SiO2 (silicon dioxide)

Silicon dioxide is an insulating, transparent oxide that is highly unreactive. It is often used as a passivation layer to protect electrical components.

Equipment

Deposition Equipment

• ALD-01: Cambridge Nanotech S200 ALD
• CVD-01: Oxford PlasmaLab 100 PECVD
• CVD-02: Sandvik Furnace Stack
• PVD-02: Lesker PVD75 E-Beam/Thermal Evaporator
• PVD-03: Lesker PVD75 DC/RF Sputterer
• PVD-05: Denton Explorer14 Magnetron Sputterer

Etching Equipment

• DE-04: Oxford 80 Plus RIE
• DE-05: Oxford Cobra ICP Etcher