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- 14:46, 3 July 2023 diff hist +12 Resists at QNF →Other Resists
- 14:45, 3 July 2023 diff hist -17 Developers at QNF
- 14:45, 3 July 2023 diff hist +4 Developers at QNF
- 14:44, 3 July 2023 diff hist +917 N Ancillary Process Chemicals at QNF Created page with "The following are available within the QNF. {| class="wikitable sortable" ! Name !! Manufacturer !! Chemical Composition !! Hazards !! Use !! Alternatives |- | HMDS (Vapor Pr..." current
- 14:23, 3 July 2023 diff hist +64 Process Resources →Lithography: Ancillary Process Chemicals
- 14:21, 3 July 2023 diff hist +36 Developers at QNF
- 14:21, 3 July 2023 diff hist -29 m Developers at QNF
- 14:19, 3 July 2023 diff hist +1,580 Developers at QNF
- 13:51, 3 July 2023 diff hist +8 Resists at QNF →Standard e-beam Resists
- 13:51, 3 July 2023 diff hist +32 Resists at QNF →Stockroom Photoresists
- 13:50, 3 July 2023 diff hist +16 Resists at QNF →QNF Supplied Standard Photoresists
- 13:50, 3 July 2023 diff hist -97 Resists at QNF →QNF Supplied Standard Photoresists
- 13:48, 3 July 2023 diff hist -43 Resists at QNF →Miscellaneous
- 13:48, 3 July 2023 diff hist -27 Resists at QNF →Miscellaneous
- 13:47, 3 July 2023 diff hist -10 Resists at QNF →Stockroom e-beam Resists
- 13:46, 3 July 2023 diff hist +3 Resists at QNF →Other Resists
- 13:46, 3 July 2023 diff hist -2 m Resists at QNF →Other Resists
- 13:46, 3 July 2023 diff hist -107 Resists at QNF →Other Resists
- 13:43, 3 July 2023 diff hist -7 Resists at QNF →Standard e-beam Resists: 3:1 IPA/H2O
- 13:08, 3 July 2023 diff hist +46 Process Resources →Lithography
- 13:08, 3 July 2023 diff hist -24 Process Resources →Lithography
- 13:07, 3 July 2023 diff hist +1 m Developers at QNF
- 13:07, 3 July 2023 diff hist +676 N Developers at QNF →QNF Supplied Developers
- 12:52, 3 July 2023 diff hist +24 m Process Resources →Lithography
- 12:47, 3 July 2023 diff hist -1 m Resists at QNF →QNF Supplied Standard Photoresists
- 12:47, 3 July 2023 diff hist -19 Resists at QNF →Miscellaneous
- 12:45, 3 July 2023 diff hist +6 m Resists at QNF →Stockroom e-beam Resists
- 12:44, 3 July 2023 diff hist -4 m Resists at QNF →Stockroom e-beam Resists
- 12:43, 3 July 2023 diff hist +57 m Resists at QNF →Standard e-beam Resists
- 12:40, 3 July 2023 diff hist 0 m Resists at QNF →QNF Supplied Standard Photoresists
- 12:39, 3 July 2023 diff hist 0 m Resists at QNF →Stockroom Photoresists
- 12:39, 3 July 2023 diff hist +22 m Resists at QNF →QNF Supplied Standard Photoresists
- 12:34, 3 July 2023 diff hist -108 Resists at QNF →QNF Supplied Standard Photoresists: Remove chemical names
- 15:59, 30 June 2023 diff hist 0 m Resists at QNF →Stockroom Photoresists
- 15:59, 30 June 2023 diff hist +25 Resists at QNF →Stockroom Photoresists: Thickness
- 15:58, 30 June 2023 diff hist +116 Resists at QNF Including thickness
- 15:48, 30 June 2023 diff hist +16 Resists at QNF →Stockroom Photoresists: Remover set to N/A
- 15:47, 30 June 2023 diff hist +8 Resists at QNF →QNF Supplied Standard Photoresists: HARE Remover set to N/A
- 15:34, 30 June 2023 diff hist -14 Resists at QNF Including information for e-beam resist development and removal
- 15:28, 30 June 2023 diff hist -67 m Resists at QNF
- 15:26, 30 June 2023 diff hist +1,809 Resists at QNF Including dedicated tool information, Included information for LOR and PMGI
- 14:54, 30 June 2023 diff hist +558 Resists at QNF Including dedicated tool information
- 14:49, 30 June 2023 diff hist +2,348 Resists at QNF Reorganized and updated to include tool compatibility along with composition, developer and remover chemistries
- 13:43, 30 June 2023 diff hist 0 m Resists at QNF
- 13:43, 30 June 2023 diff hist -20 Resists at QNF →QNF Supplied Standard Photoresists
- 13:41, 30 June 2023 diff hist +715 Resists at QNF →QNF Supplied Standard Photoresists: Rearranged, added chemical composition, developer and remover --- may need to be updated to reflect proper names
- 16:26, 29 June 2023 diff hist +25 m SUSS MicroTec MA6 Gen3 Mask Aligner →Processes
- 15:28, 29 June 2023 diff hist -32 m SUSS MicroTec MA6 Gen3 Mask Aligner →Processes
- 15:27, 29 June 2023 diff hist -1 m SUSS MicroTec MA6 Gen3 Mask Aligner
- 15:20, 29 June 2023 diff hist +1,867 SUSS MicroTec MA6 Gen3 Mask Aligner Including suggested exposure parameters based on datasheets, including description of wavelength selection.