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Combined display of all available logs of Quattrone Nanofabrication Facility. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).
(newest | oldest) View (newer 50 | older 50) (20 | 50 | 100 | 250 | 500)- 15:41, 7 June 2024 Lucasamb talk contribs moved page ALD-02: Titanium Oxide Deposition to ALD-02: Titanium Dioxide Deposition
- 09:59, 7 June 2024 Lucasamb talk contribs created page ALD-02: Titanium Oxide Deposition (Created blank page)
- 09:56, 7 June 2024 Lucasamb talk contribs created page ALD-01: Titanium Oxide Deposition (Created page with "<iframe height="300px" width=2000px" key="google" level="docs" path=https:https://docs.google.com/spreadsheets/d/e/2PACX-1vRT0Xcfp3506lnri7h04_tPNBdXSckz1XCJizwMky8hWDH0QwxxVH...")
- 10:06, 6 June 2024 User account Yijied talk contribs was created automatically
- 15:28, 5 June 2024 User account Yubwang talk contribs was created automatically
- 13:51, 3 June 2024 Lucasamb talk contribs created page ALD-01: Hafnium Oxide Deposition (Created page with "<iframe height="500px" width="1000px"key="google" level="docs" path=https://docs.google.com/spreadsheets/d/e/2PACX-1vS0-QBsrmBWXosfTpJrMo44JuxVGfhODnOQRWZVMIgrOLrkO_LO5Hgd6DvL...")
- 10:00, 22 May 2024 Azadi talk contribs created page File:DE06 SOP v03.pdf
- 10:00, 22 May 2024 Azadi talk contribs uploaded File:DE06 SOP v03.pdf
- 13:42, 20 May 2024 Dsabr talk contribs created page File:Oxford PECVD SiO2 deposition.pdf
- 13:42, 20 May 2024 Dsabr talk contribs uploaded File:Oxford PECVD SiO2 deposition.pdf
- 13:26, 20 May 2024 Lucasamb talk contribs created page ALD-01: Aluminum Oxide Deposition (Created page with "<iframe height="500px" key="google" level="docs" path="https://docs.google.com/spreadsheets/d/e/2PACX-1vRT0Xcfp3506lnri7h04_tPNBdXSckz1XCJizwMky8hWDH0QwxxVHefXI4scbtD66peP2nHN...")
- 11:43, 20 May 2024 Bohnn talk contribs created page ToF-SIMS (Created page with "==Overview== '''Time of Flight Secondary Ion Mass Spectroscopy''' or '''ToF-SIMS''' is an technique performed in a FIB to analyze the composi...")
- 11:00, 20 May 2024 Dsabr talk contribs created page SiO2 (silicon dioxide) (Created page with "Silicon dioxide is an insulating, transparent oxide that is highly unreactive. It is often used as a passivation layer to protect electrical components. ==Equipment== ===...")
- 09:50, 16 May 2024 Dsabr talk contribs created page File:PVD 05 SOP.pdf
- 09:50, 16 May 2024 Dsabr talk contribs uploaded File:PVD 05 SOP.pdf
- 09:45, 16 May 2024 Dsabr talk contribs created page File:PVD 04 SOP.pdf
- 09:45, 16 May 2024 Dsabr talk contribs uploaded File:PVD 04 SOP.pdf
- 13:24, 15 May 2024 Dsbarth talk contribs created page ZEP Process Data (Created page with "<iframe height="400px" key="google" level="docs" path="/spreadsheets/u/0/d/e/2PACX-1vSvZG1_8z70Dl9liA3fY2p8jojsyW4ELRhjOzFc7UKzOlXOxWQ4XkD6m_RAMx8-u2E5G21yPdKG6loM/pubchart?oi...")
- 13:16, 15 May 2024 Dsbarth talk contribs changed group membership for Lucasamb from Editor to Editor and administrator
- 13:16, 15 May 2024 Dsbarth talk contribs changed group membership for Coana from Editor to Editor and administrator
- 13:16, 15 May 2024 Dsbarth talk contribs changed group membership for Dsabr from Editor to Editor and administrator
- 13:15, 15 May 2024 Dsbarth talk contribs changed group membership for Azadi from Editor to Editor and administrator
- 10:34, 13 May 2024 User account Lixlei talk contribs was created automatically
- 12:40, 10 May 2024 Bohnn talk contribs created page Keyence Profilometer (Created page with "Category:Characterization {{EquipmentInfo | name = Keyence Profilometer | Tool_Name = Keyence | image = 300px | imagecaption = | Instrument_Type = P...")
