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- 14:45, 20 May 2024 diff hist +213 SiO2 (silicon dioxide) →Processes current
- 14:44, 20 May 2024 diff hist +89 SiO2 (silicon dioxide) →Processes
- 14:42, 20 May 2024 diff hist 0 N File:Oxford PECVD SiO2 deposition.pdf current
- 14:34, 20 May 2024 diff hist +34 SiO2 (silicon dioxide) →ALD Master Recipe
- 14:33, 20 May 2024 diff hist +551 SiO2 (silicon dioxide) →Processes
- 14:29, 20 May 2024 diff hist +383 SiO2 (silicon dioxide) →Sputter Deposition Rates
- 14:25, 20 May 2024 diff hist +68 SiO2 (silicon dioxide) →Etching Equipment
- 14:23, 20 May 2024 diff hist +59 SiO2 (silicon dioxide) →Equipment
- 12:04, 20 May 2024 diff hist +77 SiO2 (silicon dioxide) →Deposition Equipment
- 12:02, 20 May 2024 diff hist +66 SiO2 (silicon dioxide) →Deposition Equipment
- 12:01, 20 May 2024 diff hist +76 SiO2 (silicon dioxide) →Equipment
- 12:00, 20 May 2024 diff hist -84 SiO2 (silicon dioxide) →Deposition Equipment
- 12:00, 20 May 2024 diff hist +652 N SiO2 (silicon dioxide) Created page with "Silicon dioxide is an insulating, transparent oxide that is highly unreactive. It is often used as a passivation layer to protect electrical components. ==Equipment== ===..."
- 10:53, 20 May 2024 diff hist -11 Lesker PVD75 DC/RF Sputterer →Oxides, fluorides & nitrides current
- 10:52, 20 May 2024 diff hist -1 Lesker PVD75 DC/RF Sputterer →Oxides, fluorides & nitrides
- 10:52, 20 May 2024 diff hist +40 Lesker PVD75 DC/RF Sputterer →Oxides, fluorides & nitrides
- 10:42, 20 May 2024 diff hist -7 Denton Explorer14 Magnetron Sputterer →Process data & master recipes current
- 10:42, 20 May 2024 diff hist -3 Denton Explorer14 Magnetron Sputterer →Process data & master recipes
- 10:51, 16 May 2024 diff hist +45 Denton Explorer14 Magnetron Sputterer →SOPs & Troubleshooting
- 10:50, 16 May 2024 diff hist 0 N File:PVD 05 SOP.pdf current
- 10:46, 16 May 2024 diff hist +45 Lesker PVD75 E-beam Evaporator →SOPs & Troubleshooting current
- 10:45, 16 May 2024 diff hist 0 N File:PVD 04 SOP.pdf current
- 10:42, 16 May 2024 diff hist +48 Lesker PVD75 DC/RF Sputterer →SOPs & troubleshooting
- 10:42, 16 May 2024 diff hist -47 Lesker PVD75 DC/RF Sputterer →Additional resources
- 10:41, 16 May 2024 diff hist +14 Lesker PVD75 DC/RF Sputterer →Metals
- 10:40, 16 May 2024 diff hist +18 Lesker PVD75 DC/RF Sputterer →Deposition sources
- 14:18, 15 May 2024 diff hist 0 Lesker PVD75 DC/RF Sputterer →Additional resources
- 14:17, 15 May 2024 diff hist +13 Lesker PVD75 DC/RF Sputterer →Additional resources
- 14:16, 15 May 2024 diff hist +36 Lesker PVD75 DC/RF Sputterer →Additional resources
- 16:19, 9 May 2024 diff hist +10 Lesker PVD75 DC/RF Sputterer →DC deposition
- 15:00, 9 May 2024 diff hist +7 Au (gold) →Sputter Deposition Rates current
- 14:54, 9 May 2024 diff hist +196 Ti (titanium) →Processes current
- 14:39, 9 May 2024 diff hist -1 Au (gold)
- 14:39, 9 May 2024 diff hist +138 Au (gold) →Processes
- 14:32, 9 May 2024 diff hist -1 Au (gold) →Processes
- 14:31, 9 May 2024 diff hist +88 Au (gold) →Processes
- 14:28, 9 May 2024 diff hist +10 Au (gold) →Etching
- 14:21, 9 May 2024 diff hist +182 Au (gold)
- 14:15, 9 May 2024 diff hist +2,864 Au (gold) →Sputter Deposition Rates
- 14:14, 9 May 2024 diff hist +1 Ti (titanium) →Sputter Deposition Rates
- 14:14, 9 May 2024 diff hist +2,090 Ti (titanium) →Sputter Deposition Rates
- 14:11, 9 May 2024 diff hist +1 Au (gold) →Sputter Deposition Rates
- 14:11, 9 May 2024 diff hist +2 Au (gold) →Sputter Deposition Rates
- 14:11, 9 May 2024 diff hist +1,170 N Au (gold) Created page with "==Equipment== ===Deposition Equipment=== * '''PVD-02:''' Lesker PVD75 E-Beam/Thermal Evaporator * '''PVD-03:''' Lesker PVD75..."
- 14:09, 9 May 2024 diff hist +9 Lesker PVD75 DC/RF Sputterer →DC deposition
- 13:51, 9 May 2024 diff hist +1 Ti (titanium) →Application
- 13:50, 9 May 2024 diff hist 0 Ti (titanium) →Deposition Equipment
- 13:47, 9 May 2024 diff hist -10 Ti (titanium) →Sputter Deposition Rates
- 13:42, 9 May 2024 diff hist -8 Ti (titanium) →Sputter Deposition Rates
- 13:42, 9 May 2024 diff hist -55 Ti (titanium) →Sputter Deposition Rates