Difference between revisions of "Resists at QNF"

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| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || positive,<br> 1-5um || g-line, i-line, h-line & broadband || General, Metal RIE, Plating  || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH or AZ400K 1:4 || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
 
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || positive,<br> 1-5um || g-line, i-line, h-line & broadband || General, Metal RIE, Plating  || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]] || TMAH or AZ400K 1:4 || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
 +
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| [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 AZ P4620] || positive,<br> 6-15um || || Thick Resist, Plating, Packaging || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH or AZ400K 1:4 || || SPR 220-7, AZ 12XT-20PL-15
 +
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 +
| [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f K-PRO 3] || positive,<br> 2-5um || || Plating, Etching || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH or AZ400K 1:4 || NMP || SPR 220-3, SPR 220-4.5
 
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| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || negative,<br> 2-5um || i-line || Etch, General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04 || TMAH || ||  
 
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || negative,<br> 2-5um || i-line || Etch, General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ CEE Apogee Spinner | SPN-01]], [[ CEE Apogee Spinner | SPN-03]], SPN-04 || TMAH || ||  
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| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || negative,<br> 2um-5um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA, IPA || N/A || SU-8 2005
 
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || negative,<br> 2um-5um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA, IPA || N/A || SU-8 2005
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| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || negative,<br> 25um-100um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA, IPA || N/A || SU-8 2050
 
 
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| IP-Dip || negative,<br> N/A || 2PP || Small Features || [[Nanoscribe Photonic Professional GT | LW-02]] || PGMEA, IPA || N/A || IP-L
 
| IP-Dip || negative,<br> N/A || 2PP || Small Features || [[Nanoscribe Photonic Professional GT | LW-02]] || PGMEA, IPA || N/A || IP-L
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| HARE SQ 25 || negative,<br> 12um-50um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA || N/A ||
 
| HARE SQ 25 || negative,<br> 12um-50um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA || N/A ||
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| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || negative,<br> 25um-100um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, [[ CEE Apogee Spinner | SPN-08]] || PGMEA, IPA || N/A || SU-8 2050
 
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! Name / Datasheet !! Tone, Thickness !! Uses !! Tool Compatibility !! Developer !! Remover
 
! Name / Datasheet !! Tone, Thickness !! Uses !! Tool Compatibility !! Developer !! Remover
 
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| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk LOR 3A] || N/A,<br> || Liftoff, Non-imaging || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA || TMAH || NMP
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| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk LOR 3A] || N/A,<br> 200-400nm || Liftoff, Non-imaging - Mid-Resolution || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA || TMAH || NMP
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| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk LOR 5C] || N/A,<br> 300-750nm || Liftoff, Non-imaging - Lower Resolution/Fast Undercut Rate || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA || TMAH || NMP
 
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| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 5S] || N/A,<br> || Liftoff, Non-imaging || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA  || TMAH || NMP
+
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 5S] || N/A,<br> || Liftoff, Non-imaging - Higher Resolution/Slow Undercut Rate || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA  || TMAH || NMP
 
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| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 2S] || N/A,<br> || Liftoff, Non-imaging || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA  || TMAH || NMP
+
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 2S] || N/A,<br> || Liftoff, Non-imaging - Higher Resolution/Slow Undercut Rate || <strong> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 only! </strong> <br> Precipitates in acetone, PGMEA  || TMAH || NMP
 
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| [https://upenn.box.com/s/wmal2jasuw6m9nqjykz6p8i2ijdn61fm NXR-1025] || N/A,<br> || Nanoimprint || [https://wiki.nano.upenn.edu/wiki/index.php?title=Nanonex_NX2600_Nanoimprint MA-02] ||
 
| [https://upenn.box.com/s/wmal2jasuw6m9nqjykz6p8i2ijdn61fm NXR-1025] || N/A,<br> || Nanoimprint || [https://wiki.nano.upenn.edu/wiki/index.php?title=Nanonex_NX2600_Nanoimprint MA-02] ||
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| [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f KL6003] || positive,<br> 2-5um ||  || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || SPR 220-3, SPR 220-4.5
 
| [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f KL6003] || positive,<br> 2-5um ||  || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || SPR 220-3, SPR 220-4.5
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| [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f K-PRO 3] || positive,<br> 2-5um || Plating, Etching || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH or AZ400K 1:4 || NMP || SPR 220-3, SPR 220-4.5
 
 
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| [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 AZ 12XT-20PL-15] || positive,<br> 10um-25um || CAR (i-line), Plating, Packaging, Deep Etch  || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || || SPR 220-7, AZ P4620
 
| [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 AZ 12XT-20PL-15] || positive,<br> 10um-25um || CAR (i-line), Plating, Packaging, Deep Etch  || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || || SPR 220-7, AZ P4620
−
|-
 
−
| [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 AZ P4620] || positive,<br> 6-15um || Thick Resist, Plating, Packaging || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH or AZ400K 1:4 || || SPR 220-7, AZ 12XT-20PL-15
 
 
|-
 
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| [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep ma-N 2403] || negative,<br> 250-500nm ||  || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || || ||
 
| [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep ma-N 2403] || negative,<br> 250-500nm ||  || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_E-Beam_Resist SPN-06] || || ||
 
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Latest revision as of 12:20, 3 March 2025

The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.

