SiO2 (silicon dioxide)

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Silicon dioxide is an insulating, transparent oxide that is highly unreactive. It is often used as a passivation layer to protect electrical components.

Equipment

Deposition Equipment

Etching Equipment

Applications

Processes

ALD Master Recipe

ALD-01 Process Parameters:

Material Name Precursor 1 Precursor 2 Dep. temperature [C] Carrier flow [sccm] Dep. rate [A/cyc] Date [MM/DD/YY]
Name Pulse time [s] Wait time [s] : Stop Valve closed / open Name Pulse time [s] Wait time [s] : Stop Valve closed / open
SiO2 BDEAS 0.02 5 SV closed/ 3 SV open O3 0.2 20 SV closed/ 5 SV open 200 20 0.6 02/12/24

Sputter Deposition Rates

PVD Tool Cathode 1 (RF) Recorded
Pressure Power Rate
PVD-03 3 mTorr 200 W Å s-1
PVD Tool Cathode 1 (RF) Recorded
Pressure Power Rate
PVD-05 3 mTorr 200 W Å s-1