Difference between revisions of "Photolithography"
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[[Category:Lithography]] [[Category:Photolithography]] | [[Category:Lithography]] [[Category:Photolithography]] | ||
| + | __NOTOC__ | ||
| + | '''THIS PAGE IS UNDER CONSTRUCTION''' | ||
[[File:QNF_Litho_Flowchart.png|center|800px]] <br> | [[File:QNF_Litho_Flowchart.png|center|800px]] <br> | ||
| + | ===About=== | ||
| + | |||
| + | ===Process Flow=== | ||
| + | =====QNF Example Protocols===== | ||
| + | =====Videos===== | ||
| + | |||
| + | ===Equipment at QNF=== | ||
| + | =====Patterning===== | ||
| + | * '''LW-01:''' [[Heidelberg DWL 66+ Laser Writer | Heidelberg DWL 66+ Laser Writer]] | ||
| + | * '''LW-02:''' [[Nanoscribe Photonic Professional GT | Nanoscribe Photonic Professional GT]] | ||
| + | * '''LW-03:''' [[DMO MicroWriter ML3 Pro | DMO MicroWriter ML3 Pro ]] | ||
| + | * '''MA-01:''' [[SUSS MicroTec MA6 Gen3 Mask Aligner | SUSS MicroTec MA6 Gen3 Mask Aligner]] | ||
| + | * '''MA-03:''' [[ABM Mask Aligner | ABM Mask Aligner]] | ||
| + | ===== Resist Coating ===== | ||
| + | * '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]] | ||
| + | * '''SPN-01:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - Acetone Soluble Photoresist]] | ||
| + | * '''SPN-03:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - LOR/PMGI]] | ||
| + | * '''SPN-06:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - E-Beam Resist]] | ||
| + | * '''SPN-08:''' [[ CEE Apogee Spinner | CEE Apogee Spinner - Negative Epoxy]] | ||
| + | |||
| + | ===Additional Information=== | ||
| + | =====Related Wiki Pages===== | ||
* [[How to Make a Mask]] | * [[How to Make a Mask]] | ||
* [[Resists at QNF]] | * [[Resists at QNF]] | ||
* [[Developers at QNF]] -- Under Construction | * [[Developers at QNF]] -- Under Construction | ||
* [[Ancillary Process Chemicals at QNF]] -- Under Construction | * [[Ancillary Process Chemicals at QNF]] -- Under Construction | ||
| − | * [ | + | * [[Soft Lithography]] |
| − | =====Internal Reports===== | + | =====Internal Reports & Presentations===== |
| + | *[https://nemo.nano.upenn.edu/knowledge_base/user/items/categories/# Overview of Photolithography Capabilities at QNF] ''Singh Seminar Series, August 2025'' | ||
*[https://repository.upenn.edu/entities/publication/36e58b7d-2254-4e6b-b9b4-f1d247b98352 Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography] ''LW-01, SPR 220-3'' | *[https://repository.upenn.edu/entities/publication/36e58b7d-2254-4e6b-b9b4-f1d247b98352 Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography] ''LW-01, SPR 220-3'' | ||
*[https://repository.upenn.edu/entities/publication/2dc6357c-2974-47d6-b875-bfba1a5b59f5 Optimization of Bilayer Lift-Off Process to Enable the Gap Size of 1μm Using LOR 3A and S1813] | *[https://repository.upenn.edu/entities/publication/2dc6357c-2974-47d6-b875-bfba1a5b59f5 Optimization of Bilayer Lift-Off Process to Enable the Gap Size of 1μm Using LOR 3A and S1813] | ||
| − | *[https://repository.upenn.edu/entities/publication/86c27bd3-abdc-42cf-836a-671b350465fc Influence of flow rate, nozzle speed, pitch and the number of passes on the thickness of S1805 photoresist in SUSS MicroTec AS8 spray coater] ''RC-01 | + | *[https://repository.upenn.edu/entities/publication/86c27bd3-abdc-42cf-836a-671b350465fc Influence of flow rate, nozzle speed, pitch and the number of passes on the thickness of S1805 photoresist in SUSS MicroTec AS8 spray coater] ''RC-01'' |
*[https://repository.upenn.edu/entities/publication/f6608537-5d05-4c9f-8d9f-9bf9cc333b36 MicroChem S1818 Contrast Curve Optimization] ''MA-01'' | *[https://repository.upenn.edu/entities/publication/f6608537-5d05-4c9f-8d9f-9bf9cc333b36 MicroChem S1818 Contrast Curve Optimization] ''MA-01'' | ||
