Difference between revisions of "Lesker PVD75 E-beam Evaporator"
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| Line 26: | Line 26: | ||
* Cr - Chromium | * Cr - Chromium | ||
* Pd - Palladium | * Pd - Palladium | ||
| − | * Ti - Titanium | + | * [[Ti (titanium) | Ti - Titanium]] |
Deposition is limited to thin-film thicknesses of ~100 nm. | Deposition is limited to thin-film thicknesses of ~100 nm. | ||
Revision as of 13:14, 28 July 2025
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| Tool Name | Lesker PVD75 E-Beam/Thermal Evaporator |
|---|---|
| Instrument Type | Physical vapor deposition |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | Kurt J. Lesker |
| Tool Model | PVD75 |
| NEMO Designation | PVD-04 |
| Nearest Phone | 215-898-9748 |
| SOP Link | SOP |
Description
The tool
The Kurt J. Lesker PVD75 E-beam Evaporator is an electron-beam (e-beam) evaporation tool. The tool is a fully automated system for depositing Ti, Cr, Au, and/or Pd. The tool also comes with a load-lock, allowing for fast and easy transfer of samples in and out of the system. While less flexible than the PVD-02 deposition system in terms of available materials, the PVD-04 is a much faster tool.
Available materials
The tool contains the following materials:
- Au - Gold
- Cr - Chromium
- Pd - Palladium
- Ti - Titanium
Deposition is limited to thin-film thicknesses of ~100 nm.
Resources
Training video
Link: PVD-4 Training Video
SOPs & Troubleshooting
Link: SOP