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  • Ana Cohen
    |AreasResponsibility = Lithography, Metrology, <br> New Users ...training and process troubleshooting. Her primary focuses are lithography, metrology, and wet chemical processing, with a specialization in photolithography/las
    986 bytes (125 words) - 13:30, 3 January 2024
  • David Jones
    |AreasResponsibility = Lithography, <br> Metrology
    627 bytes (73 words) - 13:52, 29 April 2022
  • Equipment
    == Metrology & characterization ==
    6 KB (802 words) - 15:43, 4 November 2024
  • Filmetrics F40
    [[Category:Metrology]] | Instrument_Type = Metrology
    927 bytes (108 words) - 10:44, 28 June 2024
  • Filmetrics F50 (UV Filter)
    [[Category:Metrology]] | Instrument_Type = Metrology
    1 KB (165 words) - 10:44, 28 June 2024
  • Filmetrics F50 (White Light)
    [[Category:Metrology]] | Instrument_Type = Metrology
    1 KB (140 words) - 10:45, 28 June 2024
  • Filmetrics Profilm3D
    [[Category:Metrology]] | Instrument_Type = Metrology
    1 KB (172 words) - 13:18, 3 January 2024
  • KLA Tencor P7 2D&3D/stress profilometer
    [[Category:Metrology]] | Instrument_Type = Metrology
    1,020 bytes (125 words) - 10:44, 28 June 2024
  • KLA Tencor P7 2D profilometer
    [[Category:Metrology]] | Instrument_Type = Metrology
    1 KB (152 words) - 10:44, 28 June 2024
  • Kyle Keenan
    ...ning Penn, Kyle worked at MIT Lincoln Laboratory as a photolithography and metrology specialist, and at Alpha Industries (now Skyworks, Inc.) as a process engin
    888 bytes (111 words) - 13:51, 29 April 2022
  • QNF Equipment Owner Matrix
    | KLA Tencor P7 2D profilometer || MET-01 || Metrology || [[David_Barth | David Barth]] | KLA Tencor P7 2D&3D/stress profilometer || MET-02 || Metrology || [[David_Barth | David Barth]]
    7 KB (875 words) - 10:14, 13 August 2024
  • Quattrone Nanofabrication Facility
    ...thography, physical and chemical vapor deposition, dry and wet processing, metrology, and device characterization. The facility is managed by full-time technica
    3 KB (391 words) - 08:08, 2 August 2024
  • Simple Rate Characterization Process
    Using an appropriate metrology tool, determine the step height between the area of bare Si after lift-off
    2 KB (315 words) - 13:42, 13 November 2024
  • Woollam V-VASE Ellipsometer
    [[Category:Metrology]] | Instrument_Type = Metrology
    1 KB (182 words) - 15:29, 14 October 2024
  • Zeiss Axio Imager M2m Microscopes
    [[Category:Metrology]] | Instrument_Type = Metrology
    1 KB (201 words) - 10:45, 28 June 2024
  • Zygo NewView 7300 Optical Profilometer
    [[Category:Metrology]] | Instrument_Type = Metrology
    1 KB (186 words) - 08:17, 17 May 2023
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