- 12:37, 10 May 2024 Bohnn talk contribs created page File:Keyence.jpg (image of keyence profilometer)
- 12:37, 10 May 2024 Bohnn talk contribs uploaded File:Keyence.jpg (image of keyence profilometer)
- 12:37, 10 May 2024 Bohnn talk contribs created page File:20240510 133218.jpg (image of keyence profilometer)
- 12:37, 10 May 2024 Bohnn talk contribs uploaded File:20240510 133218.jpg (image of keyence profilometer)
- 09:03, 10 May 2024 Dsbarth talk contribs deleted page File:CharlesV.jpeg
- 09:01, 10 May 2024 Dsbarth talk contribs deleted page Charles Veith (content before blanking was: "__NOTOC__ {{StaffMemberInfobox |StaffName = Charles Veith |StaffPhoto = CharlesV.jpeg |JobTitle = Purchasing Manager <br> Vender Relations (NNCI) |AreasResponsibility = Purchasing <br> Micro Contamination |PennID = cveith |Phone = 508-579-5487 (office) |OfficeLocation = 110 Singh }} == About == ===== Role in the QNF ===== Charles R. Veith is a Member of Technical Staff in the Quattrone Nanofabrication Facility. His main responsibilities are owner and manager of...")
- 13:11, 9 May 2024 Dsabr talk contribs created page Au (gold) (Created page with "==Equipment== ===Deposition Equipment=== * '''PVD-02:''' Lesker PVD75 E-Beam/Thermal Evaporator * '''PVD-03:''' Lesker PVD75...")
- 10:56, 9 May 2024 Dsabr talk contribs created page Ti (titanium) (Created page with "Titanium is a transition metal with atomic number 22 and symbol Ti. Titanium has a low density, high strength and is resistant to corrosion by water. It has relatively poor el...")
- 09:09, 9 May 2024 Dsabr talk contribs created page File:PVD03 SOP v02.pdf
- 09:09, 9 May 2024 Dsabr talk contribs uploaded File:PVD03 SOP v02.pdf
- 12:17, 7 May 2024 Dsbarth talk contribs created page File:EBPG5200+ SOP.pdf (SOP for EBL-03)
- 12:17, 7 May 2024 Dsbarth talk contribs uploaded File:EBPG5200+ SOP.pdf (SOP for EBL-03)
- 16:01, 25 April 2024 Dsabr talk contribs created page Micromanipulator 4060 Probe Station (Created page with "Category:Electrical Characterization {{EquipmentInfo | name = Micromanipulator 4060 Probe Station | Tool_Name = Micromanipulator 4060 Probe Station | image = Image:MET-...")
- 15:43, 25 April 2024 Dsabr talk contribs created page Dan Sabrsula (Created page with "__NOTOC__ {{StaffMemberInfobox |StaffName = Dan Sabrsula |StaffPhoto = Sabrsula.jpg |JobTitle = Nanofabrication Process Engineer |AreasResponsibility = PVD, Electrical Charact...")
- 12:09, 10 April 2024 User account Ericoc talk contribs was created automatically
- 10:31, 5 April 2024 Lucasamb talk contribs created page What is Chemical Vapor Deposition (CVD)? (Created page with "Chemical Vapor Deposition (CVD) in which thin films are deposited onto a substrate surface through the chemical reaction of vapor-phase precursor molecules. The basic process...")
- 10:03, 5 April 2024 Lucasamb talk contribs created page What is Atomic Layer Deposition? (Created page with "'''Atomic Layer Deposition (ALD)''' is a thin-film deposition technique used in the fabrication of semiconductor devices, microelectronics, and various nanotechnology applicat...")
- 09:27, 5 April 2024 Lucasamb talk contribs created page What is ALD? (Created page with "Here it is")
- 10:13, 4 April 2024 Dsabr talk contribs created page How PVD works (Created page with "this is how")
- 12:33, 1 April 2024 User account Mapenn talk contribs was created automatically
- 11:18, 1 April 2024 Coana talk contribs created page File:LW-01 S1818Lines 5um Feb2024.png (65mW, 70% intensity, + 20 focus)
- 11:18, 1 April 2024 Coana talk contribs uploaded File:LW-01 S1818Lines 5um Feb2024.png (65mW, 70% intensity, + 20 focus)
- 11:17, 1 April 2024 Coana talk contribs created page File:LW-01 S1818Lines 25um Feb2024.png (65mW, 70% intensity, + 20 focus)
- 11:17, 1 April 2024 Coana talk contribs uploaded File:LW-01 S1818Lines 25um Feb2024.png (65mW, 70% intensity, + 20 focus)
- 14:46, 25 March 2024 Azadi talk contribs created page How plasma etch works (Created page with "Plasma etching is a crucial process in semiconductor manufacturing, enabling the precise fabrication of intricate patterns on silicon wafers. This technique is fundamental in...")
- 14:45, 25 March 2024 Azadi talk contribs created page Ever wondered how plasma etch works? (Created page with "Plasma etching is a crucial process in semiconductor manufacturing, enabling the precise fabrication of intricate patterns on silicon wafers. This technique is fundamental in...")