QNF Supplied Standard Photoresists

Name / Datasheet Tone, Thickness Wavelength Sensitivity Uses Tool Compatibility Developer Remover Alternative Resists
S1805 positive,
0.5-1um		 g-line & broadband General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP KL5305
S1813 positive,
1-2um		 g-line & broadband General MA-01, LW-01,
SPN-01, SPN-03, RC-01		 TMAH NMP KL5315
S1818 positive,
1.7-2.7um		 g-line & broadband General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP
SPR 220-3 positive,
2.5-5um		 i-line, g-line & broadband Etch, Plating MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-4.5 positive,
3.5-8um		 i-line, g-line & broadband Etch, Plating MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-7 positive,
6um-12um		 i-line, g-line & broadband Etch, Plating MA-01,
SPN-01, SPN-03		 TMAH NMP AZ 12XT, AZ P4620
AZ 3330F positive,
1-5um		 g-line, i-line, h-line & broadband General, Metal RIE, Plating MA-01,
SPN-01, SPN-03		 TMAH or AZ400K 1:4 SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
AZ P4620 positive,
6-15um		 Thick Resist, Plating, Packaging MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 SPR 220-7, AZ 12XT-20PL-15
K-PRO 3 positive,
2-5um		 Plating, Etching MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 NMP SPR 220-3, SPR 220-4.5
NR7-3000P negative,
2-5um		 i-line Etch, General MA-01,
SPN-01, SPN-03, SPN-04		 TMAH
APOL-LO 3202 negative,
2-4um		 i-line & broadband Liftoff MA-01,
SPN-01, SPN-03, SPN-04, RC-01		 TMAH NMP
HARE SQ 2 negative,
2um-5um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA, IPA N/A SU-8 2005
IP-Dip negative,
N/A		 2PP Small Features LW-02 PGMEA, IPA N/A IP-L
IP-S negative,
N/A		 2PP Medium Features LW-02 PGMEA, IPA N/A IP-L
IP-Q negative,
N/A		 2PP Large Features LW-02 PGMEA, IPA N/A

Stockroom Photoresists

Name / Datasheet Tone, Thickness Wavelength Sensitivity Uses Tool Compatibility Developer Remover Alternative Resists
SU-8 3050 negative,
40um-100um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA N/A HARE SQ 50
HARE SQ 5 negative,
4um-10um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA N/A
HARE SQ 10 negative,
7-20um		 i-line & broadband Epoxy, 40um-170um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA N/A
HARE SQ 25 negative,
12um-50um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA N/A
HARE SQ 50 negative,
25um-100um		 i-line & broadband Soft Lithography, Epoxy, Insulator MA-01, MA-03,
SPN-04, SPN-08		 PGMEA, IPA N/A SU-8 2050

Standard e-beam Resists

Name / Datasheet Tone, Thickness Uses Tool Compatibility Developer Remover Alternative Resists
495 PMMA A8 positive,
0.5-1um		 Lower Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A4 positive,
180nm-300nm		 Lower Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A2 positive,
50nm-100nm		 Lower Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A4 positive,
200nm-400nm		 High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A2 positive,
50nm-100nm		 High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 1000 HARP 0.1
1000 HARP 1.3 positive,
 High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
1000 HARP 0.1 positive,
 High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 950 PMMA A2

Stockroom e-beam Resists

Name / Datasheet Tone, Thickness Uses Tool Compatibility Developer Remover
ZEP 520A positive,
 Thicker formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
ZEP 520A-7 positive,
 Thinner formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
H-SiQ 6% negative,
 HSQ Equivalent EBL-01, EBL-03, SPN-06 TMAH

Other Resists

Name / Datasheet Tone, Thickness Uses Tool Compatibility Developer Remover
LOR 3A N/A,
200-400nm		 Liftoff, Non-imaging - Mid-Resolution SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
LOR 5C N/A,
300-750nm		 Liftoff, Non-imaging - Lower Resolution/Fast Undercut Rate SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 5S N/A,
 Liftoff, Non-imaging - Higher Resolution/Slow Undercut Rate SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 2S N/A,
 Liftoff, Non-imaging - Higher Resolution/Slow Undercut Rate SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
NXR-1025 N/A,
 Nanoimprint MA-02

Miscellaneous

These may be available but are not guaranteed to be stocked

Name / Datasheet Tone, Thickness Uses Tool Compatibility Developer Remover Alternative Resists
KL5305 positive,
0.5-1um		 General MA-01, SPN-01, SPN-03 TMAH NMP S1805
KL5315 positive,
1-2.5um		 General MA-01, SPN-01, SPN-03 TMAH NMP S1813
KL6003 positive,
2-5um		 MA-01, SPN-01, SPN-03 TMAH NMP SPR 220-3, SPR 220-4.5
AZ 12XT-20PL-15 positive,
10um-25um		 CAR (i-line), Plating, Packaging, Deep Etch MA-01, SPN-01, SPN-03 TMAH SPR 220-7, AZ P4620
ma-N 2403 negative,
250-500nm		 EBL-01, EBL-03, SPN-06
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