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• ALD-01: Aluminum Oxide Deposition
  550 bytes (62 words) - 13:01, 7 June 2024
• ALD-01: Hafnium Oxide Deposition
  468 bytes (62 words) - 14:56, 3 June 2024
• ALD-01: Titanium Oxide Deposition
  235 bytes (33 words) - 10:57, 7 June 2024
• ALD-02: Titanium Dioxide Deposition
  235 bytes (33 words) - 15:37, 17 June 2024
• ALD-02: Titanium Oxide Deposition
  #REDIRECT [[ALD-02: Titanium Dioxide Deposition]]
  49 bytes (5 words) - 16:41, 7 June 2024
• Amorphous silicon deposition
  Determine the a-Si deposition rate on CVD-01
  171 bytes (19 words) - 14:54, 14 October 2024
• What is Atomic Layer Deposition?
  '''Atomic Layer Deposition (ALD)''' is a thin-film deposition technique used in the fabrication of semiconductor devices, microelectronic ALD offers several advantages over other thin-film deposition techniques, including precise thickness control at the atomic level, unifor
  2 KB (261 words) - 11:22, 5 April 2024
• What is Chemical Vapor Deposition (CVD)?
  Chemical Vapor Deposition (CVD) is a thin-film deposition technique in which thin films are deposited onto a substrate surface throug ...face or with other reactive species present in the chamber, leading to the deposition of a thin film of material on the substrate.
  1 KB (186 words) - 13:14, 9 April 2024

Page text matches

• ALD-02: Titanium Oxide Deposition
  #REDIRECT [[ALD-02: Titanium Dioxide Deposition]]
  49 bytes (5 words) - 16:41, 7 June 2024
• Ag master recipe
  Step T006 is the deposition step. Note the extra long cool-down time in step T012. Reducing the cool-do
  3 KB (238 words) - 12:27, 31 January 2023
• Al master recipe
  Step T004 is the deposition step and step T005 is the cool-down step (300 s).
  2 KB (199 words) - 15:02, 30 January 2023
• Amorphous silicon deposition
  Determine the a-Si deposition rate on CVD-01
  171 bytes (19 words) - 14:54, 14 October 2024
• Ancillary Process Chemicals at QNF
  ...charge H2O || DisChem || Proprietary || || Anti-charging for EBL || Metal Deposition (Au)
  917 bytes (100 words) - 15:44, 3 July 2023
• Au (gold)
  ===Deposition Equipment=== ===Sputter Deposition Rates===
  4 KB (394 words) - 15:00, 9 May 2024
• Au master recipe
  Step T006 is the deposition step.
  3 KB (213 words) - 12:31, 31 January 2023
• Cambridge Nanotech S200 ALD
  [[Category:Deposition]] | Instrument_Type = Deposition
  4 KB (486 words) - 14:13, 31 March 2025
• Cu master recipe
  Step T004 is the deposition step and step T005 is the cool-down step (300 s).
  2 KB (199 words) - 15:02, 30 January 2023
• Dan Sabrsula
  ...ing with process troubleshooting. His main area of focus is physical vapor deposition, including sputtering, and thermal and electron-beam evaporation. He also t
  1 KB (143 words) - 16:50, 25 April 2024
• Denton Explorer14 Magnetron Sputterer
  [[Category:Deposition]] | Instrument_Type = Deposition
  5 KB (786 words) - 17:17, 3 February 2025
• Equipment
  ==Deposition== === [[How PVD works|Physical Vapor Deposition (PVD)]] ===
  6 KB (840 words) - 15:04, 31 January 2025
• Fiji G2 ALD
  [[Category:Deposition]] | Instrument_Type = Deposition
  1 KB (147 words) - 14:52, 15 January 2025
• How PVD works
  Physical vapor deposition (PVD) is a thin film deposition technique used to create coatings or thin films on substrates in a variety ...process, which uses a magnetic field to enhance efficiency and control the deposition.
  11 KB (1,676 words) - 11:23, 10 April 2024
• Intlvac E-beam Evaporator
  [[Category:Deposition]] | Instrument_Type = Physical vapor deposition
  1 KB (156 words) - 16:46, 20 September 2024
• Jason A. Röhr
  ...niversity of Pennsylvania (Penn). He is responsible for the Physical Vapor Deposition (PVD) and electrical characterization tools within the QNF. Prior to joinin
  1 KB (160 words) - 14:52, 24 August 2022
• Lesker Nano-36 Thermal Evaporator
  [[Category:Deposition]] | Instrument_Type = Deposition
  1 KB (187 words) - 13:54, 3 January 2024
• Lesker PVD75 DC/RF Sputterer
  [[Category:Deposition]] | Instrument_Type = Deposition
  10 KB (1,469 words) - 15:48, 20 March 2025
• Lesker PVD75 E-Beam/Thermal Evaporator
  [[Category:Deposition]] | Instrument_Type = Deposition
  2 KB (314 words) - 15:27, 8 January 2025
• Lesker PVD75 E-beam Evaporator
  [[Category:Deposition]] | Instrument_Type = Physical vapor deposition
  1 KB (202 words) - 10:46, 16 May 2024

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