ||  
 
|-
 
|-
−
|  [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01] || 0.26N TMAH || NMP ||
+
|  [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04, [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP ||
 
|-
 
|-
−
| IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || [https://wiki.nano.upenn.edu/wiki/index.php?title=Nanoscribe_Photonic_Professional_GT LW-02] || PGMEA, IPA || ||  
+
| IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || [[Nanoscribe Photonic Professional GT | LW-02]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A ||  
 
|-
 
|-
−
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy || [https://wiki.nano.upenn.edu/wiki/index.php?title=Spinner_-_SU-8/PDMS SPN-07], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03] || PGMEA (SQ Developer) || N/A || SU-8 2005
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy, 2um-5um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2005
 
|-
 
|-
−
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy || [https://wiki.nano.upenn.edu/wiki/index.php?title=Spinner_-_SU-8/PDMS SPN-07], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03] || PGMEA (SQ Developer) || N/A || SU-8 2050
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy, 25um-100um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2050
 
|}
 
|}
  
 
=== Stockroom Photoresists ===
 
=== Stockroom Photoresists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Name / Datasheet !! Tone !! Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
+
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 2005] || - || Cyclopentanone || Epoxy, 4um-7um || [https://wiki.nano.upenn.edu/wiki/index.php?title=Spinner_-_SU-8/PDMS SPN-07], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03] || PGMEA (SU-8 Developer) || N/A || HARE SQ 2
+
| [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 2005] || - || Cyclopentanone || Epoxy, 4um-7um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 2
 
|-
 
|-
−
| [https://upenn.box.com/s/s4noknbqlyh8inq3gqycw115b7ufdibu SU-8 2050] || - || Cyclopentanone || Epoxy, 40um-170um || [https://wiki.nano.upenn.edu/wiki/index.php?title=Spinner_-_SU-8/PDMS SPN-07], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03] || PGMEA (SU-8 Developer) || N/A || HARE SQ 50  
+
| [https://upenn.box.com/s/s4noknbqlyh8inq3gqycw115b7ufdibu SU-8 2050] || - || Cyclopentanone || Epoxy, 40um-170um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50  
 
|-
 
|-
−
| [https://upenn.box.com/s/va40gxhk7ghwl8p9hhsyvr0rairc9v1e SU-8 2100] || - || Cyclopentanone || Epoxy, 100um-270um || [https://wiki.nano.upenn.edu/wiki/index.php?title=Spinner_-_SU-8/PDMS SPN-07], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03] || PGMEA (SU-8 Developer) || N/A || HARE SQ 50
+
| [https://upenn.box.com/s/va40gxhk7ghwl8p9hhsyvr0rairc9v1e SU-8 2100] || - || Cyclopentanone || Epoxy, 100um-270um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50
 
|-
 
|-
−
| [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 3050] || - || Cyclopentanone || Epoxy, 40um-100um || [https://wiki.nano.upenn.edu/wiki/index.php?title=Spinner_-_SU-8/PDMS SPN-07], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03] || PGMEA (SU-8 Developer) || N/A || HARE SQ 50
+
| [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 3050] || - || Cyclopentanone || Epoxy, 40um-100um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA (SU-8 or SQ Developer) || N/A || HARE SQ 50
 
|}
 
|}
  
 
=== Standard e-beam Resists ===
 
=== Standard e-beam Resists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Name / Datasheet !! Tone !! Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
+
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A8] || + || Anisole || Lower Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || 3:1 IPA/H2O || NMP ||  
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A8] || + || Anisole || Lower Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP ||  
 
|-
 
|-
−
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A4] || + || Anisole || Lower Resolution, 180nm-300nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || 3:1 IPA/H2O || NMP ||
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A4] || + || Anisole || Lower Resolution, 180nm-300nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP ||
 
|-
 
|-
−
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A2] || + || Anisole || Lower Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || 3:1 IPA/H2O || NMP ||
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A2] || + || Anisole || Lower Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP ||
 
|-
 
|-
−
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A4] || + || Anisole || High Resolution, 200nm-400nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || 3:1 IPA/H2O || NMP ||
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A4] || + || Anisole || High Resolution, 200nm-400nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP ||
 
|-
 
|-
−
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A2] || + || Anisole || High Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || 3:1 IPA/H2O || NMP || 1000 HARP 0.1
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A2] || + || Anisole || High Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP || 1000 HARP 0.1
 
|-
 
|-
−
| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 1.3] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || 3:1 IPA/H2O || NMP ||
+
| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 1.3] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP ||
 
|-  
 
|-  
−
| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 0.1] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || 3:1 IPA/H2O || NMP || 950 PMMA A2
+
| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 0.1] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || 3:1 IPA/H2O || NMP || 950 PMMA A2
 
|}
 
|}
  
Line 66: Line 66:
 
