Photolithography

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Equipment at QNF

Patterning

• LW-01: Heidelberg DWL 66+ Laser Writer
• LW-02: Nanoscribe Photonic Professional GT
• LW-03: DMO MicroWriter ML3 Pro
• MA-01: SUSS MicroTec MA6 Gen3 Mask Aligner
• MA-03: ABM Mask Aligner

Resist Coating

• RC-01: SUSS MicroTec AS8 AltaSpray
• SPN-01: CEE Apogee Spinner - Acetone Soluble Photoresist
• SPN-03: CEE Apogee Spinner - LOR/PMGI
• SPN-06: CEE Apogee Spinner - E-Beam Resist
• SPN-08: CEE Apogee Spinner - Negative Epoxy

Additional Information

Related Wiki Pages

• How to Make a Mask
• Resists at QNF
• Developers at QNF -- Under Construction
• Ancillary Process Chemicals at QNF -- Under Construction
• Soft Lithography

Internal Reports & Presentations

• Overview of Photolithography Capabilities at QNF Singh Seminar Series, August 2025
• Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography LW-01, SPR 220-3
• Optimization of Bilayer Lift-Off Process to Enable the Gap Size of 1μm Using LOR 3A and S1813
• Influence of flow rate, nozzle speed, pitch and the number of passes on the thickness of S1805 photoresist in SUSS MicroTec AS8 spray coater RC-01
• MicroChem S1818 Contrast Curve Optimization MA-01
• Correction of pattern size deviations in the fabrication of photomasks made with a laser direct-writer LW-01
• Surface Treatment and Adhesion Study OVN-01
• Heidelberg DWL66+ S1805 Contrast Curves LW-01
• Heidelberg DWL66+ S1813 Contrast Curves LW-01
• MicroChem S1800 Series Resist Application onto Si

External Resources

• Chris A. Mack (Lithoguru) - Photolithography

• EPFL
  • Introduction to Photolithography

• MicroChemicals
  • Softbake
  • Rehydration
  • Development
  • Troubleshooting

• IMM Technical Resources
  • Lithography Process Overview
  • Effect of Ambient Humidity on Photoresists
• Kemlab - Photolithography Glossary
• KemLab Resist Presentation