Al master recipe
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> Click here to return to PVD-05 <
Step T004 is the deposition step and step T005 is the cool-down step (300 s).
Step Number | T000 | T001 | T002 | T003 | T004 | T005 | T006 |
---|---|---|---|---|---|---|---|
Step Time (sec) | 5 | 120 | 60 | 60 | [dep] | 300 | 5 |
Min Vacuum Setpoint (Torr) | |||||||
Gas - (PID or Fixed) | PID | PID | PID | PID | |||
Gas - PID Master Gas Select | 1 | 1 | 1 | 1 | |||
Gas1 - Setpoint (sccm) | 10 | 10 | 10 | 10 | |||
Gas2 - Setpoint (sccm) | |||||||
Gas PID Pressure (mTorr) | 10 | 5 | 3 | 3 | |||
RF Source - Sputter (Watts) | |||||||
RF Source - Cathode Select | |||||||
RF Source - Shutter | |||||||
DC 1 Source - Sputter (Watts) | |||||||
DC 1 Source - Cathode Select | |||||||
DC 1 Source - Shutter | |||||||
DC 2 Source - Sputter (Watts) | 100 | 150 | 200 | 200 | |||
DC 2 Source - Shutter | Open | ||||||
Pressure Control (Throttle) | Yes | Yes | Yes | Yes | |||
Ignition Pressure (mTorr) | |||||||
Rotation Speed (0-100%) | 50 | 50 | 50 | 50 | 50 | ||
End Process (Yes) | Yes |