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover
 
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover
 
|-
 
|-
−
| [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A] || + || Anisole || Thicker formulation || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || Xylenes or Amyl acetate || NMP
+
| [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A] || + || Anisole || Thicker formulation || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || Xylenes or Amyl acetate || NMP
 
|-
 
|-
−
| [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A-7] || + || Anisole || Thinner formulation ||  [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || Xylenes or Amyl acetate || NMP
+
| [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A-7] || + || Anisole || Thinner formulation ||  [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || Xylenes or Amyl acetate || NMP
 
|-
 
|-
−
| [https://upenn.box.com/s/bv53alommdr2en6s6byrlm4psxdjohzp H-SiQ 6%] || - || MIBK || HSQ Equivalent || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || TMAH ||
+
| [https://upenn.box.com/s/bv53alommdr2en6s6byrlm4psxdjohzp H-SiQ 6%] || - || MIBK || HSQ Equivalent || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || TMAH ||
 
|}
 
|}
  
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! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover
 
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover
 
|-
 
|-
−
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk LOR 3A] || N/A || Cyclopentanone, PGME || Liftoff, Non-imaging || Keep away from acetone & PGMEA! || TMAH || NMP
+
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk LOR 3A] || N/A || Cyclopentanone, PGME || Liftoff, Non-imaging || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA || TMAH || NMP
 
|-
 
|-
−
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 5S] || N/A || Cyclopentanone, PGME || Liftoff, Non-imaging || Keep away from acetone & PGMEA! || TMAH || NMP
+
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 5S] || N/A || Cyclopentanone, PGME || Liftoff, Non-imaging || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA || TMAH || NMP
 
|-
 
|-
−
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 2S] || N/A || Cyclopentanone, PGME || Liftoff, Non-imaging || Keep away from acetone & PGMEA! || TMAH || NMP
+
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 2S] || N/A || Cyclopentanone, PGME || Liftoff, Non-imaging || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA || TMAH || NMP
 
|-
 
|-
−
| [https://upenn.box.com/s/wmal2jasuw6m9nqjykz6p8i2ijdn61fm NXR-1025] || N/A || || Stockroom, Nanoimprint || [https://wiki.nano.upenn.edu/wiki/index.php?title=Nanonex_NX2600_Nanoimprint MA-02] ||
+
| [https://upenn.box.com/s/wmal2jasuw6m9nqjykz6p8i2ijdn61fm NXR-1025] || N/A || Proprietary || Stockroom, Nanoimprint || [https://wiki.nano.upenn.edu/wiki/index.php?title=Nanonex_NX2600_Nanoimprint MA-02] ||
 
|}
 
|}
  
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! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5305] || + || PGMEA || General || || TMAH || NMP || S1805
+
| [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5305] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || S1805
 
|-
 
|-
−
| [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5315] || + || PGMEA || General || || TMAH || NMP || S1813
+
| [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5315] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || S1813
 
|-
 
|-
−
| [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f KL6003] || + || PGMEA ||  || || TMAH || NMP || SPR 220-3, SPR 220-4.5
+
| [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f KL6003] || + || PGMEA ||  || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || SPR 220-3, SPR 220-4.5
 
|-
 
|-
−
| [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f K-PRO 3] || + || PGMEA || Plating, Etching || || TMAH or alkaline salts || NMP || SPR 220-3, SPR 220-4.5
+
| [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f K-PRO 3] || + || PGMEA || Plating, Etching || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH or AZ400K 1:4 || NMP || SPR 220-3, SPR 220-4.5
 
|-
 
|-
−
| [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 AZ 12XT-20PL-15] || + || PGMEA || CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um  || || TMAH (AZ300MIF) || || SPR 220-7, AZ P4620
+
| [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 AZ 12XT-20PL-15] || + || PGMEA || CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um  || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || || SPR 220-7, AZ P4620
 
