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- |AreasResponsibility = Lithography, Metrology, <br> New Users ...training and process troubleshooting. Her primary focuses are lithography, metrology, and wet chemical processing, with a specialization in photolithography/las986 bytes (125 words) - 14:30, 3 January 2024
- |AreasResponsibility = Lithography, <br> Metrology627 bytes (73 words) - 14:52, 29 April 2022
- == Metrology & characterization ==6 KB (765 words) - 16:59, 25 April 2024
- [[Category:Metrology]] | Instrument_Type = Metrology914 bytes (107 words) - 14:19, 3 January 2024
- [[Category:Metrology]] | Instrument_Type = Metrology1 KB (164 words) - 14:19, 3 January 2024
- [[Category:Metrology]] | Instrument_Type = Metrology1 KB (139 words) - 17:43, 13 February 2024
- [[Category:Metrology]] | Instrument_Type = Metrology1 KB (172 words) - 14:18, 3 January 2024
- [[Category:Metrology]] | Instrument_Type = Metrology1,007 bytes (124 words) - 14:18, 3 January 2024
- [[Category:Metrology]] | Instrument_Type = Metrology1 KB (151 words) - 14:17, 3 January 2024
- ...ning Penn, Kyle worked at MIT Lincoln Laboratory as a photolithography and metrology specialist, and at Alpha Industries (now Skyworks, Inc.) as a process engin888 bytes (111 words) - 14:51, 29 April 2022
- | KLA Tencor P7 2D profilometer || MET-01 || Metrology || [[David_Barth | David Barth]] | KLA Tencor P7 2D&3D/stress profilometer || MET-02 || Metrology || [[David_Barth | David Barth]]6 KB (758 words) - 13:58, 18 April 2024
- ...thography, physical and chemical vapor deposition, dry and wet processing, metrology, and device characterization. The facility is managed by full-time technica3 KB (385 words) - 16:25, 25 March 2024
- [[Category:Metrology]] | Instrument_Type = Metrology1 KB (166 words) - 14:20, 3 January 2024
- [[Category:Metrology]] | Instrument_Type = Metrology1 KB (201 words) - 14:21, 3 January 2024
- [[Category:Metrology]] | Instrument_Type = Metrology1 KB (186 words) - 09:17, 17 May 2023