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• General Wet Bench Processing
  [[Category:Wet Processing]][[Category:Safety]] ...ng for benches in Bays 2, 4, 5, 6 and Packaging. See other pages for Bay 3 processing
  352 bytes (43 words) - 12:56, 28 July 2025

Page text matches

• Ana Cohen
  ...shooting. Her primary focuses are lithography, metrology, and wet chemical processing, with a specialization in photolithography/laser writing. She also is passi
  986 bytes (125 words) - 13:30, 3 January 2024
• Equipment
  == Thermal Processing == == Wet Processing ==
  7 KB (837 words) - 14:11, 26 August 2025
• Frequently Asked Questions
  * Pictures taken at chemical wet benches should be taken at a safe distance with a zoom lens to avoid contac * Bay 3 (Wet Processing) is off-limits as it contains the most dangerous chemicals in the lab and r
  11 KB (1,899 words) - 16:55, 9 December 2025
• General Wet Bench Processing
  [[Category:Wet Processing]][[Category:Safety]] ...ng for benches in Bays 2, 4, 5, 6 and Packaging. See other pages for Bay 3 processing
  352 bytes (43 words) - 12:56, 28 July 2025
• QNF Equipment Owner Matrix
  | MRL Wet/Dry Thermal Oxide || CVD-02 A || Thermal Processing || [[Lucas Barreto | Lucas Barreto]] | MRL LPCVD Silicon Nitride || CVD-02 B || Thermal Processing || [[Lucas Barreto | Lucas Barreto]]
  7 KB (864 words) - 10:40, 25 July 2025
• Quattrone Nanofabrication Facility
  ...sical and chemical vapor deposition]], [[Equipment#Etch | dry and wet etch processing]], [[Equipment#Metrology_.26_characterization | metrology, and device chara
  3 KB (409 words) - 15:04, 28 July 2025
• RENA Compass Dual Stack Spin Rinse Dryer
  [[Category:Wet Processing]][[Category:Equipment]] | Instrument_Type = Wet Processing
  860 bytes (106 words) - 12:55, 28 July 2025
• Safety Resources
  [[General Wet Bench Processing | Wet Bench Training for QNF]]
  2 KB (218 words) - 12:06, 7 November 2025
• Sandvik Furnace Stack
  ...egory:Deposition]][[Category:Chemical Vapor Deposition]][[Category:Thermal Processing]][[Category:Equipment]] '''Tube 1:''' Wet/Dry Silicon Oxide growth.
  2 KB (336 words) - 13:06, 28 July 2025
• Tousimis Critical Point Dryer
  [[Category:Wet Processing]][[Category:Equipment]] | Instrument_Type = Wet Processing
  1,000 bytes (126 words) - 12:55, 28 July 2025