| − | *[https://repository.upenn.edu/entities/publication/c1f5aa27-e2be-4eb2-93ea-bf8a7efd35da Correction of pattern size deviations in the fabrication of photomasks made with a laser direct-writer] | + | *[https://repository.upenn.edu/entities/publication/c1f5aa27-e2be-4eb2-93ea-bf8a7efd35da Correction of pattern size deviations in the fabrication of photomasks made with a laser direct-writer] ''LW-01'' |
| − | *[https://repository.upenn.edu/entities/publication/1956d081-da9f-497f-b6f1-82f3d7c72196 Surface Treatment and Adhesion Study] | + | *[https://repository.upenn.edu/entities/publication/1956d081-da9f-497f-b6f1-82f3d7c72196 Surface Treatment and Adhesion Study] ''OVN-01'' |
| − | *[https://repository.upenn.edu/entities/publication/7ee1b740-1ff8-4ada-a5eb-81be1a090117 Heidelberg DWL66+ S1805 Contrast Curves] | + | *[https://repository.upenn.edu/entities/publication/7ee1b740-1ff8-4ada-a5eb-81be1a090117 Heidelberg DWL66+ S1805 Contrast Curves] ''LW-01'' |
| − | *[https://repository.upenn.edu/entities/publication/5bd0136f-e116-4721-9c84-164f17f04393 Heidelberg DWL66+ S1813 Contrast Curves] | + | *[https://repository.upenn.edu/entities/publication/5bd0136f-e116-4721-9c84-164f17f04393 Heidelberg DWL66+ S1813 Contrast Curves] ''LW-01'' |
*[https://repository.upenn.edu/entities/publication/1a9111e9-7e53-4e47-a11d-3fd34ce7de12 MicroChem S1800 Series Resist Application onto Si] | *[https://repository.upenn.edu/entities/publication/1a9111e9-7e53-4e47-a11d-3fd34ce7de12 MicroChem S1800 Series Resist Application onto Si] | ||
| − | + | *[https://www.youtube.com/playlist?list=PLiihbHV9HgpX_9m5Khz2wn-XaxM5-yErU LayoutEditor Training Videos] | |
=====External Resources===== | =====External Resources===== | ||
*'''[https://www.lithoguru.com/scientist/lithobasics.html Chris A. Mack (Lithoguru) - Photolithography]''' | *'''[https://www.lithoguru.com/scientist/lithobasics.html Chris A. Mack (Lithoguru) - Photolithography]''' | ||
| Line 36: | Line 61: | ||
**[https://www.imicromaterials.com/index.php/products/ig-line-photoresists/humidity-control Effect of Ambient Humidity on Photoresists] | **[https://www.imicromaterials.com/index.php/products/ig-line-photoresists/humidity-control Effect of Ambient Humidity on Photoresists] | ||
*[https://www.kemlab.com/glossary Kemlab - Photolithography Glossary] | *[https://www.kemlab.com/glossary Kemlab - Photolithography Glossary] | ||
| + | *[https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation] | ||
Latest revision as of 12:16, 7 November 2025
THIS PAGE IS UNDER CONSTRUCTION
About
Process Flow
QNF Example Protocols
Videos
Equipment at QNF
Patterning
- LW-01: Heidelberg DWL 66+ Laser Writer
- LW-02: Nanoscribe Photonic Professional GT
- LW-03: DMO MicroWriter ML3 Pro
- MA-01: SUSS MicroTec MA6 Gen3 Mask Aligner
- MA-03: ABM Mask Aligner
Resist Coating
- RC-01: SUSS MicroTec AS8 AltaSpray
- SPN-01: CEE Apogee Spinner - Acetone Soluble Photoresist
- SPN-03: CEE Apogee Spinner - LOR/PMGI
- SPN-06: CEE Apogee Spinner - E-Beam Resist
- SPN-08: CEE Apogee Spinner - Negative Epoxy
Additional Information
Related Wiki Pages
- How to Make a Mask
- Resists at QNF
- Developers at QNF -- Under Construction
- Ancillary Process Chemicals at QNF -- Under Construction
- Soft Lithography
Internal Reports & Presentations
- Overview of Photolithography Capabilities at QNF Singh Seminar Series, August 2025
- Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography LW-01, SPR 220-3
- Optimization of Bilayer Lift-Off Process to Enable the Gap Size of 1μm Using LOR 3A and S1813
- Influence of flow rate, nozzle speed, pitch and the number of passes on the thickness of S1805 photoresist in SUSS MicroTec AS8 spray coater RC-01
- MicroChem S1818 Contrast Curve Optimization MA-01
- Correction of pattern size deviations in the fabrication of photomasks made with a laser direct-writer LW-01
- Surface Treatment and Adhesion Study OVN-01
- Heidelberg DWL66+ S1805 Contrast Curves LW-01
- Heidelberg DWL66+ S1813 Contrast Curves LW-01
- MicroChem S1800 Series Resist Application onto Si
- LayoutEditor Training Videos