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  • [[Category:Soft Lithography]] | Instrument_Type = Lithography
    3 KB (553 words) - 16:05, 9 May 2024
  • |AreasResponsibility = Lithography, Metrology, <br> New Users ...gh equipment training and process troubleshooting. Her primary focuses are lithography, metrology, and wet chemical processing, with a specialization in photolith
    986 bytes (125 words) - 13:30, 3 January 2024
  • [[Category:Soft Lithography]] | Instrument_Type = Soft Lithography
    1 KB (135 words) - 15:26, 12 March 2024
  • [[Category:Lithography]] | Instrument_Type = Lithography
    2 KB (347 words) - 08:42, 6 August 2024
  • |AreasResponsibility = Lithography, <br> Advanced Processing ...NF. His background includes nanophotonic device fabrication, electron beam lithography, and process support on a variety of fabrication tools and techniques.
    691 bytes (88 words) - 09:30, 20 March 2024
  • |AreasResponsibility = Lithography, <br> Metrology
    627 bytes (73 words) - 13:52, 29 April 2022
  • [[Category:Lithography]] | name = Elionix ELS-7500EX E-Beam Lithography System
    2 KB (318 words) - 14:17, 17 June 2024
  • '' '''PVD-07''' is listed under Soft Lithography'' <br> '' '''PVD-08''' is listed under Soft Lithography''
    6 KB (802 words) - 15:43, 4 November 2024
  • |AreasResponsibility = Soft Lithography, <br> New Users ...phy manager, he provides complete user training in the fabrication of soft lithography and microfluidic devices. This includes mask design, proper spin coating t
    702 bytes (86 words) - 11:30, 25 October 2022
  • [[Category:Lithography]] | Instrument_Type = Lithography
    4 KB (538 words) - 18:41, 28 October 2024
  • [[Category:Lithography]] | Instrument_Type = Lithography
    1 KB (143 words) - 10:42, 28 June 2024
  • [[Category:Lithography]] The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template featu
    1 KB (135 words) - 10:43, 28 June 2024
  • [[Category:Lithography]] | Instrument_Type = Lithography
    1 KB (169 words) - 15:29, 27 June 2024
  • ...d to measure the etch rate of PECVD SiNx using an Oxford 80 plus RIE tool. Lithography equipment and material used in this study can be substituted by others that
    2 KB (255 words) - 14:47, 16 September 2024
  • = Lithography = = Soft Lithography =
    1 KB (216 words) - 14:48, 17 June 2024
  • | Elionix ELS-7500EX E-Beam Lithography System || EBL-01 || Lithography || [[David_Barth | David Barth]] | Litho Workstation for BEAMER and TRACER || EBL-02 || Lithography || [[David_Barth | David Barth]]
    7 KB (875 words) - 10:14, 13 August 2024
  • |AreasResponsibility = Operations <br> Soft Lithography <br> New Users |AreasResponsibility = Lithography <br> Advanced Processing
    2 KB (261 words) - 09:00, 10 May 2024
  • ...cleanroom with leading-edge equipment capable of electron-beam and optical lithography, physical and chemical vapor deposition, dry and wet processing, metrology,
    3 KB (391 words) - 08:08, 2 August 2024
  • [[Category:Lithography]] | Instrument_Type = Lithography
    2 KB (306 words) - 13:12, 6 November 2024
  • [[Category:Soft Lithography]] | Instrument_Type = Soft Lithography
    1 KB (175 words) - 15:12, 12 March 2024

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