Difference between revisions of "Resists at QNF"

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! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
! Name / Datasheet !! Tone !! Solvent Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
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| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Heidelberg_DWL_66%2B_Laser_Writer LW-01], SPN-01, SPN-03 || TMAH || NMP || KL5305
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Heidelberg_DWL_66%2B_Laser_Writer LW-01],<br> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || KL5305
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General, 1um-1.3um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Heidelberg_DWL_66%2B_Laser_Writer LW-01], SPN-01, SPN-03, RC-01 || TMAH || NMP || KL5315
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General, 1um-1.3um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Heidelberg_DWL_66%2B_Laser_Writer LW-01], <br> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_AS8_AltaSpray RC-01] || TMAH || NMP || KL5315
 
|-
 
|-
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| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Heidelberg_DWL_66%2B_Laser_Writer LW-01], SPN-01, SPN-03 || TMAH || NMP ||
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Heidelberg_DWL_66%2B_Laser_Writer LW-01], <br> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP ||
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 2um-5um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH || NMP || KPRO-3, KL6003, AZ3330F
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 2um-5um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], <br> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH || NMP || KPRO-3, KL6003, AZ3330F
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], <br>[https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 6um-12um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH || NMP || AZ 12XT, AZ P4620
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch, 6um-12um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], <br> [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH || NMP || AZ 12XT, AZ P4620
 
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|-
−
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating  || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03 || TMAH or AZ400K 1:4 || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
+
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating  || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], <br>[https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03] || TMAH or AZ400K 1:4 || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
 
|-
 
|-
−
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03, SPN-04 || TMAH || ||  
+
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], <br>[https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04 || TMAH || ||  
 
|-
 
|-
−
|  [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], SPN-01, SPN-03, SPN-04, RC-01 || TMAH || NMP ||
+
|  [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], <br>[https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Left) SPN-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Apogee_Spinner_-_Positive_Resist_(Right) SPN-03], SPN-04, [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_AS8_AltaSpray RC-01] || TMAH || NMP ||
 
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|-
 
| IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || [https://wiki.nano.upenn.edu/wiki/index.php?title=Nanoscribe_Photonic_Professional_GT LW-02] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A ||  
 
| IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || [https://wiki.nano.upenn.edu/wiki/index.php?title=Nanoscribe_Photonic_Professional_GT LW-02] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A ||  
 
|-
 
|-
−
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy, 2um-5um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03], SPN-04, SPN-08 [https://wiki.nano.upenn.edu/wiki/index.php?title=Spinner_-_SU-8/PDMS SPN-07] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2005
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy, 2um-5um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03], <br> SPN-04, SPN-08 || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2005
 
|-
 
|-
−
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy, 25um-100um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03], SPN-04, SPN-08, [https://wiki.nano.upenn.edu/wiki/index.php?title=Spinner_-_SU-8/PDMS SPN-07] || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2050
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy, 25um-100um || [https://wiki.nano.upenn.edu/wiki/index.php?title=SUSS_MicroTec_MA6_Gen3_Mask_Aligner MA-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=ABM3000HR_Mask_Aligner MA-03], <br> SPN-04, SPN-08 || PGMEA (SU-8 or HARE SQ Developer), IPA || N/A || SU-8 2050
 
|}
 
|}
  

Revision as of 13:14, 28 March 2024

The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.

