Difference between revisions of "Lesker PVD75 E-beam Evaporator"

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| imagecaption =  
 
| imagecaption =  
 
| Instrument_Type = Physical vapor deposition
 
| Instrument_Type = Physical vapor deposition
| Staff_Manager = [[Jason_A._Röhr | Jason]] (jarohr@seas.upenn.edu)
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| Staff_Manager = [[David Barth | David Barth]]
 
| Lab_Location = Bay 2
 
| Lab_Location = Bay 2
 
| Tool_Manufacturer = Kurt J. Lesker
 
| Tool_Manufacturer = Kurt J. Lesker
 
| Tool_Model = PVD75
 
| Tool_Model = PVD75
| Iris_Designation = PVD-04
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| NEMO_Designation = PVD-04
| Lab_Phone = 8-9748
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| Lab_Phone = 215-898-9748
 
| SOP Link = [https://www.seas.upenn.edu/~nanosop/PVD75_e-beam_SOP.htm SOP]
 
| SOP Link = [https://www.seas.upenn.edu/~nanosop/PVD75_e-beam_SOP.htm SOP]
 
}}
 
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===== SOPs & Troubleshooting =====
 
===== SOPs & Troubleshooting =====
Link: [https://repository.upenn.edu/scn_protocols/73/ QNF SOP]
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Link: [https://repository.upenn.edu/scn_sop/23/ SOP]
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<pdf height="800">File:PVD_04_SOP.pdf</pdf>

Latest revision as of 09:46, 16 May 2024


Lesker PVD75 E-Beam/Thermal Evaporator
PVD-04.jpeg
Tool Name Lesker PVD75 E-Beam/Thermal Evaporator
Instrument Type Physical vapor deposition
Staff Manager David Barth
Lab Location Bay 2
Tool Manufacturer Kurt J. Lesker
Tool Model PVD75
NEMO Designation PVD-04
Lab Phone 215-898-9748
SOP Link SOP

Description

The tool

The Kurt J. Lesker PVD75 E-beam Evaporator is an electron-beam (e-beam) evaporation tool. The tool is a fully automated system for depositing Ti, Cr, Au, and/or Pd. The tool also comes with a load-lock, allowing for fast and easy transfer of samples in and out of the system. While less flexible than the PVD-02 deposition system in terms of available materials, the PVD-04 is a much faster tool.

Available materials

The tool contains the following materials:

  • Au - Gold
  • Cr - Chromium
  • Pd - Palladium
  • Ti - Titanium

Deposition is limited to thin-film thicknesses of ~100 nm.

Resources

Training video

Link: PVD-4 Training Video

SOPs & Troubleshooting

Link: SOP