Difference between revisions of "Resists at QNF"
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| [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f KL6003] || + || PGMEA || || || TMAH || NMP || SPR 220-3, SPR 220-4.5 | | [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f KL6003] || + || PGMEA || || || TMAH || NMP || SPR 220-3, SPR 220-4.5 | ||
|- | |- | ||
| − | | [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f K-PRO 3] || + || PGMEA || Plating, Etching || || TMAH or | + | | [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f K-PRO 3] || + || PGMEA || Plating, Etching || || TMAH or AZ400K 1:4 || NMP || SPR 220-3, SPR 220-4.5 |
|- | |- | ||
| − | | [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 AZ 12XT-20PL-15] || + || PGMEA || CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um || || TMAH | + | | [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 AZ 12XT-20PL-15] || + || PGMEA || CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um || || TMAH || || SPR 220-7, AZ P4620 |
|- | |- | ||
| − | | [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 AZ P4620] || + || PGMEA || Thick Resist, Plating, Packaging || || TMAH | + | | [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 AZ P4620] || + || PGMEA || Thick Resist, Plating, Packaging || || TMAH or AZ400K 1:4 || || SPR 220-7, AZ 12XT-20PL-15 |
|- | |- | ||
| [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep ma-N 2403] || - || || e-beam/DUV Mix and Match || || || || | | [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep ma-N 2403] || - || || e-beam/DUV Mix and Match || || || || | ||
|} | |} | ||
Revision as of 13:48, 3 July 2023
The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.
QNF Supplied Standard Photoresists
| Name / Datasheet | Tone | Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| S1805 | + | PGMEA | General | MA-01, LW-01, SPN-03 | 0.24N TMAH | NMP | KL5305 |
| S1813 | + | PGMEA | General, 1um-1.3um | MA-01, LW-01, SPN-03 | 0.24N TMAH | NMP | KL5315 |
| S1818 | + | PGMEA | General | MA-01, LW-01, SPN-03 | 0.24N TMAH | NMP | |
| SPR 220-3 | + | Ethyl lactate, anisole, n-amyl acetate | Etch, 2um-5um | MA-01, SPN-03 | 0.24N TMAH | NMP | KPRO-3, KL6003, AZ3330F |
| SPR 220-4.5 | + | Ethyl lactate, anisole, n-amyl acetate | Etch | MA-01, SPN-03 | 0.24N TMAH | NMP | KPRO-3, KL6003, AZ3330F |
| SPR 220-7 | + | Ethyl lactate, anisole, n-amyl acetate | Etch, 6um-12um | MA-01, SPN-03 | 0.24N TMAH or 0.26N TMAH | NMP | AZ 12XT, AZ P4620 |
| AZ 3330F | + | PGMEA | General, Metal RIE, Plating | MA-01, SPN-03 | 0.26N TMAH (AZ300MIF) or alkaline salts (AZ400K 1:4) | SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003 | |
| NR7-3000P | - | Cyclohexanone | Etch, General | MA-01 | 0.24N or 0.26N TMAH | ||
| APOL-LO 3202 | - | PGMEA | Liftoff | MA-01 | 0.26N TMAH | NMP | |
| IP-Dip | - | Ethoxylated acrylates | Nanoscribe, Epoxy | LW-02 | PGMEA, IPA | ||
| HARE SQ 2 | - | Cyclopentanone, gamma butyro lactone | Epoxy | SPN-07, MA-03 | PGMEA (SQ Developer) | N/A | SU-8 2005 |
