Difference between revisions of "Resists at QNF"

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| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A4] || + || Anisole || Lower Resolution, 180nm-300nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP ||
 
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A4] || + || Anisole || Lower Resolution, 180nm-300nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP ||
 
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| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A2] || + || Anisole || Lower Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP ||
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A2] || + || Anisole || Lower Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP ||
 
|-
 
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| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A4] || + || Anisole || High Resolution, 200nm-400nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP ||
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A4] || + || Anisole || High Resolution, 200nm-400nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP ||
 
|-
 
|-
−
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A2] || + || Anisole || High Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || 1000 HARP 0.1
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A2] || + || Anisole || High Resolution, 50nm-100nm || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || 1000 HARP 0.1
 
|-
 
|-
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| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 1.3] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP ||
+
| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 1.3] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP ||
 
|-  
 
|-  
−
| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 0.1] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01],[https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || 950 PMMA A2
+
| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 0.1] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-03], SPN-06 || 3:1 IPA/H2O || NMP || 950 PMMA A2
 
|}
 
|}
  

Revision as of 14:43, 24 May 2024

The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.

QNF Supplied Standard Photoresists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
S1805 + PGMEA General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP KL5305
S1813 + PGMEA General, 1um-1.3um MA-01, LW-01,
SPN-01, SPN-03, RC-01		 TMAH NMP KL5315
S1818 + PGMEA General MA-01, LW-01,
SPN-01, SPN-03		 TMAH NMP
SPR 220-3 + Ethyl lactate, anisole, n-amyl acetate Etch, 2um-5um MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-4.5 + Ethyl lactate, anisole, n-amyl acetate Etch MA-01,
SPN-01, SPN-03		 TMAH NMP KPRO-3, KL6003, AZ3330F
SPR 220-7 + Ethyl lactate, anisole, n-amyl acetate Etch, 6um-12um MA-01,
SPN-01, SPN-03		 TMAH NMP AZ 12XT, AZ P4620
AZ 3330F + PGMEA General, Metal RIE, Plating MA-01,
SPN-01, SPN-03		 TMAH or AZ400K 1:4 SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
NR7-3000P - Cyclohexanone Etch, General MA-01,
SPN-01, SPN-03, SPN-04		 TMAH
APOL-LO 3202 - PGMEA Liftoff MA-01,
SPN-01, SPN-03, SPN-04, RC-01		 TMAH NMP
IP-Dip - Ethoxylated acrylates Nanoscribe, Epoxy LW-02 PGMEA (SU-8 or HARE SQ Developer), IPA N/A
HARE SQ 2 - Cyclopentanone, gamma butyro lactone Epoxy, 2um-5um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or HARE SQ Developer), IPA N/A SU-8 2005
HARE SQ 50 - Cyclopentanone, gamma butyro lactone Epoxy, 25um-100um MA-01, MA-03,
SPN-04, SPN-08		 PGMEA (SU-8 or HARE SQ Developer), IPA N/A SU-8 2050

Stockroom Photoresists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
SU-8 2005 - Cyclopentanone Epoxy, 4um-7um MA-01, MA-03, SPN-04, SPN-08 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 2
SU-8 2050 - Cyclopentanone Epoxy, 40um-170um MA-01, MA-03, SPN-04, SPN-08 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50
SU-8 2100 - Cyclopentanone Epoxy, 100um-270um MA-01, MA-03, SPN-04, SPN-08 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50
SU-8 3050 - Cyclopentanone Epoxy, 40um-100um MA-01, MA-03, SPN-04, SPN-08 PGMEA (SU-8 or SQ Developer) N/A HARE SQ 50

Standard e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
495 PMMA A8 + Anisole Lower Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A4 + Anisole Lower Resolution, 180nm-300nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
495 PMMA A2 + Anisole Lower Resolution, 50nm-100nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A4 + Anisole High Resolution, 200nm-400nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
950 PMMA A2 + Anisole High Resolution, 50nm-100nm EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 1000 HARP 0.1
1000 HARP 1.3 + Anisole High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP
1000 HARP 0.1 + Anisole High Resolution EBL-01, EBL-03, SPN-06 3:1 IPA/H2O NMP 950 PMMA A2

Stockroom e-beam Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
ZEP 520A + Anisole Thicker formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
ZEP 520A-7 + Anisole Thinner formulation EBL-01, EBL-03, SPN-06 Xylenes or Amyl acetate NMP
H-SiQ 6% - MIBK HSQ Equivalent EBL-01, EBL-03, SPN-06 TMAH

Other Resists

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover
LOR 3A N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 5S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
PMGI SF 2S N/A Cyclopentanone, PGME Liftoff, Non-imaging SPN-03, SPN-04 only!
Precipitates in acetone, PGMEA		 TMAH NMP
NXR-1025 N/A Proprietary Stockroom, Nanoimprint MA-02

Miscellaneous

These may be available but are not guaranteed to be stocked

Name / Datasheet Tone Solvent Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
KL5305 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1805
KL5315 + PGMEA General MA-01, SPN-01, SPN-03 TMAH NMP S1813
KL6003 + PGMEA MA-01, SPN-01, SPN-03 TMAH NMP SPR 220-3, SPR 220-4.5
K-PRO 3 + PGMEA Plating, Etching MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 NMP SPR 220-3, SPR 220-4.5
AZ 12XT-20PL-15 + PGMEA CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um MA-01, SPN-01, SPN-03 TMAH SPR 220-7, AZ P4620
AZ P4620 + PGMEA Thick Resist, Plating, Packaging MA-01, SPN-01, SPN-03 TMAH or AZ400K 1:4 SPR 220-7, AZ 12XT-20PL-15
ma-N 2403 - NMP, Butyl acetate, Cyclohexanone e-beam/DUV Mix and Match EBL-01, EBL-03, SPN-06
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