Difference between revisions of "IntlVac NanoQuest 1 IBE"
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| name = IntlVac Nanoquest 1 | | name = IntlVac Nanoquest 1 | ||
| Tool_Name = IntlVac IBE | | Tool_Name = IntlVac IBE | ||
− | | image = [[]] | + | | image = [[Image:IBE.jpg|450px]] |
| imagecaption = | | imagecaption = | ||
| Instrument_Type = Etch | | Instrument_Type = Etch | ||
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| NEMO_Designation = DE-01 | | NEMO_Designation = DE-01 | ||
| Lab_Phone = 215-898-9748 | | Lab_Phone = 215-898-9748 | ||
− | | SOP Link = [ | + | | SOP Link = [[Media:DE01_SOP.pdf|SOP]] |
}} | }} | ||
== Description == | == Description == | ||
− | NanoQuest 1 is an ion miller connected to Ar gas and capable of | + | NanoQuest 1 is an ion miller connected to Ar gas and capable of etching small mm-scale samples up to full 4" wafers. The tool is equipped with a secondary ion mass spectroscopy (SIMS) unit and is capable of etching with manual endpoint detection. The stage has a tilt motor that allows for etch angles between 0 (directly facing the beam) and 90 degrees (parallel to the beam). |
− | The tool in QNF is connected to Ar gas and can etch samples up to 4" | + | The tool in QNF is connected to Ar gas and can etch samples up to 4" wafers. |
Available beam voltages are: 300 V, 400 V, 450 V, and 500 V | Available beam voltages are: 300 V, 400 V, 450 V, and 500 V | ||
===== Applications ===== | ===== Applications ===== | ||
* Ion milling | * Ion milling | ||
− | |||
− | |||
− | |||
− | |||
== Standard Process Information == | == Standard Process Information == | ||
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! Material || Voltage [V] || tilt [degree] || Etch Rate [nm/min] | ! Material || Voltage [V] || tilt [degree] || Etch Rate [nm/min] | ||
|- | |- | ||
+ | | [[ Cambridge Nanotech S200 ALD | ''' Al<sub>2</sub>O<sub>3<sub>''']] || 400 || 45 || 21 | ||
+ | |- | ||
| [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 300 || 0 || 15 | | [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 300 || 0 || 15 | ||
|- | |- | ||
| [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 500 || 0 || 40 | | [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 500 || 0 || 40 | ||
− | |||
− | |||
|} | |} | ||
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|- | |- | ||
| AlSc(.36)N || 500 || 45 || 50 | | AlSc(.36)N || 500 || 45 || 50 | ||
+ | |- | ||
+ | | HfO2 || 300 || 0 || 20 | ||
|- | |- | ||
| LiNbO3 || 500 || 0 || 40 | | LiNbO3 || 500 || 0 || 40 | ||
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|} | |} | ||
− | == | + | == SOP & Troubleshooting == |
+ | |||
+ | *Operation video | ||
+ | [https://www.youtube.com/watch?v=1GsWXfCUXUg manual loading/unloading operation video] | ||
+ | |||
+ | |||
+ | *SOP | ||
+ | <pdf height="800"> File:DE01_SOP.pdf</pdf> |
Latest revision as of 13:11, 6 November 2024
Tool Name | IntlVac IBE |
---|---|
Instrument Type | Etch |
Staff Manager | Sam Azadi |
Lab Location | Bay 2 |
Tool Manufacturer | IntlVac |
Tool Model | Nanoquest 1 |
NEMO Designation | DE-01 |
Lab Phone | 215-898-9748 |
SOP Link | SOP |
Description
NanoQuest 1 is an ion miller connected to Ar gas and capable of etching small mm-scale samples up to full 4" wafers. The tool is equipped with a secondary ion mass spectroscopy (SIMS) unit and is capable of etching with manual endpoint detection. The stage has a tilt motor that allows for etch angles between 0 (directly facing the beam) and 90 degrees (parallel to the beam).
The tool in QNF is connected to Ar gas and can etch samples up to 4" wafers. Available beam voltages are: 300 V, 400 V, 450 V, and 500 V
Applications
- Ion milling
Standard Process Information
Material | Voltage [V] | tilt [degree] | Etch Rate [nm/min] |
---|---|---|---|
Al2O3 | 400 | 45 | 21 |
SiO2 | 300 | 0 | 15 |
SiO2 | 500 | 0 | 40 |
Process information from user community
Material | Voltage [V] | tilt [degree] | Etch Rate [nm/min] |
---|---|---|---|
Al | 400 | 45 | 60 |
Al | 500 | 45 | 100 |
AlN | 500 | 45 | 52 |
AlSc(.36)N | 500 | 45 | 50 |
HfO2 | 300 | 0 | 20 |
LiNbO3 | 500 | 0 | 40 |
Pt | 500 | 45 | 20 |
SiO2 | 500 | 45 | 78 |
SOP & Troubleshooting
- Operation video
manual loading/unloading operation video
- SOP