|-
 
|-
−
| [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 AZ P4620] || + || PGMEA || Thick Resist, Plating, Packaging || || TMAH (AZ300MIF) or alkaline salts (AZ400K 1:4) || || SPR 220-7, AZ 12XT-20PL-15
+
| [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 AZ P4620] || + || PGMEA || Thick Resist, Plating, Packaging || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH or AZ400K 1:4 || || SPR 220-7, AZ 12XT-20PL-15
 
|-
 
|-
−
| [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep ma-N 2403] || - || || e-beam/DUV Mix and Match || || || ||
+
| [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep ma-N 2403] || - || NMP, Butyl acetate, Cyclohexanone || e-beam/DUV Mix and Match || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || || ||
 
|}
 
|}

Latest revision as of 16:53, 18 June 2024

The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.

QNF Supplied Standard Photoresists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
S1805 + PGMEA General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP KL5305
S1813 + PGMEA General, 1um-1.3um MA-01, LW-01,
SPN-01, SPN-03, RC-01		 TMAH NMP KL5315
S1818 + PGMEA General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP
SPR 220-3 + Ethyl lactate, anisole, n-amyl acetate Etch, 2um-5um MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-4.5 + Ethyl lactate, anisole, n-amyl acetate Etch MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-7 + Ethyl lactate, anisole, n-amyl acetate Etch, 6um-12um MA-01,
SPN-01, SPN-03		 TMAH NMP AZ 12XT, AZ P4620
AZ 3330F + PGMEA General, Metal RIE, Plating MA-01,
SPN-01, SPN-03		 TMAH or AZ400K 1:4 SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
NR7-3000P - Cyclohexanone Etch, General MA-01,
SPN-01, SPN-03, SPN-04		 TMAH
APOL-LO 3202 - PGMEA Liftoff MA-01,
SPN-01, SPN-03, SPN-04, RC-01		 TMAH NMP
IP-Dip - Ethoxylated acrylates Nanoscribe, Epoxy LW-02 PGMEA (SU-8 or HARE SQ Developer), IPA N/A
HARE SQ 2 - Cyclopentanone, gamma butyro lactone Epoxy, 2um-5um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or HARE SQ Developer), IPA N/A SU-8 2005
HARE SQ 50 - Cyclopentanone, gamma butyro lactone Epoxy, 25um-100um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or HARE SQ Developer), IPA N/A SU-8 2050

Stockroom Photoresists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
SU-8 2005 - Cyclopentanone Epoxy, 4um-7um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 2
SU-8 2050 - Cyclopentanone Epoxy, 40um-170um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50
SU-8 2100 - Cyclopentanone Epoxy, 100um-270um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50
SU-8 3050 - Cyclopentanone Epoxy, 40um-100um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50

Standard e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
495 PMMA A8 + Anisole Lower Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A4 + Anisole Lower Resolution, 180nm-300nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A2 + Anisole Lower Resolution, 50nm-100nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A4 + Anisole High Resolution, 200nm-400nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A2 + Anisole High Resolution, 50nm-100nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 1000 HARP 0.1
1000 HARP 1.3 + Anisole High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
1000 HARP 0.1 + Anisole High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 950 PMMA A2

Stockroom e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
ZEP 520A + Anisole Thicker formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
ZEP 520A-7 + Anisole Thinner formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
H-SiQ 6% - MIBK HSQ Equivalent EBL-01, EBL-03, SPN-06 TMAH

Other Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
LOR 3A N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 5S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 2S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
NXR-1025 N/A Proprietary Stockroom, Nanoimprint MA-02

Miscellaneous

These may be available but are not guaranteed to be stocked

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
KL5305 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1805
KL5315 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1813
KL6003 + PGMEA MA-01, SPN-01, SPN-03 TMAH NMP SPR 220-3, SPR 220-4.5
K-PRO 3 + PGMEA Plating, Etching MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 NMP SPR 220-3, SPR 220-4.5
AZ 12XT-20PL-15 + PGMEA CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um MA-01, SPN-01, SPN-03 TMAH SPR 220-7, AZ P4620
AZ P4620 + PGMEA Thick Resist, Plating, Packaging MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 SPR 220-7, AZ 12XT-20PL-15
ma-N 2403 - NMP, Butyl acetate, Cyclohexanone e-beam/DUV Mix and Match EBL-01, EBL-03, SPN-06
Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF&oldid=1838"