Difference between revisions of "Resists at QNF"
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! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists | ||
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| − | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || [ | + | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ Apogee Spinner - Positive Resist (Left) | SPN-01]], [[ Apogee Spinner - Positive Resist (Right) | SPN-03]] || TMAH || NMP || KL5305 |
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| − | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General, 1um-1.3um || [ | + | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General, 1um-1.3um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ Apogee Spinner - Positive Resist (Left) | SPN-01]], [[ Apogee Spinner - Positive Resist (Right) | SPN-03]], [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP || KL5315 |
|- | |- | ||
| − | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || [ | + | | [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[Heidelberg DWL 66+ Laser Writer | LW-01]],<br> [[ Apogee Spinner - Positive Resist (Left) | SPN-01]], [[ Apogee Spinner - Positive Resist (Right) | SPN-03]] || TMAH || NMP || |
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| − | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 2um-5um || [ | + | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 2um-5um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ Apogee Spinner - Positive Resist (Left) | SPN-01]], [[ Apogee Spinner - Positive Resist (Right) | SPN-03]] || TMAH || NMP || KPRO-3, KL6003, AZ3330F |
|- | |- | ||
| − | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch || [ | + | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ Apogee Spinner - Positive Resist (Left) | SPN-01]], [[ Apogee Spinner - Positive Resist (Right) | SPN-03]]|| TMAH || NMP || KPRO-3, KL6003, AZ3330F |
|- | |- | ||
| − | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 6um-12um || [ | + | | [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 6um-12um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ Apogee Spinner - Positive Resist (Left) | SPN-01]], [[ Apogee Spinner - Positive Resist (Right) | SPN-03]] || TMAH || NMP || AZ 12XT, AZ P4620 |
|- | |- | ||
| − | | [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating || [ | + | | [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ Apogee Spinner - Positive Resist (Left) | SPN-01]], [[ Apogee Spinner - Positive Resist (Right) | SPN-03]] || TMAH or AZ400K 1:4 || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003 |
|- | |- | ||
| − | | [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || [ | + | | [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ Apogee Spinner - Positive Resist (Left) | SPN-01]], [[ Apogee Spinner - Positive Resist (Right) | SPN-03]], SPN-04 || TMAH || || |
|- | |- | ||
| − | | [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || [ | + | | [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], <br> [[ Apogee Spinner - Positive Resist (Left) | SPN-01]], [[ Apogee Spinner - Positive Resist (Right) | SPN-03]], SPN-04, [[SUSS MicroTec AS8 AltaSpray | RC-01]] || TMAH || NMP || |
|- | |- | ||
| − | | IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || [ | + | | IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || [[Nanoscribe Photonic Professional GT | LW-02]] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || |
|- | |- | ||
| − | | [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy, 2um-5um || [ | + | | [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy, 2um-5um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, SPN-08 || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2005 |
|- | |- | ||
| − | | [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy, 25um-100um || [ | + | | [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy, 25um-100um || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM3000HR Mask Aligner | MA-03]], <br> SPN-04, SPN-08 || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2050 |
|} | |} | ||
Revision as of 16:26, 18 June 2024
The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.
QNF Supplied Standard Photoresists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| S1805 | + | PGMEA | General | MA-01, LW-01, SPN-01, SPN-03 |
TMAH | NMP | KL5305 |
| S1813 | + | PGMEA | General, 1um-1.3um | MA-01, LW-01, SPN-01, SPN-03, RC-01 |
TMAH | NMP | KL5315 |
| S1818 | + | PGMEA | General | MA-01, LW-01, SPN-01, SPN-03 |
