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• Elionix ELS-7500EX E-Beam Lithography System
  [[Category:Lithography]] | name = Elionix ELS-7500EX E-Beam Lithography System
  2 KB (318 words) - 15:17, 17 June 2024
• Raith EBPG5200+ E-Beam Lithography System
  [[Category:Lithography]] | Instrument_Type = Lithography
  2 KB (306 words) - 14:12, 6 November 2024

Page text matches

• ABM3000HR Mask Aligner
  [[Category:Soft Lithography]] | Instrument_Type = Lithography
  4 KB (580 words) - 19:18, 7 March 2025
• Ana Cohen
  |AreasResponsibility = Lithography, Metrology, <br> New Users ...gh equipment training and process troubleshooting. Her primary focuses are lithography, metrology, and wet chemical processing, with a specialization in photolith
  986 bytes (125 words) - 14:30, 3 January 2024
• Anatech SCE-106 Barrel Asher
  [[Category:Soft Lithography]] | Instrument_Type = Soft Lithography
  1 KB (135 words) - 16:26, 12 March 2024
• CEE Apogee Spinner
  [[Category:Lithography]] | Instrument_Type = Lithography
  2 KB (347 words) - 09:42, 6 August 2024
• David Barth
  |AreasResponsibility = Lithography, <br> Advanced Processing ...NF. His background includes nanophotonic device fabrication, electron beam lithography, and process support on a variety of fabrication tools and techniques.
  691 bytes (88 words) - 10:30, 20 March 2024
• David Jones
  |AreasResponsibility = Lithography, <br> Metrology
  627 bytes (73 words) - 14:52, 29 April 2022
• Elionix ELS-7500EX E-Beam Lithography System
  [[Category:Lithography]] | name = Elionix ELS-7500EX E-Beam Lithography System
  2 KB (318 words) - 15:17, 17 June 2024
• Equipment
  '' '''PVD-07''' is listed under Soft Lithography'' <br> '' '''PVD-08''' is listed under Soft Lithography''
  6 KB (840 words) - 15:04, 31 January 2025
• Eric Johnston
  |AreasResponsibility = Soft Lithography, <br> New Users ...phy manager, he provides complete user training in the fabrication of soft lithography and microfluidic devices. This includes mask design, proper spin coating t
  702 bytes (86 words) - 12:30, 25 October 2022
• Heidelberg DWL 66+ Laser Writer
  [[Category:Lithography]] | Instrument_Type = Lithography
  4 KB (516 words) - 17:56, 27 February 2025
• Litho Workstation for BEAMER and TRACER
  [[Category:Lithography]] | Instrument_Type = Lithography
  1 KB (143 words) - 11:42, 28 June 2024
• Nanonex NX2600 Nanoimprint
  [[Category:Lithography]] The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template featu
  1 KB (135 words) - 11:43, 28 June 2024
• Nanoscribe Photonic Professional GT
  [[Category:Lithography]] | Instrument_Type = Lithography
  1 KB (177 words) - 18:22, 17 February 2025
• PECVD SiNx via CHF3 + O2
  ...d to measure the etch rate of PECVD SiNx using an Oxford 80 plus RIE tool. Lithography equipment and material used in this study can be substituted by others that
  2 KB (255 words) - 15:47, 16 September 2024
• Process Resources
  = Lithography = = Soft Lithography =
  2 KB (249 words) - 16:09, 14 January 2025
• QNF Equipment Owner Matrix
  | Elionix ELS-7500EX E-Beam Lithography System || EBL-01 || Lithography || [[David_Barth | David Barth]] | Litho Workstation for BEAMER and TRACER || EBL-02 || Lithography || [[David_Barth | David Barth]]
  7 KB (864 words) - 14:10, 31 March 2025
• QNF Staff
  |AreasResponsibility = Operations <br> Soft Lithography <br> New Users |AreasResponsibility = Lithography <br> Advanced Processing
  2 KB (261 words) - 10:00, 10 May 2024
• Quattrone Nanofabrication Facility
  ...cleanroom with leading-edge equipment capable of electron-beam and optical lithography, physical and chemical vapor deposition, dry and wet processing, metrology,
  3 KB (385 words) - 17:31, 27 February 2025
• Raith EBPG5200+ E-Beam Lithography System
  [[Category:Lithography]] | Instrument_Type = Lithography
  2 KB (306 words) - 14:12, 6 November 2024
• Resists at QNF
  ...rf1a8wvc HARE SQ 2] || negative,<br> 2um-5um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM ...qxjrd SU-8 3050] || negative,<br> 40um-100um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM
  15 KB (2,353 words) - 12:20, 3 March 2025

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