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- 14:24, 15 May 2024 ZEP Process Data (hist | edit) [215 bytes] Dsbarth (talk | contribs) (Created page with "<iframe height="400px" key="google" level="docs" path="/spreadsheets/u/0/d/e/2PACX-1vSvZG1_8z70Dl9liA3fY2p8jojsyW4ELRhjOzFc7UKzOlXOxWQ4XkD6m_RAMx8-u2E5G21yPdKG6loM/pubchart?oi...")
- 13:40, 10 May 2024 Keyence Profilometer (hist | edit) [931 bytes] Bohnn (talk | contribs) (Created page with "Category:Characterization {{EquipmentInfo | name = Keyence Profilometer | Tool_Name = Keyence | image = 300px | imagecaption = | Instrument_Type = P...")
- 14:11, 9 May 2024 Au (gold) (hist | edit) [4,460 bytes] Dsabr (talk | contribs) (Created page with "==Equipment== ===Deposition Equipment=== * '''PVD-02:''' Lesker PVD75 E-Beam/Thermal Evaporator * '''PVD-03:''' Lesker PVD75...")
- 11:56, 9 May 2024 Ti (titanium) (hist | edit) [3,690 bytes] Dsabr (talk | contribs) (Created page with "Titanium is a transition metal with atomic number 22 and symbol Ti. Titanium has a low density, high strength and is resistant to corrosion by water. It has relatively poor el...")
- 17:01, 25 April 2024 Micromanipulator 4060 Probe Station (hist | edit) [1,329 bytes] Dsabr (talk | contribs) (Created page with "Category:Electrical Characterization {{EquipmentInfo | name = Micromanipulator 4060 Probe Station | Tool_Name = Micromanipulator 4060 Probe Station | image = Image:MET-...")
- 16:43, 25 April 2024 Dan Sabrsula (hist | edit) [1,055 bytes] Dsabr (talk | contribs) (Created page with "__NOTOC__ {{StaffMemberInfobox |StaffName = Dan Sabrsula |StaffPhoto = Sabrsula.jpg |JobTitle = Nanofabrication Process Engineer |AreasResponsibility = PVD, Electrical Charact...")
- 11:31, 5 April 2024 What is Chemical Vapor Deposition (CVD)? (hist | edit) [1,317 bytes] Lucasamb (talk | contribs) (Created page with "Chemical Vapor Deposition (CVD) in which thin films are deposited onto a substrate surface through the chemical reaction of vapor-phase precursor molecules. The basic process...")
- 11:03, 5 April 2024 What is Atomic Layer Deposition? (hist | edit) [1,830 bytes] Lucasamb (talk | contribs) (Created page with "'''Atomic Layer Deposition (ALD)''' is a thin-film deposition technique used in the fabrication of semiconductor devices, microelectronics, and various nanotechnology applicat...")
- 10:27, 5 April 2024 What is ALD? (hist | edit) [1,895 bytes] Lucasamb (talk | contribs) (Created page with "Here it is")
- 11:13, 4 April 2024 How PVD works (hist | edit) [11,588 bytes] Dsabr (talk | contribs) (Created page with "this is how")
- 15:46, 25 March 2024 How plasma etch works (hist | edit) [8,063 bytes] Azadi (talk | contribs) (Created page with "Plasma etching is a crucial process in semiconductor manufacturing, enabling the precise fabrication of intricate patterns on silicon wafers. This technique is fundamental in...")
- 15:45, 25 March 2024 Ever wondered how plasma etch works? (hist | edit) [3,243 bytes] Azadi (talk | contribs) (Created page with "Plasma etching is a crucial process in semiconductor manufacturing, enabling the precise fabrication of intricate patterns on silicon wafers. This technique is fundamental in...")
- 10:57, 20 March 2024 Fiji G2 ALD (hist | edit) [949 bytes] Azadi (talk | contribs) (Created page with "Category:Deposition {{EquipmentInfo | name = Veeco Fiji G2 | Tool_Name = Veeco Figi G2 | image = 300px | imagecaption = | Instrument_Type = Deposit...")
- 10:33, 20 March 2024 Lucas Barreto (hist | edit) [805 bytes] Dsbarth (talk | contribs) (Created page with "__NOTOC__ {{StaffMemberInfobox |StaffName = Lucas Barreto |StaffPhoto = Barreto.jpg |JobTitle = Principal Scientist |AreasResponsibility = CVD, Process Development |PennID = l...")
- 15:16, 5 March 2024 Gatan Solarus 950 Advanced Plasma System (hist | edit) [936 bytes] Bohnn (talk | contribs) (created page. brief description)
- 15:06, 5 March 2024 EMS/Quorum Q150T ES Sputter Coater (hist | edit) [964 bytes] Bohnn (talk | contribs) (created page. brief description.)
- 12:54, 5 March 2024 Sample Preparation (hist | edit) [2,718 bytes] Bohnn (talk | contribs) (created page. may need more info for TEM preparation)
- 16:17, 22 February 2024 STEM (hist | edit) [1,912 bytes] Bohnn (talk | contribs) (created page. general summary of modes available in TEM/SEM. equipment. theory.)
- 17:16, 19 February 2024 EBSD (hist | edit) [800 bytes] Bohnn (talk | contribs) (created page. overview, theory, equipment. may review for better description)
- 14:52, 16 February 2024 Low Voltage SEM (hist | edit) [918 bytes] Bohnn (talk | contribs) (created page. overview, theory, equipment)
- 12:34, 16 February 2024 External Resources (hist | edit) [3,161 bytes] Bohnn (talk | contribs) (created page. added key texts for TEM, SEM, FIB, EDS.)