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- [[Category:Lithography]] | name = Elionix ELS-7500EX E-Beam Lithography System2 KB (318 words) - 14:17, 17 June 2024
- [[Category:Lithography]] | Instrument_Type = Lithography2 KB (306 words) - 13:12, 6 November 2024
Page text matches
- [[Category:Soft Lithography]] | Instrument_Type = Lithography3 KB (553 words) - 16:05, 9 May 2024
- |AreasResponsibility = Lithography, Metrology, <br> New Users ...gh equipment training and process troubleshooting. Her primary focuses are lithography, metrology, and wet chemical processing, with a specialization in photolith986 bytes (125 words) - 13:30, 3 January 2024
- [[Category:Soft Lithography]] | Instrument_Type = Soft Lithography1 KB (135 words) - 15:26, 12 March 2024
- [[Category:Lithography]] | Instrument_Type = Lithography2 KB (347 words) - 08:42, 6 August 2024
- |AreasResponsibility = Lithography, <br> Advanced Processing ...NF. His background includes nanophotonic device fabrication, electron beam lithography, and process support on a variety of fabrication tools and techniques.691 bytes (88 words) - 09:30, 20 March 2024
- |AreasResponsibility = Lithography, <br> Metrology627 bytes (73 words) - 13:52, 29 April 2022
- [[Category:Lithography]] | name = Elionix ELS-7500EX E-Beam Lithography System2 KB (318 words) - 14:17, 17 June 2024
- '' '''PVD-07''' is listed under Soft Lithography'' <br> '' '''PVD-08''' is listed under Soft Lithography''6 KB (802 words) - 15:43, 4 November 2024
- |AreasResponsibility = Soft Lithography, <br> New Users ...phy manager, he provides complete user training in the fabrication of soft lithography and microfluidic devices. This includes mask design, proper spin coating t702 bytes (86 words) - 11:30, 25 October 2022
- [[Category:Lithography]] | Instrument_Type = Lithography4 KB (538 words) - 18:41, 28 October 2024
- [[Category:Lithography]] | Instrument_Type = Lithography1 KB (143 words) - 10:42, 28 June 2024
- [[Category:Lithography]] The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template featu1 KB (135 words) - 10:43, 28 June 2024
- [[Category:Lithography]] | Instrument_Type = Lithography1 KB (169 words) - 15:29, 27 June 2024
- ...d to measure the etch rate of PECVD SiNx using an Oxford 80 plus RIE tool. Lithography equipment and material used in this study can be substituted by others that2 KB (255 words) - 14:47, 16 September 2024
- = Lithography = = Soft Lithography =1 KB (216 words) - 14:48, 17 June 2024
- | Elionix ELS-7500EX E-Beam Lithography System || EBL-01 || Lithography || [[David_Barth | David Barth]] | Litho Workstation for BEAMER and TRACER || EBL-02 || Lithography || [[David_Barth | David Barth]]7 KB (875 words) - 10:14, 13 August 2024
- |AreasResponsibility = Operations <br> Soft Lithography <br> New Users |AreasResponsibility = Lithography <br> Advanced Processing2 KB (261 words) - 09:00, 10 May 2024
- ...cleanroom with leading-edge equipment capable of electron-beam and optical lithography, physical and chemical vapor deposition, dry and wet processing, metrology,3 KB (391 words) - 08:08, 2 August 2024
- [[Category:Lithography]] | Instrument_Type = Lithography2 KB (306 words) - 13:12, 6 November 2024
- [[Category:Soft Lithography]] | Instrument_Type = Soft Lithography1 KB (175 words) - 15:12, 12 March 2024