Difference between revisions of "Lesker PVD75 E-beam Evaporator"
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| image = [[Image:PVD-04.jpeg|300px]] | | image = [[Image:PVD-04.jpeg|300px]] | ||
| imagecaption = | | imagecaption = | ||
| − | | Instrument_Type = | + | | Instrument_Type = Physical vapor deposition |
| − | | Staff_Manager = | + | | Staff_Manager = [[David Barth | David Barth]] |
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| Tool_Manufacturer = Kurt J. Lesker | | Tool_Manufacturer = Kurt J. Lesker | ||
| Tool_Model = PVD75 | | Tool_Model = PVD75 | ||
| − | | | + | | NEMO_Designation = PVD-04 |
| − | | Lab_Phone = | + | | Lab_Phone = 215-898-9748 |
| SOP Link = [https://www.seas.upenn.edu/~nanosop/PVD75_e-beam_SOP.htm SOP] | | SOP Link = [https://www.seas.upenn.edu/~nanosop/PVD75_e-beam_SOP.htm SOP] | ||
}} | }} | ||
== Description == | == Description == | ||
| − | The Kurt J. Lesker PVD75 E-beam Evaporator is an electron-beam (e-beam) evaporation tool. The tool is a fully automated system for depositing Ti, Cr, Au, and/or Pd | + | ===== The tool ===== |
| + | The Kurt J. Lesker PVD75 E-beam Evaporator is an electron-beam (e-beam) evaporation tool. The tool is a fully automated system for depositing Ti, Cr, Au, and/or Pd. The tool also comes with a load-lock, allowing for fast and easy transfer of samples in and out of the system. While less flexible than the [[Lesker PVD75 E-Beam/Thermal Evaporator | PVD-02]] deposition system in terms of available materials, the PVD-04 is a much faster tool. | ||
| + | ===== Available materials ===== | ||
| + | The tool contains the following materials: | ||
| − | + | * Au - Gold | |
| − | * | + | * Cr - Chromium |
| − | * Cr | + | * Pd - Palladium |
| − | * | + | * Ti - Titanium |
| − | * | + | |
| + | Deposition is limited to thin-film thicknesses of ~100 nm. | ||
== Resources == | == Resources == | ||
| − | [https://www.youtube.com/watch?v=OxkmP7Lr9Lo PVD-4 Training Video] | + | ===== Training video ===== |
| + | Link: [https://www.youtube.com/watch?v=OxkmP7Lr9Lo PVD-4 Training Video] | ||
===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
| − | + | ||
| + | Link: [https://repository.upenn.edu/scn_sop/23/ SOP] | ||
| + | |||
| + | <pdf height="800">File:PVD_04_SOP.pdf</pdf> | ||
Latest revision as of 09:46, 16 May 2024
 |
|
| Tool Name | Lesker PVD75 E-Beam/Thermal Evaporator |
|---|---|
| Instrument Type | Physical vapor deposition |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | Kurt J. Lesker |
| Tool Model | PVD75 |
| NEMO Designation | PVD-04 |
| Lab Phone | 215-898-9748 |
| SOP Link | SOP |
Description
The tool
The Kurt J. Lesker PVD75 E-beam Evaporator is an electron-beam (e-beam) evaporation tool. The tool is a fully automated system for depositing Ti, Cr, Au, and/or Pd. The tool also comes with a load-lock, allowing for fast and easy transfer of samples in and out of the system. While less flexible than the PVD-02 deposition system in terms of available materials, the PVD-04 is a much faster tool.
Available materials
The tool contains the following materials:
- Au - Gold
- Cr - Chromium
- Pd - Palladium
- Ti - Titanium
Deposition is limited to thin-film thicknesses of ~100 nm.
Resources
Training video
Link: PVD-4 Training Video
SOPs & Troubleshooting
Link: SOP