Difference between revisions of "Lesker PVD75 E-beam Evaporator"
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| Instrument_Type = Physical vapor deposition | | Instrument_Type = Physical vapor deposition | ||
| − | | Staff_Manager = [[ | + | | Staff_Manager = [[David Barth | David Barth]] |
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| Tool_Manufacturer = Kurt J. Lesker | | Tool_Manufacturer = Kurt J. Lesker | ||
Revision as of 13:41, 3 January 2024
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| Tool Name | Lesker PVD75 E-Beam/Thermal Evaporator |
|---|---|
| Instrument Type | Physical vapor deposition |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | Kurt J. Lesker |
| Tool Model | PVD75 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | 215-898-9748 |
| SOP Link | SOP |
Description
The tool
The Kurt J. Lesker PVD75 E-beam Evaporator is an electron-beam (e-beam) evaporation tool. The tool is a fully automated system for depositing Ti, Cr, Au, and/or Pd. The tool also comes with a load-lock, allowing for fast and easy transfer of samples in and out of the system. While less flexible than the PVD-02 deposition system in terms of available materials, the PVD-04 is a much faster tool.
Available materials
The tool contains the following materials:
- Au - Gold
- Cr - Chromium
- Pd - Palladium
- Ti - Titanium
Deposition is limited to thin-film thicknesses of ~100 nm.
Resources
Training video
Link: PVD-4 Training Video
SOPs & Troubleshooting
Link: QNF SOP