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General Wet Bench Processing
[[Category:Wet Processing]] ...ng for benches in Bays 2, 4, 5, 6 and Packaging. See other pages for Bay 3 processing

332 bytes (41 words) - 16:05, 7 January 2025

Ana Cohen
...shooting. Her primary focuses are lithography, metrology, and wet chemical processing, with a specialization in photolithography/laser writing. She also is passi

986 bytes (125 words) - 14:30, 3 January 2024
Equipment
* '' '''SPN-07''' is listed under Back End Processing'' <br> == Thermal Processing ==

6 KB (840 words) - 15:04, 31 January 2025
General Wet Bench Processing
[[Category:Wet Processing]] ...ng for benches in Bays 2, 4, 5, 6 and Packaging. See other pages for Bay 3 processing

332 bytes (41 words) - 16:05, 7 January 2025
QNF Equipment Owner Matrix
| MRL Wet/Dry Thermal Oxide || CVD-02 A || Thermal Processing || [[Lucas Barreto | Lucas Barreto]] | MRL LPCVD Silicon Nitride || CVD-02 B || Thermal Processing || [[Lucas Barreto | Lucas Barreto]]

7 KB (864 words) - 14:10, 31 March 2025
Quattrone Nanofabrication Facility
...d optical lithography, physical and chemical vapor deposition, dry and wet processing, metrology, and device characterization. The facility is managed by full-ti

3 KB (385 words) - 17:31, 27 February 2025
RENA Compass Dual Stack Spin Rinse Dryer
[[Category:Wet Processing]] | Instrument_Type = Wet Processing

838 bytes (104 words) - 14:25, 3 January 2024
Safety Resources
[[General Wet Bench Processing | Wet Bench Training for Visitors]]

801 bytes (96 words) - 18:51, 8 January 2025