TMAH | NMP | |
| SPR 220-3 | + | Ethyl lactate, anisole, n-amyl acetate | Etch, 2um-5um | MA-01, SPN-01, SPN-03 |
TMAH | NMP | KPRO-3, KL6003, AZ3330F |
| SPR 220-4.5 | + | Ethyl lactate, anisole, n-amyl acetate | Etch | MA-01, SPN-01, SPN-03 |
TMAH | NMP | KPRO-3, KL6003, AZ3330F |
| SPR 220-7 | + | Ethyl lactate, anisole, n-amyl acetate | Etch, 6um-12um | MA-01, SPN-01, SPN-03 |
TMAH | NMP | AZ 12XT, AZ P4620 |
| AZ 3330F | + | PGMEA | General, Metal RIE, Plating | MA-01, SPN-01, SPN-03 |
TMAH or AZ400K 1:4 | SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003 | |
| NR7-3000P | - | Cyclohexanone | Etch, General | MA-01, SPN-01, SPN-03, SPN-04 |
TMAH | ||
| APOL-LO 3202 | - | PGMEA | Liftoff | MA-01, SPN-01, SPN-03, SPN-04, RC-01 |
TMAH | NMP | |
| IP-Dip | - | Ethoxylated acrylates | Nanoscribe, Epoxy | LW-02 | PGMEA (SU-8 or HARE SQ Developer), IPA | N/A | |
| HARE SQ 2 | - | Cyclopentanone, gamma butyro lactone | Epoxy, 2um-5um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or HARE SQ Developer), IPA | N/A | SU-8 2005 |
| HARE SQ 50 | - | Cyclopentanone, gamma butyro lactone | Epoxy, 25um-100um | MA-01, MA-03, SPN-04, SPN-08 |
PGMEA (SU-8 or HARE SQ Developer), IPA | N/A | SU-8 2050 |
Stockroom Photoresists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| SU-8 2005 | - | Cyclopentanone | Epoxy, 4um-7um | MA-01, MA-03, SPN-04, SPN-08 | PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 2 |
| SU-8 2050 | - | Cyclopentanone | Epoxy, 40um-170um | MA-01, MA-03, SPN-04, SPN-08 | PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 50 |
| SU-8 2100 | - | Cyclopentanone | Epoxy, 100um-270um | MA-01, MA-03, SPN-04, SPN-08 | PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 50 |
| SU-8 3050 | - | Cyclopentanone | Epoxy, 40um-100um | MA-01, MA-03, SPN-04, SPN-08 | PGMEA (SU-8 or SQ Developer) | N/A | HARE SQ 50 |
Standard e-beam Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| 495 PMMA A8 | + | Anisole | Lower Resolution | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 495 PMMA A4 | + | Anisole | Lower Resolution, 180nm-300nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 495 PMMA A2 | + | Anisole | Lower Resolution, 50nm-100nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 950 PMMA A4 | + | Anisole | High Resolution, 200nm-400nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 950 PMMA A2 | + | Anisole | High Resolution, 50nm-100nm | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | 1000 HARP 0.1 |
| 1000 HARP 1.3 | + | Anisole | High Resolution | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | |
| 1000 HARP 0.1 | + | Anisole | High Resolution | EBL-01, EBL-03, SPN-06 | 3:1 IPA/H2O | NMP | 950 PMMA A2 |
Stockroom e-beam Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover |
|---|---|---|---|---|---|---|
| ZEP 520A | + | Anisole | Thicker formulation | EBL-01, EBL-03, SPN-06 | Xylenes or Amyl acetate | NMP |
| ZEP 520A-7 | + | Anisole | Thinner formulation | EBL-01, EBL-03, SPN-06 | Xylenes or Amyl acetate | NMP |
| H-SiQ 6% | - | MIBK | HSQ Equivalent | EBL-01, EBL-03, SPN-06 | TMAH |
Other Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover |
|---|---|---|---|---|---|---|
| LOR 3A | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | SPN-03, SPN-04 only! Precipitates in acetone, PGMEA |
TMAH | NMP |
| PMGI SF 5S | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | SPN-03, SPN-04 only! Precipitates in acetone, PGMEA |
TMAH | NMP |
| PMGI SF 2S | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | SPN-03, SPN-04 only! Precipitates in acetone, PGMEA |
TMAH | NMP |
| NXR-1025 | N/A | Proprietary | Stockroom, Nanoimprint | MA-02 |
Miscellaneous
These may be available but are not guaranteed to be stocked
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| KL5305 | + | PGMEA | General | MA-01, SPN-01, SPN-03 | TMAH | NMP | S1805 |
| KL5315 | + | PGMEA | General | MA-01, SPN-01, SPN-03 | TMAH | NMP | S1813 |
| KL6003 | + | PGMEA | MA-01, SPN-01, SPN-03 | TMAH | NMP | SPR 220-3, SPR 220-4.5 | |
| K-PRO 3 | + | PGMEA | Plating, Etching | MA-01, SPN-01, SPN-03 | TMAH or AZ400K 1:4 | NMP | SPR 220-3, SPR 220-4.5 |
| AZ 12XT-20PL-15 | + | PGMEA | CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um | MA-01, SPN-01, SPN-03 | TMAH | SPR 220-7, AZ P4620 | |
| AZ P4620 | + | PGMEA | Thick Resist, Plating, Packaging | MA-01, SPN-01, SPN-03 | TMAH or AZ400K 1:4 | SPR 220-7, AZ 12XT-20PL-15 | |
| ma-N 2403 | - | NMP, Butyl acetate, Cyclohexanone | e-beam/DUV Mix and Match | EBL-01, EBL-03, SPN-06 |