Difference between revisions of "SiO2 (silicon dioxide)"
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===Etching Equipment=== | ===Etching Equipment=== | ||
* '''DE-04:''' [[Oxford 80 Plus RIE | Oxford 80 Plus RIE]] | * '''DE-04:''' [[Oxford 80 Plus RIE | Oxford 80 Plus RIE]] | ||
| + | * '''DE-05:'''[[Oxford Cobra ICP Etcher | Oxford Cobra ICP Etcher]] | ||
==Applications== | ==Applications== | ||
Revision as of 13:25, 20 May 2024
Silicon dioxide is an insulating, transparent oxide that is highly unreactive. It is often used as a passivation layer to protect electrical components.
Equipment
Deposition Equipment
- ALD-01: Cambridge Nanotech S200 ALD
- CVD-01: Oxford PlasmaLab 100 PECVD
- CVD-02: Sandvik Furnace Stack
- PVD-02: Lesker PVD75 E-Beam/Thermal Evaporator
- PVD-03: Lesker PVD75 DC/RF Sputterer
- PVD-05: Denton Explorer14 Magnetron Sputterer
Etching Equipment
- DE-04: Oxford 80 Plus RIE
- DE-05: Oxford Cobra ICP Etcher