QNF Supplied Standard Photoresists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
S1805 + PGMEA General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP KL5305
S1813 + PGMEA General, 1um-1.3um MA-01, LW-01,
SPN-01, SPN-03, RC-01		 TMAH NMP KL5315
S1818 + PGMEA General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP
SPR 220-3 + Ethyl lactate, anisole, n-amyl acetate Etch, 2um-5um MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-4.5 + Ethyl lactate, anisole, n-amyl acetate Etch MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-7 + Ethyl lactate, anisole, n-amyl acetate Etch, 6um-12um MA-01,
SPN-01, SPN-03		 TMAH NMP AZ 12XT, AZ P4620
AZ 3330F + PGMEA General, Metal RIE, Plating MA-01,
SPN-01, SPN-03		 TMAH or AZ400K 1:4 SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
NR7-3000P - Cyclohexanone Etch, General MA-01,
SPN-01, SPN-03, SPN-04		 TMAH
APOL-LO 3202 - PGMEA Liftoff MA-01,
SPN-01, SPN-03, SPN-04, RC-01		 TMAH NMP
IP-Dip - Ethoxylated acrylates Nanoscribe, Epoxy LW-02 PGMEA (SU-8 or HARE SQ Developer), IPA N/A
HARE SQ 2 - Cyclopentanone, gamma butyro lactone Epoxy, 2um-5um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or HARE SQ Developer), IPA N/A SU-8 2005
HARE SQ 50 - Cyclopentanone, gamma butyro lactone Epoxy, 25um-100um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or HARE SQ Developer), IPA N/A SU-8 2050

Stockroom Photoresists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
SU-8 2005 - Cyclopentanone Epoxy, 4um-7um MA-01, MA-03, SPN-04, SPN-08 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 2
SU-8 2050 - Cyclopentanone Epoxy, 40um-170um MA-01, MA-03, SPN-04, SPN-08 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50
SU-8 2100 - Cyclopentanone Epoxy, 100um-270um MA-01, MA-03, SPN-04, SPN-08 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50
SU-8 3050 - Cyclopentanone Epoxy, 40um-100um MA-01, MA-03, SPN-04, SPN-08 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50

Standard e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
495 PMMA A8 + Anisole Lower Resolution EBL-01, SPN-06 3:1 IPA/H2O NMP
495 PMMA A4 + Anisole Lower Resolution, 180nm-300nm EBL-01, SPN-06 3:1 IPA/H2O NMP
495 PMMA A2 + Anisole Lower Resolution, 50nm-100nm EBL-01, SPN-06 3:1 IPA/H2O NMP
950 PMMA A4 + Anisole High Resolution, 200nm-400nm EBL-01, SPN-06 3:1 IPA/H2O NMP
950 PMMA A2 + Anisole High Resolution, 50nm-100nm EBL-01, SPN-06 3:1 IPA/H2O NMP 1000 HARP 0.1
1000 HARP 1.3 + Anisole High Resolution EBL-01, SPN-06 3:1 IPA/H2O NMP
1000 HARP 0.1 + Anisole High Resolution EBL-01, SPN-06 3:1 IPA/H2O NMP 950 PMMA A2

Stockroom e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
ZEP 520A + Anisole Thicker formulation EBL-01, SPN-06 Xylenes or Amyl acetate NMP
ZEP 520A-7 + Anisole Thinner formulation EBL-01, SPN-06 Xylenes or Amyl acetate NMP
H-SiQ 6% - MIBK HSQ Equivalent EBL-01, SPN-06 TMAH

Other Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
LOR 3A N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 5S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 2S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
NXR-1025 N/A Proprietary Stockroom, Nanoimprint MA-02

Miscellaneous

These may be available but are not guaranteed to be stocked

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
KL5305 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1805
KL5315 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1813
KL6003 + PGMEA MA-01, SPN-01, SPN-03 TMAH NMP SPR 220-3, SPR 220-4.5
K-PRO 3 + PGMEA Plating, Etching MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 NMP SPR 220-3, SPR 220-4.5
AZ 12XT-20PL-15 + PGMEA CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um MA-01, SPN-01, SPN-03 TMAH SPR 220-7, AZ P4620
AZ P4620 + PGMEA Thick Resist, Plating, Packaging MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 SPR 220-7, AZ 12XT-20PL-15
ma-N 2403 - NMP, Butyl acetate, Cyclohexanone e-beam/DUV Mix and Match EBL-01, SPN-06
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