| HARE SQ 50 | - | Cyclopentanone, gamma butyro lactone | Epoxy | SPN-07, MA-03 | PGMEA (SQ Developer) | N/A | SU-8 2050 |
Stockroom Photoresists
| Name / Datasheet | Tone | Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| SU-8 2005 | - | Cyclopentanone | Epoxy, 4um-7um | SPN-07, MA-03 | PGMEA (SU-8 Developer) | N/A | HARE SQ 2 |
| SU-8 2050 | - | Cyclopentanone | Epoxy, 40um-170um | SPN-07, MA-03 | PGMEA (SU-8 Developer) | N/A | HARE SQ 50 |
| SU-8 2100 | - | Cyclopentanone | Epoxy, 100um-270um | SPN-07, MA-03 | PGMEA (SU-8 Developer) | N/A | HARE SQ 50 |
| SU-8 3050 | - | Cyclopentanone | Epoxy, 40um-100um | SPN-07, MA-03 | PGMEA (SU-8 Developer) | N/A | HARE SQ 50 |
Standard e-beam Resists
| Name / Datasheet | Tone | Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| 495 PMMA A8 | + | Anisole | Lower Resolution | EBL-01, SPN-06 | 3:1 IPA/H2O | NMP | |
| 495 PMMA A4 | + | Anisole | Lower Resolution, 180nm-300nm | EBL-01, SPN-06 | 3:1 IPA/H2O | NMP | |
| 495 PMMA A2 | + | Anisole | Lower Resolution, 50nm-100nm | EBL-01, SPN-06 | 3:1 IPA/H2O | NMP | |
| 950 PMMA A4 | + | Anisole | High Resolution, 200nm-400nm | EBL-01, SPN-06 | 3:1 IPA/H2O | NMP | |
| 950 PMMA A2 | + | Anisole | High Resolution, 50nm-100nm | EBL-01, SPN-06 | 3:1 IPA/H2O | NMP | 1000 HARP 0.1 |
| 1000 HARP 1.3 | + | Anisole | High Resolution | EBL-01, SPN-06 | 3:1 IPA/H2O | NMP | |
| 1000 HARP 0.1 | + | Anisole | High Resolution | EBL-01, SPN-06 | 3:1 IPA/H2O | NMP | 950 PMMA A2 |
Stockroom e-beam Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover |
|---|---|---|---|---|---|---|
| ZEP 520A | + | Anisole | Thicker formulation | EBL-01, SPN-06 | Xylenes or Amyl acetate | NMP |
| ZEP 520A-7 | + | Anisole | Thinner formulation | EBL-01, SPN-06 | Xylenes or Amyl acetate | NMP |
| H-SiQ 6% | - | MIBK | HSQ Equivalent | EBL-01, SPN-06 | TMAH |
Other Resists
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover |
|---|---|---|---|---|---|---|
| LOR 3A | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | Keep away from acetone & PGMEA! | TMAH | NMP |
| PMGI SF 5S | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | Keep away from acetone & PGMEA! | TMAH | NMP |
| PMGI SF 2S | N/A | Cyclopentanone, PGME | Liftoff, Non-imaging | Keep away from acetone & PGMEA! | TMAH | NMP |
| NXR-1025 | N/A | Stockroom, Nanoimprint | MA-02 |
Miscellaneous
These may be available but are not guaranteed to be stocked
| Name / Datasheet | Tone | Solvent Composition | Use / Thickness | Tool Compatibility | Developer | Remover | Alternative Resists |
|---|---|---|---|---|---|---|---|
| KL5305 | + | PGMEA | General | TMAH | NMP | S1805 | |
| KL5315 | + | PGMEA | General | TMAH | NMP | S1813 | |
| KL6003 | + | PGMEA | TMAH | NMP | SPR 220-3, SPR 220-4.5 | ||
| K-PRO 3 | + | PGMEA | Plating, Etching | TMAH or AZ400K 1:4 | NMP | SPR 220-3, SPR 220-4.5 | |
| AZ 12XT-20PL-15 | + | PGMEA | CAR (i-line), Plating, Packaging, Deep Etch, 10um-25um | TMAH | SPR 220-7, AZ P4620 | ||
| AZ P4620 | + | PGMEA | Thick Resist, Plating, Packaging | TMAH or AZ400K 1:4 | SPR 220-7, AZ 12XT-20PL-15 | ||
| ma-N 2403 | - | e-beam/DUV Mix and Match |